Development of Novel Instrumentation for the Growth of Low Dimensional Structures Using Molecular Beam Epitaxy
Development of Novel Instrumentation for the Growth of Low Dimensional Structures Using Molecular Beam Epitaxy
批准号:
9871210
负责人:
Carmen Menoni
金额:
$24.33万
依托单位国家:
美国
项目类别:
Standard Grant
财政年份:
1998
资助国家:
美国
项目状态:
已结题
起止时间:
1998-09-01 至 2002-08-31
中文摘要
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英文摘要
9871210 Menoni The ability to tailor the optical and electronic properties of low dimensional semiconductor structures with increased quantum confinement makes these structures attractive candidates for the design of optoelectronic devices. Fabrication of nanostructures that constrain the carriers to move in either one direction or within atomic clusters, as in quantum wires and quantum dots respectively, is a technological challenge. The PIs propose to develop novel instrumentation for the growth of low dimensional structures that incorporates optical manipulation of atomic species during the molecular beam epitaxy growth of III-V heterostructures. Laser beams will be introduced noninvasively into the MBE chamber. The radiation force generated by counter-propagating laser beams will be used to focus the Group III specie into an array of lines or dots to form periodic quantum wire or quantum dot structures with sub- 100nm feature size. This will create a composition modulation in the growth plane consisting of regions that are rich in the III-specie separated by regions that have been depleted of the III-specie. Such composition modulation will confine the carriers in either one or two directions in the plane of growth, depending on whether one or two mutually perpendicular standing waves of light are used to focus the atomic beam. Carrier confinement in the growth direction will be accomplished by sandwiching the composition-modulated layer with confinement layers of appropriate composition. The instrument will add a radically new capability to conventional MBE growth process without significantly altering the growth conditions. The proposed instrumentation will allow for the demonstration of a growth method that will provide unprecedented control in the location and size of the nanostructures ***
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SBIR Phase I: Defect-Free Nano-Scale Printing: An Enabling Technology for Nanofabrication
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财政年份:2013
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依托单位:
Gain and Recombination in InGaAsN and Their Impact on the Laser Output Behavior
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批准号:0314410
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项目类别:Continuing Grant
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资助金额:$0.0万
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财政年份:2003
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依托单位:
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依托单位:
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财政年份:1995
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依托单位:
Study of Pure Strain Effects for Improved Long Wavelength Semiconductor Lasers
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Characterization of Carrier Confinement in Short Wavelength Indium Gallium Aluminum Phosphide Heterostructures for Optoelectronics
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依托单位:
REU: Femtosecond Dynamics of Novel Optoelectronic Materials
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依托单位:
国内基金
海外基金
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