VERY LARGE SCALE INTEGRATED MEMS FOR MASSIVELY PARALLEL SCANNING PROBE NANOLITHOGRAPHY

用于大规模并行扫描探针纳米光刻的超大规模集成MEMS

• 批准号: 1028710
• 负责人: Siavash Pourkamali Anaraki
• 金额: $ 32.99万
• 依托单位: University of Denver
• 依托单位国家: 美国
• 项目类别: Standard Grant
• 财政年份: 2010
• 资助国家: 美国
• 起止时间: 2010-09-01 至 2013-07-31
• 项目状态: 已结题
• 来源: https://www.nsf.gov/awardsearch/showAward?AWD_ID=1028710&HistoricalAwards=false
• 关键词: VERY; LARGE; SCALE; INTEGRATED; MEMS

1028710-VERY LARGE SCALE INTEGRATED MEMS FOR MASSIVELY PARALLEL SCANNING PROBE NANOLITHOGRAPHYThe objective of this research is to develop an enabling technology for low-cost high through-put parallel scanning probe nanolithography using micro-engineered electromechanical systems. The proposed systems include 2-dimensional arrays of nanoscale probe tips integrated on micro-actuators with nano-precision positioning capability in horizontal directions. An autonomous feedback mechanism integrated along with each probe provides an interactive real time control in the vertical direction to maintain a high level of uniformity between different probes.Intellectual Merit: Lithography at the nanometer scale is the key step in manufacturing of next generation electronic and electromechanical components. Currently available probe-based high-precision nanolithography techniques are based on serial processing (direct writing) suffering from long processing time and cost-inefficiency for industrial applications. Most of the efforts to reach higher through-put using arrays of probes operating in parallel focus on the capability to address probes individually requiring extensive electrical connections, while the main issue of uniformity between different probes has not been adequately addressed. The proposed technology will lead to systems capable of generating a large number of similar nanoscale patterns in parallel with great uniformity. Broader Impact: This project contributes to development of powerful nanolithography tools for low-cost high through-put nano-manufacturing, as well as maskless micro and nanolithography for academic and R&D environments. The training and involvement of graduate and undergraduate students in the research activities enables them to join the next generation micro/nano-engineering workforce. Special efforts will be taken to encourage the participation of students from underrepresented groups.

1028710-超大规模集成微机电系统的大规模并行扫描探针纳米光刻本研究的目的是开发一种使能技术，低成本高吞吐量的并行扫描探针纳米光刻使用微工程机电系统。所提出的系统包括2维阵列的纳米级探针尖端集成在微致动器与纳米精度定位能力，在水平方向上。一个自主反馈机制集成沿着与每个探针提供了一个互动的真实的时间控制在垂直方向上，以保持不同的探针之间的高度一致性。智能优点：在纳米级光刻是下一代电子和机电元件制造的关键步骤。目前可用的基于探针的高精度纳米光刻技术基于串行处理（直接写入），其对于工业应用而言具有长处理时间和成本低效率。使用并行操作的探针阵列来达到更高吞吐量的大多数努力集中在单独地寻址需要广泛电连接的探针的能力上，而不同探针之间的均匀性的主要问题尚未得到充分解决。所提出的技术将导致系统能够并行地产生大量相似的纳米级图案，并且具有很大的均匀性。更广泛的影响：该项目有助于开发功能强大的纳米光刻工具，用于低成本高吞吐量的纳米制造，以及用于学术和研发环境的无掩模微米和纳米光刻&。研究生和本科生在研究活动的培训和参与使他们能够加入下一代微/纳米工程劳动力。将作出特别努力，鼓励代表性不足群体的学生参加。