Dynamic Maskless Holographic Lithography

动态无掩模全息光刻

• 批准号: 0928353
• 负责人: Daniel Cole
• 金额: $ 30万
• 依托单位: University of Pittsburgh
• 依托单位国家: 美国
• 项目类别: Standard Grant
• 财政年份: 2009
• 资助国家: 美国
• 起止时间: 2009-08-15 至 2013-07-31
• 项目状态: 已结题
• 来源: https://www.nsf.gov/awardsearch/showAward?AWD_ID=0928353&HistoricalAwards=false
• 关键词: Dynamic; Maskless; Holographic; Lithography

This research will develop a new lithographic technique called dynamic maskless holographic lithography (DMHL) that achieves maskless lithography by combining holograms and spatial light modulators with photolithography to produce patterns in two and three dimensions. This is a new paradigm in photolithography. Significantly, this process does not require a mask, eliminating a manufacturing step. It provides an approach to micro (and eventually nano) lithography that, if successful, will have low operating costs, low capital investment, and would be flexible in process. The application of holograms to photolithography gives the opportunity to produce patterns in three dimensions, and controlling this using a computer provides flexibility and the ability to manipulate light in real-time, something that cannot be done with fixed masks. The high cost of mask-sets puts conventional lithography out of range for many users; as such, a maskless approach to lithography that is flexible is desirable. An ideal lithography technique would include low operating and capital cost, high fidelity, flexibility in process and materials, ability to pattern on near- or non-planar surfaces, and the ability to manufacture in three dimensions. The DMHL process developed in this research meets many of these criteria. DMHL provides new opportunities for education in optics, microscopy, nanosystems, and lithography. There is a potential future tie-in with an RET program at the University of Pittsburgh, which will bring MEMS engineering and microfabrication to high school teachers, benefiting students in the science and math classroom.

本研究将开发一种新的光刻技术，称为动态无掩模全息光刻（DMHL），该技术将全息图和空间光调制器与光刻相结合，产生二维和三维的图案，从而实现无掩模光刻。这是光刻技术的一个新范例。值得注意的是，该工艺不需要掩模，省去了制造步骤。它提供了一种微（最终是纳米）光刻的方法，如果成功，将具有低运营成本，低资本投资，并且在过程中具有灵活性。全息图在光刻术中的应用提供了产生三维图案的机会，使用计算机控制这一点提供了灵活性和实时操纵光线的能力，这是固定掩模无法做到的。掩模套的高成本使传统光刻技术超出了许多用户的承受范围；因此，一种灵活的无掩模光刻方法是可取的。理想的光刻技术应包括低操作成本和资本成本、高保真度、工艺和材料的灵活性、在近平面或非平面上制作图案的能力，以及在三维空间中制造的能力。本研究开发的DMHL过程符合许多这些标准。DMHL为光学、显微镜、纳米系统和光刻等领域的教育提供了新的机会。该公司未来还将与匹兹堡大学的一个RET项目合作，为高中教师提供MEMS工程和微制造技术，使学生在科学和数学课堂上受益。