Real-time X-ray Studies of Surface Evolution During Ion Bombardment and Plasma Processing

技术解释 该项目解决了离子轰击过程中表面过程的基本原理。理论和实验工作表明，这是一个复杂的过程，在某些情况下，导致明确的表面不稳定性，产生的结构长度尺度从10到1000纳米。这个项目解决的基本问题，占主导地位的过程中发挥作用，并在特定的情况下，其影响。加工过程中表面演变的实时调查比事后研究具有天然优势，PI在布鲁克海文国家实验室的国家同步加速器光源（NSLS）开发了一种独特的设施，用于表面加工的实时调查。这种方法有望详细研究离子轰击过程中表面形态的变化。该项目旨在更好地了解离子轰击和等离子体加工过程中的各种材料行为。在与合作者进行理论和模拟保持密切联系的同时，将研究离子轰击过程中应力对表面演变的影响，离子增强表面弛豫的性质，离子轰击过程中光刻制造的纳米级结构的演变，以及离子轰击过程中化合物半导体的结构演变，无论是否有样品旋转。非技术解释该项目致力于基础材料研究，与电子和光子学具有很强的技术相关性，并有效地整合了研究和教育。作为该研究项目的一部分，研究生，本科生和高中生将参与学习当前材料研究前沿的科学和技术问题。通过与国家实验室和其他大学的科学家继续合作，这些学生将有特殊的机会参与广泛的研究环境。该计划包括支持两名研究生在这些领域进行博士研究。预计1-2名本科生将在任何时候积极参与该计划。PI还通过波士顿大学现有的暑期高中荣誉项目，希望每年在该项目中指导一名高中生。

TECHNICAL EXPLANATION This project addresses fundamentals of surface processes during ion bombardment. Theoretical and experimental work has shown it to be a complex process, leading in some cases to well-defined surface instabilities that produce structures on length scales from 10 to 1000 nm. This project addresses fundamental issues about the dominant processes acting and their effects in particular situations. Real-time investigations of surface evolution during processing have natural advantages over post facto studies, and the PI has developed a unique facility at the National Synchrotron Light Source (NSLS) of Brookhaven National Laboratory for real-time investigation of surface processing. This approach is expected to enable detailed studies of how surface morphology changes during ion bombardment. The project aims to better understand a wide range of materials behavior during ion bombardment and, ultimately, plasma processing. While maintaining close contact with collaborators performing theory and simulations, studies will be made into the effects of stress on surface evolution during ion bombardment, the nature of ion-enhanced surface relaxation, the evolution of lithographically fabricated nanoscale structures during ion bombardment, and the structural evolution of compound semiconductors during ion bombardment both with and without sample rotation. NON-TECHNICAL EXPLANATIONThe project addresses fundamental materials research with strong technological relevance to electronics and photonics, and effectively integrates research and education. As part of this research project, students at the graduate, undergraduate and high school levels will be involved in learning about scientific and technological issues at the forefront of current materials research. Through continuing collaborations with scientists at national labs and other universities, these students will have special opportunities to participate in a broad spectrum of research environments. The program includes support for two graduate students performing their doctoral research in these areas. It is anticipated that 1-2 undergraduate students will be actively engaged with the program at any given time. The PI also, through Boston University's existing summer High School Honor's program, expects to mentor a high school student in the project each year.