Large Area, Rapid Manufacturing of Virtually Any Nanopattern Using Nanopantography

使用纳米缩放技术大面积、快速制造几乎任何纳米图案

• 批准号: 1030620
• 负责人: Vincent Donnelly
• 金额: $ 45万
• 依托单位: University of Houston
• 依托单位国家: 美国
• 项目类别: Standard Grant
• 财政年份: 2010
• 资助国家: 美国
• 起止时间: 2010-09-01 至 2014-08-31
• 项目状态: 已结题
• 来源: https://www.nsf.gov/awardsearch/showAward?AWD_ID=1030620&HistoricalAwards=false
• 关键词: Large; Area; Rapid; Manufacturing; Virtually

The goal of this research project is to improve the resolution and writing speed of "nanopantography", to make it a manufacturing-worthy process. This research will make it possible to manufacture any desired nanopattern, in a variety of materials, over large areas, with relatively short processing times. It will build on a "nanopantography" method that has been successfully demonstrated. This method uses a large area ion beam, directed at an array of electrostatic microlenses fabricated on a substrate. By applying appropriate voltages to the microlenses and "rocking" the substrate in a controlled fashion, "beamlets" entering the lenses focus to spots that can be rastered across the substrate in a massively parallel fashion, allowing patterns to be written quickly at beyond state-of-the-art resolution of 5 nanometers or less. Improvements will result in a 300 mm-diameter full wafer processing time of ~30 mins, a relatively high throughput, considering that there would be only a few steps requiring ultra-high resolution nanopatterning in a device fabrication process.This work will provide challenging projects for two PhD students and two undergraduates, with rich scientific and educational payoffs, as well as technological advances. Basic knowledge will emerge on nanofabrication, advanced plasma sources, and ion-surface interactions. The project will have broad societal impact on diverse areas of nanotechnology, including microelectronic devices, bio-sensors, and displays. Outreach activities will increase public awareness for societal benefits of plasmas applied to nanotechnology. As part of this effort, undergraduate students and a high school teacher will be involved in the project.

该研究项目的目标是提高“纳米缩放”的分辨率和写入速度，使其成为适合制造的工艺。这项研究将使得在相对较短的加工时间内用各种材料、大面积制造任何所需的纳米图案成为可能。它将建立在已成功演示的“纳米缩放”方法的基础上。该方法使用大面积离子束，直接照射在基板上制造的静电微透镜阵列。通过向微透镜施加适当的电压并以受控方式“摇动”基板，进入透镜的“小束”聚焦到可以以大规模并行方式在基板上光栅化的点，从而能够以超过 5 纳米或更小的最先进分辨率快速写入图案。考虑到器件制造过程中需要超高分辨率纳米图案化的步骤很少，改进后的 300 毫米直径全晶圆处理时间约为 30 分钟，这是一个相对较高的吞吐量。这项工作将为两名博士生和两名本科生提供具有挑战性的项目，带来丰富的科学和教育回报以及技术进步。关于纳米加工、先进等离子体源和离子表面相互作用的基础知识将会出现。该项目将对纳米技术的各个领域产生广泛的社会影响，包括微电子设备、生物传感器和显示器。外展活动将提高公众对应用于纳米技术的等离子体的社会效益的认识。作为这项工作的一部分，本科生和一名高中教师将参与该项目。