I-Corps: Passive Electronics Miniaturization Technology
I-Corps: Passive Electronics Miniaturization Technology
批准号:
1722234
负责人:
Xiuling Li
金额:
$5.0万
依托单位国家:
美国
项目类别:
Standard Grant
财政年份:
2017
资助国家:
美国
项目状态:
已结题
起止时间:
2017-02-01 至 2018-07-31
中文摘要
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英文摘要
The broader impact/commercial potential of this I-Corps project is to enable the realization of extremely small, light, high frequency, high inductance, low interference, and cost effective passive electronic devices and components, through the self-rolled-up membrane nanotechnology. The novel form factor for 3D electromagnetic energy storage and confinement could enable breakthrough applications for consumer electronics, smart cities, and the Internet of Things. If successful, this technology can revolutionize the market for high frequency low noise system-on-chip, portable communication devices at 5G and beyond, and wearable electronics, power electronics, wireless sensors for medical imaging and positioning, and wireless body area networks.This I-Corps project is based on the self-rolled-up membrane (S-RuM) nanotechnology for extreme miniaturization of passive electronic devices and components. It provides a novel fabrication pathway for realizing devices in 3D that are extremely small and light, with significantly enhanced functionalities. The overarching principle of S-RuM nanotechnology is strain-driven spontaneous deformation of 2D membranes into 3D architectures. For coil inductors, instead of spiraling the metal wires in plane to increase the inductance, the S-RuM inductors have the metal wires spiraling normal to surface, which naturally minimizes the in-plane footprint. The ultra-small enclosed footprint inevitably enables high frequency operation because of the minimum overlap capacitance with the substrate. Much higher inductance can be achieved because of the strong positive mutual coupling between the turns. In particular, on-chip 3D radio frequency (RF) /microwave/millimeter wave passive devices can be realized that are 1 ? 2 orders of magnitude smaller than those fabricated with conventional CMOS-compatible 2D processes.
期刊论文(0)
专著(0)
科研奖励(0)
会议论文
Collaborative Research: Non-Conventional Etching and MOCVD Regrowth for Beta-GaO/AlGaO 3D HEMTs
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批准号:2200651
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项目类别:Standard Grant
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资助金额:$24.85万
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财政年份:2021
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负责人:Xiuling Li
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依托单位:
Collaborative Research: Non-Conventional Etching and MOCVD Regrowth for Beta-GaO/AlGaO 3D HEMTs
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批准号:1809946
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项目类别:Standard Grant
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资助金额:$24.85万
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财政年份:2018
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负责人:Xiuling Li
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依托单位:
PFI:AIR-TT: Technology Translation: Rolled-up 3D Passive Electronic Component Prototype Development
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批准号:1701047
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项目类别:Standard Grant
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资助金额:$20.0万
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财政年份:2017
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负责人:Xiuling Li
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依托单位:
Collaborative Research: Programmable Metal-Assisted Chemical Etching for Three-Dimensional Functional Metamaterials
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批准号:1462946
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项目类别:Standard Grant
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资助金额:$18.0万
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财政年份:2015
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负责人:Xiuling Li
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依托单位:
Lateral Epitaxial Growth of Nanowires for Electronics
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批准号:1508140
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项目类别:Standard Grant
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资助金额:$42.0万
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财政年份:2015
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负责人:Xiuling Li
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依托单位:
GOALI: Scaling-up Electronic Purification of Single Wall Carbon Nanotubes via Nanoscale Thermocapillary Flows for High Performance Transistors
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批准号:1436133
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项目类别:Standard Grant
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资助金额:$30.0万
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财政年份:2014
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负责人:Xiuling Li
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依托单位:
nano@illinois RET: Research Experience for Teachers Site in Nanotechnology (RET in Engineering and Computer Science Site)
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批准号:1407194
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项目类别:Standard Grant
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资助金额:$50.0万
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财政年份:2014
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负责人:Xiuling Li
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依托单位:
On-Chip 3D Spiral Inductors by Self-rolled-up Membranes: Extreme Miniaturization and Performance Enhancement
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批准号:1309375
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项目类别:Continuing Grant
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资助金额:$32.55万
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财政年份:2013
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负责人:Xiuling Li
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依托单位:
Collaborative:High Performance III-V Nanowire FETs Enabled by Controlled MOCVD Growth and ALD High-k Passivation
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批准号:1001928
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项目类别:Standard Grant
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资助金额:$25.0万
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财政年份:2010
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负责人:Xiuling Li
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依托单位:
Exploring the Mechanism of VLS Planar Nanowire Growth through Structural and Impurity Perturbation
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批准号:1006581
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项目类别:Continuing Grant
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资助金额:$39.54万
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财政年份:2010
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负责人:Xiuling Li
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依托单位:
CAREER: III-V Semiconductor Nanotubes: New Nanotechnology Building Blocks and New Functionalities
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批准号:0747178
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项目类别:Standard Grant
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资助金额:$39.95万
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财政年份:2008
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负责人:Xiuling Li
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依托单位:
The Growth and Characterization of GaN and InGaN Structures by Selective-Area Metalorganic Chemical Vapor Deposition
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批准号:9714289
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项目类别:Standard Grant
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资助金额:$6.0万
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财政年份:1997
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负责人:Xiuling Li
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依托单位:
海外基金