MRI: Acquisition of reactive ion etching and chemical vapor deposition instrument for electronic and optical device fabrication.

这项来自主要研究仪器项目的奖励支持俄勒冈大学尤金分校（UO）获得电感耦合等离子体反应离子蚀刻仪器。该仪器将被安置在俄勒冈州先进材料表征中心（CAMCOR）的半导体纳米制造/表征设施中。该仪器将极大地增强CAMCOR的纳米制造能力，并将在UO和俄勒冈州立大学（OSU）的广泛研究项目中发挥推动作用。该仪器将实现用于太阳能和能量转换应用的三维半导体纳米结构和混合无机半导体界面的制造，用于量子信息处理的金刚石纳米柱和微盘的制造，无机溶液加工薄膜的图像化化学的开发和理解，以及具有独特纳米光学性质的金属介电结构材料的制造。该仪器还将用于UO硕士在半导体器件和光伏方面的实习计划。作为CAMCOR的一部分，该仪器将直接加强大量研究生和本科生的研究和教育。非技术摘要：从表面上可控地去除或添加材料的能力对于生产具有纳米尺度特征的三维结构非常重要。这些特性对于构建和研究与推进新能源转换和计算技术相关的各种先进材料和设备至关重要。主要研究仪器项目提供资金支持俄勒冈大学（UO）购买电感耦合等离子体反应离子蚀刻仪器。该仪器将提供最先进的蚀刻（去除）和沉积（添加）无机材料的能力，这是俄勒冈州立大学和UO的研究人员目前无法获得的。该仪器将被安置在俄勒冈大学校园内一个开放访问的共享纳米制造设施，即俄勒冈州先进材料表征中心（CAMCOR），因此将得到专业维护，供整个地区学术界和工业界的研究人员使用。UO的半导体器件和光伏硕士实习项目将把仪器的使用纳入其课程，以便进入工业界的学生接受这项重要技术的培训。

DMR-1337711WangThis award from the Major Research Instrumentation Program supports the University of Oregon (UO) Eugene with the acquisition of an inductively-coupled plasma reactive ion etching instrument. The instrument will be housed in the semiconductor nanofabrication/characterization facility of the Center for Advanced Materials Characterization in Oregon (CAMCOR) at the UO. The instrument will greatly augment the nanofabrication capabilities at CAMCOR and will play an enabling role in a broad range of research programs at the UO and Oregon State University (OSU). The instrument will enable the fabrication of three-dimensional semiconductor nanostructures and hybrid inorganic semiconductor interfaces for solar energy and energy conversion applications, the fabrication of diamond nanopillars and microdisks for applications in quantum information processing, the development and understanding of the patterning chemistry of inorganic solution-processed films, and the fabrication of metallodielectric structured materials with unique nano-optical properties. The instrument will also be used for the UO Master's internship program in semiconductor devices and photovoltaics. As a part of CAMCOR, the instrument will directly enhance the research and education of a large number of graduate and undergraduate students. Non-technical abstract:The ability to controllably remove or add material from a surface is important for producing three-dimensional structures with nanometer-scale features. These features are critical for building and studying a variety of advanced materials and devices that are relevant to advancing new energy conversion and computing technologies. The Major Research Instrumentation program provides funds to support the University of Oregon (UO) with the acquisition of an inductively-coupled plasma reactive ion etching instrument. The instrument will provide state-of-the-art capabilities in etching (removing) and deposition (adding) of inorganic materials that are not currently available to researchers at both Oregon State University and the UO. The instrument will be housed in an open-access shared nanofabrication facility, the Center for Advanced Materials Characterization in Oregon (CAMCOR), on the UO campus and thus be professionally maintained and available for use by researchers in academia and industry throughout the region. The UO Master's internship program in semiconductor devices and photovoltaics will incorporate the use of the instrument into its curriculum, so that students entering industry are trained in this important technology.