Surface Chemical Functionalization of Semiconductors and Nanostructures
Surface Chemical Functionalization of Semiconductors and Nanostructures
批准号:
0911197
负责人:
Yves Chabal
金额:
$36.52万
依托单位国家:
美国
项目类别:
Standard Grant
财政年份:
2009
资助国家:
美国
项目状态:
已结题
起止时间:
2009-07-15 至 2013-06-30
中文摘要
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英文摘要
This award is funded under the American Recovery and Reinvestment Act of 2009 (Public Law 111-5)." The Analytical and Surface Chemistry (ASC) program of the Division of Chemistry supports the research program of Professor Yves Chabal of the University of Texas at Dallas. Prof. Chabal and his students will examine the surface chemistry and chemical functionalization of technologically important semiconductor surfaces and nanostructures. The group will employ surface infrared spectroscopy, arguably the most discriminating and versatile technique to derive chemical and structural information, in conjunction with spectroscopic ellipsometry, Raman and X-ray photoelectron spectroscopy and atomic force microscopy to study chemical processes on Ge, SiC and other III-V semiconductor surfaces. The study will be carried out in close collaboration with several theory groups in order to develop detailed understanding of the reaction pathways and product structures. The study will provide students with a unique opportunity to train in an interdisciplinary field which is of great interest to the chemical and semiconductor processing industries. Prof. Chabal and his students will contribute to various activities at UTD aiming to increase the number of students from under represented groups in science.
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批准号:1312525
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资助金额:$38.37万
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财政年份:2013
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负责人:Yves Chabal
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依托单位:
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批准号:1343461
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项目类别:Standard Grant
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资助金额:$15.0万
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财政年份:2013
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负责人:Yves Chabal
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依托单位:
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批准号:0827634
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项目类别:Continuing Grant
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资助金额:$0.0万
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MRI: Development of an Integrated Thin Film Growth System with Comprehensive In-situ Characterization for Research and Education
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批准号:0421028
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项目类别:Standard Grant
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资助金额:$38.0万
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财政年份:2004
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负责人:Yves Chabal
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依托单位:
Surface Chemical Functionalization of Technologically Important Semiconductors: Silicon, Germanium, and Silicon Carbide
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批准号:0415652
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项目类别:Continuing Grant
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资助金额:$0.0万
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财政年份:2004
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负责人:Yves Chabal
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依托单位:
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批准号:0341053
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项目类别:Standard Grant
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资助金额:$0.9万
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财政年份:2004
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负责人:Yves Chabal
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依托单位:
国内基金
海外基金
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批准号:21224004
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项目类别:专项基金项目
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资助金额:20.0万元
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批准年份:2012
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负责人:廖叶华
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依托单位:
Chinese Journal of Chemical Engineering
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批准号:21024805
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项目类别:专项基金项目
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资助金额:20.0万元
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批准年份:2010
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负责人:廖叶华
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依托单位: