Coherent X-ray Studies of Surface Growth and Patterning Processes

表面生长和图案化过程的相干 X 射线研究

• 批准号: 1709380
• 负责人: Karl Ludwig
• 金额: $ 27.11万
• 依托单位: Trustees of Boston University
• 依托单位国家: 美国
• 项目类别: Standard Grant
• 财政年份: 2017
• 资助国家: 美国
• 起止时间: 2017-08-01 至 2020-07-31
• 项目状态: 已结题
• 来源: https://www.nsf.gov/awardsearch/showAward?AWD_ID=1709380&HistoricalAwards=false
• 关键词: Coherent; ray; Studies; Surface; Growth

Nontechnical description: Controlling the growth and nanometer-scale patterning of materials surfaces is critical to many applications in energy, communication and information technologies. However, a major impediment to developing more useful materials is the difficulty of measuring the evolution of surface structure during such processes. This research meets that challenge by using very intense x-rays to measure the nanometer-scale dynamics on surfaces during growth and patterning. These experiments are made possible by the use of the latest x-ray sources, which have been rapidly developing increasing brightness. The experimental measurements are compared with predictions of theory and computer simulations, leading to increased understanding and predictive power. Such knowledge can help scientists and engineers better control surface processes on materials, enhancing their technological capabilities. In addition, the project trains graduate, undergraduate and high school students in this very important and rapidly developing part of materials research, leading to future careers in materials innovation.Technical description: This research is developing x-ray photon correlation spectroscopy as a powerful new approach to investigating the nanoscale dynamics of surfaces during growth and ion beam patterning. Given the technique?s early stage of application to such challenging problems, it is important to examine the range of its capabilities. This project is therefore investigating a carefully chosen set of systems and behaviors. First, it is being used to carefully probe the fundamental processes in kinetic roughening during amorphous film growth, an issue of long-standing interest and controversy. Second, the applicability of the technique to investigating epitaxial growth processes is being examined within the context of vapor deposition of organic semiconductor films and plasma-assisted atomic layer epitaxial growth of III-V nitride epitaxial films. Finally, the dynamics of semiconductor ion beam nanopatterning, an issue generating unusually close interaction between experiment and theory, is being studied. In all cases, simulations of continuum and atomistic models are being performed to relate observations to underlying mechanisms. Graduate, undergraduate and high school students involved have an outstanding opportunity to work in an area that bridges basic research and application. Participating students learn a wide range of characterization and computational tools that can translate well to future careers in industry or academia.

非技术描述：控制材料表面的生长和纳米尺度图案对于能源，通信和信息技术的许多应用至关重要。 但是，开发更有用的材料的主要障碍是难以测量此类过程中表面结构的演变。 这项研究通过使用非常激烈的X射线来测量生长和模式期间表面上的纳米尺度动力学来满足这一挑战。 通过使用最新的X射线源使这些实验成为可能，这些X射线源已迅速发展出亮度。 将实验测量与理论和计算机模拟的预测进行比较，从而增加了理解力和预测能力。 这些知识可以帮助科学家和工程师更好地控制材料上的表面过程，从而增强其技术能力。 此外，该项目将在这项非常重要且迅速发展的材料研究中培训毕业生，本科和高中生，从而实现了材料创新的未来职业。技术描述：这项研究正在开发X射线光子相关光谱，作为一种强大的新方法，可在生长和离子束模式下研究表面的纳米级动力学。 鉴于技术在此类挑战性问题上的早期阶段，检查其能力范围很重要。 因此，该项目正在研究一组精心选择的系统和行为。 首先，它被用来仔细探测非晶膜增长过程中动力学粗糙的基本过程，这是一个长期存在的兴趣和争议的问题。 其次，在有机半导体膜的蒸气沉积和等离子体辅助的原子层的蒸气沉积的背景下，正在研究该技术在研究外延生长过程中的适用性。最后，正在研究半导体离子束纳米图案的动力学，这是一个在实验和理论之间产生异常紧密相互作用的问题。 在所有情况下，正在进行对连续性和原子模型的模拟，以将观察结果与潜在机制联系起来。 研究生，本科生和高中生参与其中，有很棒的机会在桥接基础研究和应用的领域工作。 参与的学生学习了广泛的表征和计算工具，可以很好地转化为行业或学术界的未来职业。

项目成果

Influence of temperature on atomic layer epitaxial growth of indium nitride assessed with in situ grazing incidence small-angle x-ray scattering

原位掠入射小角X射线散射评估温度对氮化铟原子层外延生长的影响

• DOI: 10.1116/1.5081919
• 发表时间: 2019
• 期刊: Journal of Vacuum Science & Technology A
• 影响因子: 2.9
• 作者: Woodward, Jeffrey M.;Rosenberg, Samantha G.;Kozen, Alexander C.;Nepal, Neeraj;Johnson, Scooter D.;Wagenbach, Christa;Rowley, Andrew H.;Robinson, Zachary R.;Joress, Howie;Ludwig, Karl F.
• 通讯作者: Ludwig, Karl F.

Nanoscale kinetics and dynamics during Ar+ patterning of SiO2

SiO2 Ar 图案化过程中的纳米级动力学和动力学

• DOI: 10.1103/physrevb.99.165429
• 发表时间: 2019
• 期刊: Physical Review B
• 影响因子: 3.7
• 作者: Mokhtarzadeh, Mahsa;Ulbrandt, Jeffrey G.;Myint, Peco;Narayanan, Suresh;Headrick, Randall L.;Ludwig, Karl F.
• 通讯作者: Ludwig, Karl F.

Low temperature surface preparation of GaN substrates for atomic layer epitaxial growth: Assessment of ex situ preparations

用于原子层外延生长的 GaN 衬底的低温表面制备：异位制备的评估

• DOI: 10.1116/1.5080090
• 发表时间: 2019
• 期刊: Journal of Vacuum Science & Technology A
• 影响因子: 2.9
• 作者: Rosenberg, Samantha G.;Pennachio, Daniel J.;Wagenbach, Christa;Johnson, Scooter D.;Nepal, Neeraj;Kozen, Alexander C.;Woodward, Jeffrey M.;Robinson, Zachary;Joress, Howie;Ludwig, Karl F.
• 通讯作者: Ludwig, Karl F.

Coherent X-ray measurement of step-flow propagation during growth on polycrystalline thin film surfaces

• DOI: 10.1038/s41467-019-10629-8
• 发表时间: 2019-06-14
• 期刊: NATURE COMMUNICATIONS
• 影响因子: 16.6
• 作者: Headrick, Randall L.;Ulbrandt, Jeffrey G.;Ludwig, Karl F., Jr.
• 通讯作者: Ludwig, Karl F., Jr.