VERY LARGE SCALE INTEGRATED MEMS FOR MASSIVELY PARALLEL SCANNING PROBE NANOLITHOGRAPHY

1028710超大规模集成MEMS用于大规模并行扫描探头纳米扫描技术本研究的目标是开发一种使用微工程机电系统实现低成本、高吞吐量并行扫描探头纳米光刻的技术。所提出的系统包括集成在具有水平方向纳米精度定位能力的微执行器上的纳米级探针尖端的二维阵列。与每个探头集成的自主反馈机制在垂直方向上提供交互式实时控制，以保持不同探头之间的高度一致性。智能优点：纳米级光刻是制造下一代电子和机电组件的关键步骤。现有的基于探针的高精度纳米光刻技术都是基于串行处理(直接写入)的，存在处理时间长、成本低的缺点，不适合工业应用。使用并行操作的探头阵列达到更高吞吐量的大部分努力侧重于解决需要广泛电连接的单独探头的能力，而不同探头之间的一致性的主要问题尚未得到充分解决。这项拟议的技术将使系统能够以极大的一致性并行产生大量类似的纳米级图案。更广泛的影响：该项目有助于开发用于低成本、高产量纳米制造的强大纳米光刻工具，以及用于学术和研发环境的无掩膜微光刻和纳米光刻。对研究生和本科生的培训和参与研究活动使他们能够加入下一代微/纳米工程劳动力。将采取特别努力，鼓励代表人数不足的群体的学生参加。

1028710-VERY LARGE SCALE INTEGRATED MEMS FOR MASSIVELY PARALLEL SCANNING PROBE NANOLITHOGRAPHYThe objective of this research is to develop an enabling technology for low-cost high through-put parallel scanning probe nanolithography using micro-engineered electromechanical systems. The proposed systems include 2-dimensional arrays of nanoscale probe tips integrated on micro-actuators with nano-precision positioning capability in horizontal directions. An autonomous feedback mechanism integrated along with each probe provides an interactive real time control in the vertical direction to maintain a high level of uniformity between different probes.Intellectual Merit: Lithography at the nanometer scale is the key step in manufacturing of next generation electronic and electromechanical components. Currently available probe-based high-precision nanolithography techniques are based on serial processing (direct writing) suffering from long processing time and cost-inefficiency for industrial applications. Most of the efforts to reach higher through-put using arrays of probes operating in parallel focus on the capability to address probes individually requiring extensive electrical connections, while the main issue of uniformity between different probes has not been adequately addressed. The proposed technology will lead to systems capable of generating a large number of similar nanoscale patterns in parallel with great uniformity. Broader Impact: This project contributes to development of powerful nanolithography tools for low-cost high through-put nano-manufacturing, as well as maskless micro and nanolithography for academic and R&D environments. The training and involvement of graduate and undergraduate students in the research activities enables them to join the next generation micro/nano-engineering workforce. Special efforts will be taken to encourage the participation of students from underrepresented groups.