MRI: Acquisition of reactive ion etching and chemical vapor deposition instrument for electronic and optical device fabrication.

DMR-1337711王这项来自重大研究仪器计划的奖项支持俄勒冈大学尤金公司购买电感耦合等离子体反应离子刻蚀仪器。该仪器将安装在俄勒冈州先进材料表征中心(CAMCOR)位于俄勒冈州的半导体纳米制造/表征设施中。该仪器将极大地增强CAMCOR的纳米制造能力，并将在密歇根大学和俄勒冈州立大学(OSU)的广泛研究计划中发挥有利作用。该仪器将能够制造用于太阳能和能量转换应用的三维半导体纳米结构和混合无机半导体接口，制造用于量子信息处理的金刚石纳米管和微盘，开发和了解无机溶液处理薄膜的图案化化学，以及制造具有独特纳米光学性能的金属介电结构材料。该仪器还将用于UO硕士在半导体设备和光伏领域的实习计划。作为CAMCOR的一部分，该仪器将直接加强对大量研究生和本科生的研究和教育。非技术摘要：可控地从表面移除或添加材料的能力对于制造具有纳米级特征的三维结构是重要的。这些功能对于构建和研究各种先进材料和设备至关重要，这些材料和设备与推进新能源转换和计算技术相关。重大研究仪器计划提供资金，支持俄勒冈大学(UO)收购感应耦合等离子体反应离子刻蚀仪器。该仪器将在蚀刻(移除)和沉积(添加)无机材料方面提供最先进的能力，而俄勒冈州立大学和俄勒冈大学的研究人员目前都无法获得这些能力。该仪器将放置在俄勒冈州先进材料表征中心(CAMCOR)的开放式共享纳米制造设施中，并因此得到专业维护，供该地区学术界和工业界的研究人员使用。UO硕士在半导体设备和光伏领域的实习计划将把仪器的使用纳入其课程，以便进入行业的学生接受这项重要技术的培训。

DMR-1337711WangThis award from the Major Research Instrumentation Program supports the University of Oregon (UO) Eugene with the acquisition of an inductively-coupled plasma reactive ion etching instrument. The instrument will be housed in the semiconductor nanofabrication/characterization facility of the Center for Advanced Materials Characterization in Oregon (CAMCOR) at the UO. The instrument will greatly augment the nanofabrication capabilities at CAMCOR and will play an enabling role in a broad range of research programs at the UO and Oregon State University (OSU). The instrument will enable the fabrication of three-dimensional semiconductor nanostructures and hybrid inorganic semiconductor interfaces for solar energy and energy conversion applications, the fabrication of diamond nanopillars and microdisks for applications in quantum information processing, the development and understanding of the patterning chemistry of inorganic solution-processed films, and the fabrication of metallodielectric structured materials with unique nano-optical properties. The instrument will also be used for the UO Master's internship program in semiconductor devices and photovoltaics. As a part of CAMCOR, the instrument will directly enhance the research and education of a large number of graduate and undergraduate students. Non-technical abstract:The ability to controllably remove or add material from a surface is important for producing three-dimensional structures with nanometer-scale features. These features are critical for building and studying a variety of advanced materials and devices that are relevant to advancing new energy conversion and computing technologies. The Major Research Instrumentation program provides funds to support the University of Oregon (UO) with the acquisition of an inductively-coupled plasma reactive ion etching instrument. The instrument will provide state-of-the-art capabilities in etching (removing) and deposition (adding) of inorganic materials that are not currently available to researchers at both Oregon State University and the UO. The instrument will be housed in an open-access shared nanofabrication facility, the Center for Advanced Materials Characterization in Oregon (CAMCOR), on the UO campus and thus be professionally maintained and available for use by researchers in academia and industry throughout the region. The UO Master's internship program in semiconductor devices and photovoltaics will incorporate the use of the instrument into its curriculum, so that students entering industry are trained in this important technology.