Surface Chemical Functionalization of Semiconductors and Nanostructures

该奖项根据《2009 年美国复苏和再投资法案》（公法 111-5）提供资金。化学部的分析和表面化学 (ASC) 项目支持德克萨斯大学达拉斯分校 Yves Chabal 教授的研究项目。Chabal 教授和他的学生将研究技术上重要的半导体表面和纳米结构的表面化学和化学功能化。该小组将采用表面红外光谱，这可以说是最具辨别力和通用性的技术该研究将与多个理论小组密切合作，以获取化学和结构信息，并与光谱椭偏仪、拉曼和 X 射线光电子能谱以及原子力显微镜相结合，以研究 Ge、SiC 和其他 III-V 半导体表面的化学过程。该研究将为学生提供在化学和半导体加工行业非常感兴趣的跨学科领域进行培训的独特机会。 UTD 开展的活动旨在增加科学领域代表性不足群体的学生数量。

This award is funded under the American Recovery and Reinvestment Act of 2009 (Public Law 111-5)." The Analytical and Surface Chemistry (ASC) program of the Division of Chemistry supports the research program of Professor Yves Chabal of the University of Texas at Dallas. Prof. Chabal and his students will examine the surface chemistry and chemical functionalization of technologically important semiconductor surfaces and nanostructures. The group will employ surface infrared spectroscopy, arguably the most discriminating and versatile technique to derive chemical and structural information, in conjunction with spectroscopic ellipsometry, Raman and X-ray photoelectron spectroscopy and atomic force microscopy to study chemical processes on Ge, SiC and other III-V semiconductor surfaces. The study will be carried out in close collaboration with several theory groups in order to develop detailed understanding of the reaction pathways and product structures. The study will provide students with a unique opportunity to train in an interdisciplinary field which is of great interest to the chemical and semiconductor processing industries. Prof. Chabal and his students will contribute to various activities at UTD aiming to increase the number of students from under represented groups in science.