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SBIR Phase I: Defect-Free Nano-Scale Printing: An Enabling Technology for Nanofabrication

SBIR Phase I: Defect-Free Nano-Scale Printing: An Enabling Technology for Nanofabrication
SBIR 第一阶段:无缺陷纳米级印刷:纳米制造的使能技术
批准号:
1248924
负责人:
Carmen Menoni
金额:
$15.0万
依托单位:
依托单位国家:
美国
项目类别:
Standard Grant
财政年份:
2013
资助国家:
美国
项目状态:
已结题
起止时间:
2013-01-01 至 2013-12-31

项目摘要

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中文摘要
翻译
这个小企业创新研究第一阶段项目将开发一种紧凑的,桌面,高通量的纳米光刻工具,能够打印任意形状的周期性特征阵列,具有低于50纳米的特征尺寸无缺陷。创新的印刷工具利用了塔尔博特效应,其中相干照明的周期性衍射结构(塔尔博特掩模)通过在称为塔尔博特平面的平面处的衍射而自成像,而不使用任何光学器件。使用极紫外(EUV)激光的相干照明允许将包含纳米级图案的掩模复制到光致抗蚀剂上。该方法是非接触的,它是无缺陷的,因为掩模中的任何缺陷都是在整个成像场上平均的。 该方法使用由XUV Lasers Inc.商业化的高平均功率、高相干台式EUV激光器。 拟议的紧凑型工具将带来具有成本效益的纳米图案化的能力,以小规模的公司和大学laborators.The更广泛的影响/商业潜力,该项目是在其能力,以简化纳米结构的周期性阵列的打印。 桌面纳米印刷EUV系统将显著提高以负担得起的多功能方式制造纳米结构的能力。 它的主要属性是它在纳米结构的印刷中提供无缺陷的印刷、高吞吐量和成本效益。 这些能力可能会对各个学科产生广泛的影响,包括材料科学,先进的光学元件制造,纳米电子学,生物学和医学。 纳米印刷工具针对需要印刷用于纳米结构生长的模板、化学微传感器、气体分离膜以及制造高密度衍射光栅、短波长光偏振器和等离子体结构的市场。
英文摘要
This Small Business Innovation Research Phase I project will develop a compact, table top, high-throughput nano-photolithography tool capable to print arrays of periodic features of arbitrary shape with sub-50 nm feature size defect-free. The innovative printing tool makes use of the Talbot effect, in which a coherently illuminated periodic diffractive structure (the Talbot mask) self-images by diffraction at planes known as Talbot planes without the use of any optics. Coherent illumination with extreme ultraviolet (EUV) laser light allows replication of masks containing nano-scale patterns onto photoresist. The method is non-contact and it is defect-free as any defect in the mask is averaged over the entire imaging field. The method uses a high average power, highly coherent table-top EUV laser commercialized by XUV Lasers Inc. The proposed compact tool will bring cost-effective nano-patterning capabilities to small size companies and university laboratories.The broader impact/commercial potential of this project is in its ability to simplify the printing of periodic arrays of nanostructures. The table-top nano-printing EUV system will significantly enhance the capabilities to fabricate nanostructures in an affordable and versatile way. Its main attributes are that it offers defect-free printing, high through-put, and cost-effectiveness in the printing of nanostructures. These capabilities could have a broad impact in various disciplines, including material science, advanced optical component manufacturing, nanoelectronics, biology and medicine. The nano-printing tool is aimed at markets that require the printing of templates for nanostructure growth, chemical micro-sensors, gas separation membranes, and the fabrication of high density diffraction gratings, short wavelength light polarizers, and plasmonic structures.
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Collaborative Research: Center for Coatings Research
  • 批准号:
    2309297
  • 项目类别:
    Continuing Grant
  • 资助金额:
    $21.03万
  • 财政年份:
    2023
  • 负责人:
    Carmen Menoni
  • 依托单位:
Coatings for Next Generation Gravitational Wave Interferometers
  • 批准号:
    2110101
  • 项目类别:
    Standard Grant
  • 资助金额:
    $44.99万
  • 财政年份:
    2021
  • 负责人:
    Carmen Menoni
  • 依托单位:
Collaborative Research: LSC Center for Coatings Research
  • 批准号:
    2012024
  • 项目类别:
    Standard Grant
  • 资助金额:
    $29.68万
  • 财政年份:
    2020
  • 负责人:
    Carmen Menoni
  • 依托单位:
Collaborative Research: LSC Center for Coatings Research
  • 批准号:
    1708010
  • 项目类别:
    Standard Grant
  • 资助金额:
    $27.88万
  • 财政年份:
    2017
  • 负责人:
    Carmen Menoni
  • 依托单位:
国内基金
海外基金
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  • 批准号:
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  • 项目类别:
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地幔含水相Phase E的温度压力稳定区域与晶体结构研究
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  • 项目类别:
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  • 资助金额:
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  • 批准年份:
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  • 负责人:
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基于数字增强干涉的Phase-OTDR高灵敏度定量测量技术研究