Self-Organized Nanostructure Growth during Ion Bombardment
Self-Organized Nanostructure Growth during Ion Bombardment
批准号:
1006538
负责人:
Karl Ludwig
金额:
$29.9万
依托单位国家:
美国
项目类别:
Standard Grant
财政年份:
2010
资助国家:
美国
项目状态:
已结题
起止时间:
2010-07-01 至 2013-06-30
中文摘要
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英文摘要
Technical: This project aims for greater understanding of semiconductor surface morphology evolution during low energy ion bombardment. The approach is to investigate the effect of seed atoms on nanostructure growth during ion bombardment to identify elementary mechanisms causing self-assembled nanostructure formation. To elucidate the physical processes active, synchrotron-based x-ray techniques along with wafer-curvature stress measurements, atomic force microscopy, x-ray photoelectron spectroscopy and cross section transmission electron microscopy will be used to provide detailed information about the structure and chemical composition of the nanostructured surface. Emphasis will be placed on developing quantitative models to predict the dependence of nanostructure growth morphologies and kinetics on the seeding conditions. Non-technical: The project addresses basic research issues in a topical area of materials science with technological relevance in electronics and photonics. An improved understanding of the surface processes active during ion bombardment could impact sputter etching, sputter deposition, ion beam assisted deposition and plasma processing. The seeding approach examined in this project may allow the control of nanostructure semiconductor surfaces in a straightforward, inexpensive manner. The project is interdisciplinary, providing graduate, undergraduate and high school students with advantageous opportunities to do research that bridges basic research and application, and research across traditional fields of materials science, chemistry, physics, and engineering. In addition to experiencing, and contributing to an important topic centered in forefront materials research, they will learn basic skills required in the use of a wide range of materials characterization tools. Students will interact with a growing materials research community at Boston University and the graduate student will also have an excellent opportunity to participate in the multi-disciplinary synchrotron research environment.
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REU Site: BU-PRO: Boston University Physics Research Opportunities
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批准号:2244795
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项目类别:Standard Grant
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资助金额:$51.59万
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财政年份:2023
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负责人:Karl Ludwig
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依托单位:
Collaborative Research: Highly Ordered Nanoscale Patterns Produced by Ion Bombardment of Solid Surfaces: Theory and Experiment
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批准号:2117509
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项目类别:Continuing Grant
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资助金额:$31.5万
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财政年份:2022
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负责人:Karl Ludwig
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依托单位:
REU Site: BU-PRO: Boston University Physics Research Opportunities
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批准号:1852266
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项目类别:Continuing Grant
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资助金额:$33.58万
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财政年份:2019
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负责人:Karl Ludwig
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依托单位:
Coherent X-ray Studies of Surface Growth and Patterning Processes
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批准号:1709380
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项目类别:Standard Grant
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资助金额:$27.11万
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财政年份:2017
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负责人:Karl Ludwig
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依托单位:
Surface Nanopatterning by Ion Bombardment
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批准号:1307979
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项目类别:Continuing Grant
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资助金额:$33.83万
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财政年份:2013
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负责人:Karl Ludwig
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依托单位:
MRI: Acquisition of an Advanced Materials X-ray Diffraction System
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批准号:1337471
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项目类别:Standard Grant
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资助金额:$45.5万
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财政年份:2013
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负责人:Karl Ludwig
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依托单位:
Coherent X-Ray Scattering Studies of Phase Transitions in Metals
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批准号:0508630
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项目类别:Continuing Grant
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资助金额:$30.0万
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财政年份:2005
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负责人:Karl Ludwig
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依托单位:
Real-time X-ray Studies of Surface Evolution During Ion Bombardment and Plasma Processing
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批准号:0507351
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项目类别:Continuing Grant
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资助金额:$0.0万
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财政年份:2005
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负责人:Karl Ludwig
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依托单位:
In-situ X-ray Studies of Surface Structure during Plasma Processing
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批准号:0208011
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项目类别:Continuing Grant
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资助金额:$32.19万
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财政年份:2002
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负责人:Karl Ludwig
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依托单位:
Development of a System for Studies of Surface Structure during Plasma Processing and Student Training
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批准号:0114154
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项目类别:Standard Grant
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资助金额:$8.4万
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财政年份:2001
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负责人:Karl Ludwig
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依托单位:
MRI: Development of a Surface Scattering System for Real-time X-ray Studies of Growth and Processing
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批准号:0116567
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项目类别:Standard Grant
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资助金额:$12.0万
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财政年份:2001
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负责人:Karl Ludwig
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依托单位:
Kinetics of Phase Transformations
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批准号:9633596
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项目类别:Continuing Grant
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资助金额:$29.35万
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财政年份:1996
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负责人:Karl Ludwig
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依托单位:
GOALI: In-situ Real Time Studies of Silicide Growth Kinetics in Submicron Structures
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批准号:9515181
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项目类别:Continuing Grant
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资助金额:$29.5万
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财政年份:1996
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负责人:Karl Ludwig
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依托单位:
海外基金