Biocatalytic Nanolithography

生物催化纳米光刻

• 批准号: 1000724
• 负责人: Robert Clark
• 金额: --
• 依托单位: Duke University
• 依托单位国家: 美国
• 项目类别: Standard Grant
• 财政年份: 2010
• 资助国家: 美国
• 起止时间: 2010-05-15 至 2010-09-30
• 项目状态: 已结题
• 来源: https://www.nsf.gov/awardsearch/showAward?AWD_ID=1000724&HistoricalAwards=false
• 关键词: Biocatalytic; Nanolithography

The objective of this research is to develop new techniques for creating patterns with nanometer dimensions on technologically important substrates, such as silicon, gallium nitride, and diamond. Almost all micro- and nano-scale patterning is currently carried out using photolithography, a process well suited for high-throughput parallel printing of small surfaces such as computer chips. This technique, however, requires an enormous investment in expensive and complex instrumentation and cannot pattern large surfaces. Soft lithography, a technique in which molecular "inks" are transferred to metallic surfaces from rubber stamps, is an alternative to photolithography but is applicable only to a small range of non-technologically relevant materials, such as gold and silicon oxide. This project will develop a universal soft lithographic method for patterning virtually any metal or semiconductor surface. In this approach, a highly ordered uniform monolayer is placed on a metal or semiconductor surface. In a second step, an elastomeric stamp bearing a catalyst active against the initial monolayer is used to create patterns on the surface in places where the stamp contacts the surface.The work will have an enormous impact on many areas of science and engineering, including nanotechnology, material science, electrical engineering, chemistry, biochemistry, and physics. The ability to pattern technologically relevant substrates will facilitate the development of new sensors, permit the fabrication of novel arrays of cells and biological molecules for the rapid identification of drugs, and allow the construction of 3-dimensional objects with nanoscopic dimensions on virtually any surface. The work will involve both graduate and undergraduate researchers, who will study synthetic chemistry, catalysis and surface characterization.

这项研究的目的是开发新的技术，用于在技术上重要的衬底，如硅，氮化镓和金刚石上创建纳米尺寸的图案。 目前，几乎所有的微米和纳米级图案都是使用光刻法进行的，这是一种非常适合于计算机芯片等小表面的高通量并行打印的工艺。 然而，这种技术需要在昂贵和复杂的仪器上进行巨大的投资，并且不能对大的表面进行图案化。 软平版印刷是一种将分子“墨水”从橡皮图章转移到金属表面的技术，是光刻的替代方法，但仅适用于小范围的非技术相关材料，如金和氧化硅。 本计画将发展一种通用的软性微影技术，可在几乎任何金属或半导体表面形成图案。 在这种方法中，将高度有序的均匀单层放置在金属或半导体表面上。 第二步，使用一个弹性印模，在印模接触表面的地方，在表面上产生图案，印模上带有对初始单层具有活性的催化剂。这项工作将对科学和工程的许多领域产生巨大影响，包括纳米技术，材料科学，电气工程，化学，生物化学和物理学。 图案化技术相关基板的能力将促进新传感器的开发，允许制造用于快速识别药物的新型细胞和生物分子阵列，并允许在几乎任何表面上构建具有纳米尺度的三维物体。 这项工作将涉及研究生和本科生研究人员，他们将学习合成化学，催化和表面表征。