Self-Organized Nanostructure Growth during Ion Bombardment

离子轰击过程中自组织纳米结构的生长

• 批准号: 1006538
• 负责人: Karl Ludwig
• 金额: $ 29.9万
• 依托单位: Trustees of Boston University
• 依托单位国家: 美国
• 项目类别: Standard Grant
• 财政年份: 2010
• 资助国家: 美国
• 起止时间: 2010-07-01 至 2013-06-30
• 项目状态: 已结题
• 来源: https://www.nsf.gov/awardsearch/showAward?AWD_ID=1006538&HistoricalAwards=false
• 关键词: Self; Organized; Nanostructure; Growth; during

Technical: This project aims for greater understanding of semiconductor surface morphology evolution during low energy ion bombardment. The approach is to investigate the effect of seed atoms on nanostructure growth during ion bombardment to identify elementary mechanisms causing self-assembled nanostructure formation. To elucidate the physical processes active, synchrotron-based x-ray techniques along with wafer-curvature stress measurements, atomic force microscopy, x-ray photoelectron spectroscopy and cross section transmission electron microscopy will be used to provide detailed information about the structure and chemical composition of the nanostructured surface. Emphasis will be placed on developing quantitative models to predict the dependence of nanostructure growth morphologies and kinetics on the seeding conditions. Non-technical: The project addresses basic research issues in a topical area of materials science with technological relevance in electronics and photonics. An improved understanding of the surface processes active during ion bombardment could impact sputter etching, sputter deposition, ion beam assisted deposition and plasma processing. The seeding approach examined in this project may allow the control of nanostructure semiconductor surfaces in a straightforward, inexpensive manner. The project is interdisciplinary, providing graduate, undergraduate and high school students with advantageous opportunities to do research that bridges basic research and application, and research across traditional fields of materials science, chemistry, physics, and engineering. In addition to experiencing, and contributing to an important topic centered in forefront materials research, they will learn basic skills required in the use of a wide range of materials characterization tools. Students will interact with a growing materials research community at Boston University and the graduate student will also have an excellent opportunity to participate in the multi-disciplinary synchrotron research environment.

技术：该项目旨在对低能离子轰击期间对半导体表面形态的演变进行更多了解。该方法是研究种子原子对离子轰击期间纳米结构生长的影响，以鉴定引起自组装纳米结构形成的基本机制。为了阐明基于同步加速器的X射线技术的物理过程以及晶状曲面应力测量，原子力显微镜，X射线光电子光谱和横截面透射电子显微镜将用于提供有关纳米结构表面的结构和化学成分的详细信息。将重点放在开发定量模型上，以预测纳米结构生长形态和动力学对播种条件的依赖性。非技术：该项目解决了材料科学主题领域的基础研究问题，具有电子和光子学方面的技术相关性。对离子轰击期间活跃的表面过程的改进理解可能会影响溅射蚀刻，溅射沉积，离子束辅助沉积和等离子体处理。该项目中检查的播种方法可以直接，廉价的方式控制纳米结构半导体表面。该项目是跨学科的，为毕业生，本科生和高中学生提供了有利的研究机会，可以弥合基础研究和应用，并在传统的材料科学，化学，物理和工程领域进行研究。除了体验并为以前列材料研究为中心的重要主题做出贡献之外，他们还将学习使用多种材料表征工具所需的基本技能。学生将与波士顿大学不断增长的材料研究界互动，研究生也将有一个绝佳的机会参加多学科的同步基因研究环境。