MRI: Acquisition of reactive ion etching and chemical vapor deposition instrument for electronic and optical device fabrication.

DMR-1337711 Wang来自重大研究仪器计划的该奖项支持俄勒冈州大学（UO）尤金获得电感耦合等离子体反应离子蚀刻仪器。该仪器将被安置在位于UO的俄勒冈州先进材料表征中心（CAMCOR）的半导体纳米制造/表征设施中。 该仪器将大大增强CAMCOR的纳米制造能力，并将在UO和俄勒冈州州立大学（OSU）的广泛研究项目中发挥促进作用。该仪器将能够制造三维半导体纳米结构和混合无机半导体界面用于太阳能和能量转换应用，制造金刚石纳米柱和微盘用于量子信息处理，开发和理解无机溶液处理膜的图案化化学，以及制造具有独特纳米光学特性的金属介电结构材料。 该仪器还将用于UO硕士的半导体器件和光电子学实习计划。 作为CAMCOR的一部分，该仪器将直接加强大量研究生和本科生的研究和教育。 非技术摘要：可控地从表面去除或添加材料的能力对于生产具有纳米尺度特征的三维结构非常重要。这些特性对于构建和研究与推进新能源转换和计算技术相关的各种先进材料和设备至关重要。主要研究仪器计划提供资金，以支持俄勒冈州（UO）的大学与电感耦合等离子体反应离子蚀刻仪器的收购。该仪器将提供蚀刻（去除）和沉积（添加）无机材料的最先进的能力，目前俄勒冈州州立大学和UO的研究人员还无法获得这些能力。该仪器将被安置在一个开放的共享纳米实验室设施，先进材料表征中心在俄勒冈州（CAMCOR），在UO校园，从而专业维护和可供研究人员在学术界和工业界使用整个地区。UO硕士的半导体器件和光电子学实习计划将把仪器的使用纳入其课程，以便进入工业的学生接受这一重要技术的培训。

DMR-1337711WangThis award from the Major Research Instrumentation Program supports the University of Oregon (UO) Eugene with the acquisition of an inductively-coupled plasma reactive ion etching instrument. The instrument will be housed in the semiconductor nanofabrication/characterization facility of the Center for Advanced Materials Characterization in Oregon (CAMCOR) at the UO. The instrument will greatly augment the nanofabrication capabilities at CAMCOR and will play an enabling role in a broad range of research programs at the UO and Oregon State University (OSU). The instrument will enable the fabrication of three-dimensional semiconductor nanostructures and hybrid inorganic semiconductor interfaces for solar energy and energy conversion applications, the fabrication of diamond nanopillars and microdisks for applications in quantum information processing, the development and understanding of the patterning chemistry of inorganic solution-processed films, and the fabrication of metallodielectric structured materials with unique nano-optical properties. The instrument will also be used for the UO Master's internship program in semiconductor devices and photovoltaics. As a part of CAMCOR, the instrument will directly enhance the research and education of a large number of graduate and undergraduate students. Non-technical abstract:The ability to controllably remove or add material from a surface is important for producing three-dimensional structures with nanometer-scale features. These features are critical for building and studying a variety of advanced materials and devices that are relevant to advancing new energy conversion and computing technologies. The Major Research Instrumentation program provides funds to support the University of Oregon (UO) with the acquisition of an inductively-coupled plasma reactive ion etching instrument. The instrument will provide state-of-the-art capabilities in etching (removing) and deposition (adding) of inorganic materials that are not currently available to researchers at both Oregon State University and the UO. The instrument will be housed in an open-access shared nanofabrication facility, the Center for Advanced Materials Characterization in Oregon (CAMCOR), on the UO campus and thus be professionally maintained and available for use by researchers in academia and industry throughout the region. The UO Master's internship program in semiconductor devices and photovoltaics will incorporate the use of the instrument into its curriculum, so that students entering industry are trained in this important technology.