Real-time X-ray Studies of Surface Evolution During Ion Bombardment and Plasma Processing

技术说明本项目研究离子轰击过程中表面处理的基本原理。理论和实验工作表明，这是一个复杂的过程，在某些情况下，导致了明确定义的表面不稳定性，产生了长度从10到1000纳米的结构。这个项目解决了有关主导进程及其在特定情况下的影响的基本问题。与事后研究相比，实时研究加工过程中的表面演变具有天然的优势，PI在布鲁克海文国家实验室的国家同步辐射光源(NSLS)开发了一种独特的设施，用于实时研究表面加工。这种方法有望对离子轰击过程中表面形态的变化进行详细研究。该项目旨在更好地了解离子轰击期间的各种材料行为，并最终了解等离子体处理过程。在与进行理论和模拟的合作者保持密切联系的同时，将研究离子轰击过程中应力对表面演变的影响，离子增强表面弛豫的性质，离子轰击过程中光刻制造的纳米结构的演变，以及在有和没有旋转样品的情况下离子轰击时化合物半导体的结构演变。非技术解释该项目涉及与电子和光子学有很强技术相关性的基础材料研究，并有效地将研究和教育结合在一起。作为这一研究项目的一部分，研究生、本科生和高中学生将参与学习当前材料研究前沿的科学和技术问题。通过与国家实验室和其他大学的科学家继续合作，这些学生将有特殊的机会参与到广泛的研究环境中。该计划包括支持两名研究生在这些领域进行博士研究。预计在任何时候，都会有1-2名本科生积极参与该项目。通过波士顿大学现有的夏季高中荣誉计划，PI还希望每年在该项目中指导一名高中生。

TECHNICAL EXPLANATION This project addresses fundamentals of surface processes during ion bombardment. Theoretical and experimental work has shown it to be a complex process, leading in some cases to well-defined surface instabilities that produce structures on length scales from 10 to 1000 nm. This project addresses fundamental issues about the dominant processes acting and their effects in particular situations. Real-time investigations of surface evolution during processing have natural advantages over post facto studies, and the PI has developed a unique facility at the National Synchrotron Light Source (NSLS) of Brookhaven National Laboratory for real-time investigation of surface processing. This approach is expected to enable detailed studies of how surface morphology changes during ion bombardment. The project aims to better understand a wide range of materials behavior during ion bombardment and, ultimately, plasma processing. While maintaining close contact with collaborators performing theory and simulations, studies will be made into the effects of stress on surface evolution during ion bombardment, the nature of ion-enhanced surface relaxation, the evolution of lithographically fabricated nanoscale structures during ion bombardment, and the structural evolution of compound semiconductors during ion bombardment both with and without sample rotation. NON-TECHNICAL EXPLANATIONThe project addresses fundamental materials research with strong technological relevance to electronics and photonics, and effectively integrates research and education. As part of this research project, students at the graduate, undergraduate and high school levels will be involved in learning about scientific and technological issues at the forefront of current materials research. Through continuing collaborations with scientists at national labs and other universities, these students will have special opportunities to participate in a broad spectrum of research environments. The program includes support for two graduate students performing their doctoral research in these areas. It is anticipated that 1-2 undergraduate students will be actively engaged with the program at any given time. The PI also, through Boston University's existing summer High School Honor's program, expects to mentor a high school student in the project each year.