MRI: Acquisition of a Photonic Materials Molecular Beam Epitaxy System

MRI：获取光子材料分子束外延系统

• 批准号: 1337783
• 负责人: Thomas Vandervelde
• 金额: $ 108.61万
• 依托单位: Tufts University
• 依托单位国家: 美国
• 项目类别: Standard Grant
• 财政年份: 2013
• 资助国家: 美国
• 起止时间: 2013-09-01 至 2017-08-31
• 项目状态: 已结题
• 来源: https://www.nsf.gov/awardsearch/showAward?AWD_ID=1337783&HistoricalAwards=false
• 关键词: MRI; Acquisition; Photonic; Materials; Molecular

Objective: Through this grant we plan to assemble a multi-chamber semiconductor epitaxy system to enable the creation of high-quality optoelectronic materials and devices. This apparatus will consist of an automated molecular beam epitaxy (MBE) system with access to at least two epitaxy chambers. The entire system will be available for everyone in the research and business community. Also, a full time engineer will staff the system to grow samples for outside users.Intellectual Merits: The systems chambers will have high band-gap III-V and Low band-gap III-V chambers along with the possibility for a Group IV (SiGeSn) and Oxide capability expansion. The MBE chambers will all be part of a Veeco Gen10A/20A MBE system, which is fully automated, making it easy for novice users to handle. A characterization tools from existing systems will be moved into the preparation chamber for this system. This multi-chamber system enables a significant number of experiments that would not be possible in separated systems due to the destructive influence exposure to atmosphere can cause. The mixture of components in this system will enable everything from the most fundamental materials research to the development of highly advances devices. This tool will be unique in the world and, better yet, it will be available to the general community.Broader Impact: The multi-chamber epitaxy system will be available for general use. While the standard rates used will be equal to those charged in NSF funded NNIN centers, we also intend to donate up to 10% of the available machine time for use by disadvantaged and minority serving institutions at substantially reduced rates or even for free. Tufts dedication to public service backed by its strong financial solvency makes it an ideal location to house this equipment. Additionally, the concentration of high-tech start-up companies, colleges, and universities in the Boston-area enhance the ideality of its placement.

目的：通过这项资助，我们计划组装一个多腔半导体外延系统，以创造高质量的光电材料和器件。该装置将由一个自动分子束外延（MBE）系统组成，该系统可接入至少两个外延室。整个系统将对研究和商业界的每个人开放。此外，一名全职工程师将为系统配备人员，为外部用户培养样品。知识优势：系统腔室将具有高带隙III-V和低带隙III-V腔室，以及IV组（SiGeSn）和氧化物能力扩展的可能性。MBE室将全部成为Veeco Gen10A/20A MBE系统的一部分，该系统是全自动的，使新手用户易于操作。现有系统中的表征工具将被移至该系统的制备室。由于暴露在大气中可能造成的破坏性影响，这种多室系统可以实现在分离系统中无法实现的大量实验。该系统中的混合组件将使从最基本的材料研究到高度先进设备的开发成为可能。这个工具将是世界上独一无二的，更好的是，它将对一般社区可用。更广泛的影响：多腔外延系统将可用于一般用途。虽然使用的标准费率将与NSF资助的NNIN中心的收费相同，但我们还打算以大幅降低的费率甚至免费的方式，捐赠至多10%的可用机器时间给弱势和少数族裔服务机构使用。塔夫斯大学致力于公共服务，其强大的财务偿付能力使其成为容纳该设备的理想地点。此外，高科技初创公司、学院和大学在波士顿地区的集中也提高了其选址的理想性。