PFI:AIR-TT: Technology Translation: Rolled-up 3D Passive Electronic Component Prototype Development
PFI:AIR-TT: Technology Translation: Rolled-up 3D Passive Electronic Component Prototype Development
批准号:
1701047
负责人:
Xiuling Li
金额:
$20.0万
依托单位国家:
美国
项目类别:
Standard Grant
财政年份:
2017
资助国家:
美国
项目状态:
已结题
起止时间:
2017-06-01 至 2020-11-30
中文摘要
这个PFI:空气技术翻译项目专注于将应变诱导自卷膜纳米技术转化为集成电路中广泛使用的集总无源元件的尺寸缩小的需求。无源电子元件的小型化很重要,因为它将缩小可穿戴设备的整体尺寸和重量,或者允许在不改变电子元件占地面积的情况下实现更多功能。该项目将产生一个集成电路芯片的原型,该芯片带有卷起的无源元件,特别是电感。这种卷绕式电感具有以下独特功能:体积小、重量轻、工作频率高。与市场上领先的平面线圈电感和其他无源元件相比,这些功能提供了更好的耐磨性和更高的移动通信频率等优势。该项目在将基于应变诱导自卷膜(S-RUM)的无源元件从研究发现转化为商业应用时,解决了以下技术差距。目前广泛使用的集总无源元件,特别是单片集成电路中的平面电感,具有在片面积大(占集成电路面积的90%)、工作频率低、对衬底掺杂水平和变形敏感等缺点。解决这些问题的解决方案之一是使用三维(3D)结构,因为分层3D结构能够在不改变平面占地面积的情况下有效地使用材料,并带来否则无法实现的高级功能。然而,如果使用传统的制造技术来制造3D结构,机械稳定性、一致性、对齐、工艺复杂性和成本等问题都很难解决。基于S-朗姆的被动技术提供了一个革命性的平台,因为它具有自组装性质,一旦从机械支架上释放出来,它就会从2D布局自发地产生3D圆柱形结构,通过避免在悬浮或曲面上进行加工来最大限度地减少对机械稳定性的担忧。材料和工艺的CMOS兼容性也使得与有源器件和其他无源元件的集成成为可能。与平面平台相比,这种3D平台有望生产出电感密度显著提高、Q系数/频率更高、衬底耦合最小的IC芯片。参与该项目的人员,包括一名研究生和两名本科生,将通过制作满足潜在客户需求的功能原型来获得创新和技术翻译体验。
英文摘要
This PFI:AIR Technology Translation project focuses on translating the strain-induced self-roll-up membrane nanotechnology to fill the need to reduce the size of widely used lumped passive components in integrated circuits. The miniaturization of passive electronic components is important because it will shrink the overall size and weight of wearable devices or allow more functionalities to be implemented without changing the footprint of the electronic components. The project will result in a prototype of an integrated circuit chip with rolled-up passive components, particularly an inductor. This rolled-up inductor has the following unique features: small, light, and high operating frequency. These features provide advantages including better wearability and higher frequency mobile communications when compared to the leading competing planar coil inductors and other passive components in this market space. This project addresses the following technology gaps as it translates the strain-induced self-rolled-up membrane (S-RuM) based passive components from research discovery toward commercial application. The current widely used lumped passive components, especially planar inductors in monolithic integrated circuits (ICs) have several drawbacks that include large on-wafer footprint (occupy as much as 90% of the IC), low operation frequency, and sensitivity to substrate doping levels and deformation. One of the solutions to solve these problems is to use three-dimensional (3D) structures, because hierarchical 3D structures enable efficient use of materials without changing the footprint in plane and lead to advanced functionalities that are otherwise out of reach. However, if conventional fabrication technologies are used to produce 3D structures, issues such as mechanical stability, conformity, alignment, process complexity and cost are difficult to address. The S-RuM based passive technology provides a revolutionary platform because of the self-assembly nature, which produces a 3D cylindrical structure from a 2D layout spontaneously once released from the mechanical support, minimizing mechanical stability concerns by avoiding processing on suspended or curved surfaces. The CMOS-compatibility of the materials and processes also makes integration with active devices and other passive components feasible. In contrast to the planar counterpart, this 3D platform promises to produce IC chips with dramatically enhanced inductance density, superior Q factor/frequency, and minimized substrate coupling. Personnel involved in this project, including one graduate student and two undergraduate students, will receive innovation and technology translation experiences through making a functional prototype that meets the needs of potential customers.
期刊论文(5)
专著(0)
科研奖励(0)
会议论文
DOI:
10.1126/sciadv.aay4508
发表时间:
2020-01-01
期刊:
SCIENCE ADVANCES
影响因子:
13.6
作者:
[Huang, Wen, Yang, Zhendong, Li, Xiuling]
通讯作者:
Li, Xiuling
DOI:
10.1002/admi.201901022
发表时间:
2019-09
期刊:
Advanced Materials Interfaces
影响因子:
5.4
作者:
[J. Michaels;Derek Wood;Paul J. Froeter;Wen Huang;D. Sievers;Xiuling Li]
通讯作者:
J. Michaels;Derek Wood;Paul J. Froeter;Wen Huang;D. Sievers;Xiuling Li
DOI:
10.1038/s41928-018-0073-5
发表时间:
2018-05-01
期刊:
NATURE ELECTRONICS
影响因子:
34.3
作者:
[Huang, Wen, Zhou, Jingchao, Li, Xiuling]
通讯作者:
Li, Xiuling
Collaborative Research: Non-Conventional Etching and MOCVD Regrowth for Beta-GaO/AlGaO 3D HEMTs
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批准号:2200651
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项目类别:Standard Grant
-
资助金额:$24.85万
-
财政年份:2021
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负责人:Xiuling Li
-
依托单位:
Collaborative Research: Non-Conventional Etching and MOCVD Regrowth for Beta-GaO/AlGaO 3D HEMTs
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批准号:1809946
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项目类别:Standard Grant
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资助金额:$24.85万
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财政年份:2018
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负责人:Xiuling Li
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依托单位:
I-Corps: Passive Electronics Miniaturization Technology
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批准号:1722234
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项目类别:Standard Grant
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资助金额:$5.0万
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财政年份:2017
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负责人:Xiuling Li
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依托单位:
Collaborative Research: Programmable Metal-Assisted Chemical Etching for Three-Dimensional Functional Metamaterials
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批准号:1462946
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项目类别:Standard Grant
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资助金额:$18.0万
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财政年份:2015
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负责人:Xiuling Li
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依托单位:
Lateral Epitaxial Growth of Nanowires for Electronics
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批准号:1508140
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项目类别:Standard Grant
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资助金额:$42.0万
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财政年份:2015
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负责人:Xiuling Li
-
依托单位:
GOALI: Scaling-up Electronic Purification of Single Wall Carbon Nanotubes via Nanoscale Thermocapillary Flows for High Performance Transistors
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批准号:1436133
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项目类别:Standard Grant
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资助金额:$30.0万
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财政年份:2014
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负责人:Xiuling Li
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依托单位:
nano@illinois RET: Research Experience for Teachers Site in Nanotechnology (RET in Engineering and Computer Science Site)
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批准号:1407194
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项目类别:Standard Grant
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资助金额:$50.0万
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财政年份:2014
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负责人:Xiuling Li
-
依托单位:
On-Chip 3D Spiral Inductors by Self-rolled-up Membranes: Extreme Miniaturization and Performance Enhancement
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批准号:1309375
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项目类别:Continuing Grant
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资助金额:$32.55万
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财政年份:2013
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负责人:Xiuling Li
-
依托单位:
Collaborative:High Performance III-V Nanowire FETs Enabled by Controlled MOCVD Growth and ALD High-k Passivation
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批准号:1001928
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项目类别:Standard Grant
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资助金额:$25.0万
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财政年份:2010
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负责人:Xiuling Li
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依托单位:
Exploring the Mechanism of VLS Planar Nanowire Growth through Structural and Impurity Perturbation
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批准号:1006581
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项目类别:Continuing Grant
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资助金额:$39.54万
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财政年份:2010
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负责人:Xiuling Li
-
依托单位:
CAREER: III-V Semiconductor Nanotubes: New Nanotechnology Building Blocks and New Functionalities
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批准号:0747178
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项目类别:Standard Grant
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资助金额:$39.95万
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财政年份:2008
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负责人:Xiuling Li
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依托单位:
The Growth and Characterization of GaN and InGaN Structures by Selective-Area Metalorganic Chemical Vapor Deposition
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批准号:9714289
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项目类别:Standard Grant
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资助金额:$6.0万
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财政年份:1997
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负责人:Xiuling Li
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依托单位:
国内基金
海外基金
湍流和化学交互作用对H2-Air-H2O微混燃烧中NO生成的影响研究
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批准号:51976048
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项目类别:面上项目
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资助金额:61.0万元
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批准年份:2019
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负责人:邱朋华
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依托单位: