Role of structure in chemical functionalization of oxide-free silicon surfaces and nanoparticles

结构在无氧化物硅表面和纳米粒子化学功能化中的作用

• 批准号: 1300180
• 负责人: Yves Chabal
• 金额: $ 38.37万
• 依托单位: University of Texas at Dallas
• 依托单位国家: 美国
• 项目类别: Standard Grant
• 财政年份: 2013
• 资助国家: 美国
• 起止时间: 2013-09-15 至 2017-08-31
• 项目状态: 已结题
• 来源: https://www.nsf.gov/awardsearch/showAward?AWD_ID=1300180&HistoricalAwards=false
• 关键词: Role; structure; chemical; functionalization; oxide

The Chemical Structure, Dynamics, and Mechanisms - B Program of the Division of Chemistry supports Professor Yves J. Chabal from the University of Texas at Dallas to develop a fundamental understanding and control of the chemistry involved in making and modifying model hydrogen-terminated Si surfaces to investigate the correlation between their optoelectronic properties and chemical bonding. While hydrogen-terminated silicon surfaces have played a critical role in microelectronics because of their simple synthesis, superior chemical stability and excellent electrical properties, their transformative use critically depends on the ability to chemically modify them without oxidizing the Si substrate, since interfacial oxides typically have poor electrical properties. By controlling the quality of the chemical and physical structure of modified H/Si surfaces, it is then possible to address fundamental questions such as the nature of interfacial defect states and the origin of photoluminescence of Si nanoparticles. This work will provide the fundamental knowledge for applications such as silicon-based chemical- and bio-sensors, fuel and photovoltaic cells, catalysis, selective atomic layer deposition, ultra-shallow doping, and single electron devices. Thus, this interdisciplinary approach is of interest to the chemical, biomedical, energy and semiconductor processing industries and provides students with the opportunity to learn about different fields and to connect to industrial projects and international collaborators. The program will also incorporate "Surface Chemical Functionalization" into two courses and several modules for Materials Research Society tutorials, a Research Experience for Undergraduates program, as well as graduate student seminars.

化学系的化学结构、动力学和机制-B项目支持德克萨斯大学达拉斯分校的Yves J.Chabal教授对制造和修饰氢终止硅表面模型所涉及的化学有一个基本的了解和控制，以研究它们的光电特性和化学键之间的相关性。虽然氢端基硅表面因其简单的合成、优异的化学稳定性和优异的电学性能而在微电子学中发挥着关键作用，但它们的变革性应用关键取决于在不氧化硅衬底的情况下对其进行化学修饰的能力，因为界面氧化物通常具有较差的电学性能。通过控制修饰的H/Si表面的化学和物理结构的质量，就有可能解决诸如界面缺陷状态的性质和硅纳米粒子的光致发光的起源等基本问题。这项工作将为硅基化学和生物传感器、燃料和光伏电池、催化、选择性原子层沉积、超浅掺杂和单电子器件等应用提供基础知识。因此，这种跨学科的方法对化学、生物医学、能源和半导体加工行业很感兴趣，并为学生提供了学习不同领域的机会，并与工业项目和国际合作者建立了联系。该计划还将把“表面化学功能化”纳入材料研究学会教程的两门课程和几个模块，本科生研究体验计划，以及研究生研讨会。