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MRI: Acquisition of a Dual Beam Electron Beam/Focused Ion Beam System for Research and Education

MRI: Acquisition of a Dual Beam Electron Beam/Focused Ion Beam System for Research and Education
MRI:获取用于研究和教育的双束电子束/聚焦离子束系统
批准号:
0922992
负责人:
Gottfried Strasser
金额:
$109.64万
依托单位:
依托单位国家:
美国
项目类别:
Standard Grant
财政年份:
2009
资助国家:
美国
项目状态:
已结题
起止时间:
2009-09-01 至 2010-08-31

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中文摘要
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英文摘要
0922992StrasserThis proposal describes a request for NSF Major Research Instrumentation (MRI) support for acquisition of a dual beam SEM/FIB (Scanning Electron Microscope / Focused Ion Beam) system at the University at Buffalo (UB), State University of New York (SUNY). The instrument would be incorporated into and managed by UB's INS (Integrated Nanostructured Systems) Instrumentation Facility. The acquisition is driven by an interdisciplinary group of UB faculty from four different departments (Electrical Engineering, Chemical & Biological Engineering, Physics, and Chemistry). The envisioned instrument will allow UB researchers to expand their research activities into a broad range of new applications. The proposed instrument will be capable of fully automated preparation of samples for transmission electron microscopy (TEM), structuring and modifying surfaces, deep etching of materials, defining devices and depositing both metals and insulators with nanoscale resolution.
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CCLI: First course in nanoelectronics for engineers
  • 批准号:
    0837670
  • 项目类别:
    Standard Grant
  • 资助金额:
    $15.0万
  • 财政年份:
    2009
  • 负责人:
    Gottfried Strasser
  • 依托单位:
海外基金