PFI-TT: Developing an Efficient Computation Scheme for Modeling Low-Pressure Plasmas

PFI-TT：开发低压等离子体建模的高效计算方案

• 批准号: 1917577
• 负责人: Qi Fan
• 金额: $ 25万
• 依托单位: Michigan State University
• 依托单位国家: 美国
• 项目类别: Standard Grant
• 财政年份: 2019
• 资助国家: 美国
• 起止时间: 2019-07-01 至 2022-12-31
• 项目状态: 已结题
• 来源: https://www.nsf.gov/awardsearch/showAward?AWD_ID=1917577&HistoricalAwards=false
• 关键词: PFI; TT; Developing; Efficient; Computation

The broader impact/commercial potential of this Partnerships for Innovation - Technology Translation (PFI-TT) project is the significant reduction of low-pressure-plasma modeling time using innovative computation schemes. Low-pressure plasmas are widely used for the manufacturing of semiconductor integrated circuits, displays, solar panels, thin film batteries, and coatings. The annual market of these industry segments exceeds $600 billion. Computer simulation is an essential approach to understanding the complex plasma characteristics and developing efficient plasma processing technologies. Unfortunately, current commercial plasma simulation software requires huge computational resources; it takes months to model the plasmas in practical scales. The lack of a practical tool for modeling low-pressure plasmas has resulted in improperly designed sources, leading to the inefficient processes used today. This PFI-TT project aims to develop new computation schemes for efficiently modeling certain plasmas at low pressures. These tools will allow the users to simulate plasmas of practical scales, using even desktop computers that generate feedback in 24 hours. This project will also train and broaden the participation of graduate and undergraduate students, and prepare them as future leaders in technology innovation and entrepreneurship. The proposed project combines an implicit algorithm of the motions of charged particles with an energy conservation scheme to eliminate the spatial and temporal constraints in the state-of-the-art explicit particle-in-cell/Monte Carlo collision algorithms. The key advantage of the implicit algorithm is that the high frequency oscillations of plasmas are damped in the time domain. The energy conservation scheme ensures that the total energy of the plasma is conserved and the self-heating due to a large grid spacing (i.e. significantly greater than the plasma Debye length) is eliminated. The new computation scheme is over 30 times faster than the state-of-the-art explicit particle-in-cell/Monte Carlo collision algorithms. The developed modeling tools also have the potential to address situations where a complete kinetic analysis is not yet available due to the high plasma density, such as high-power impulse magnetron sputtering and the plasma instabilities in magnetized discharges.This award reflects NSF's statutory mission and has been deemed worthy of support through evaluation using the Foundation's intellectual merit and broader impacts review criteria.

这种伙伴关系对创新 - 技术翻译（PFI-TT）项目的更广泛的影响/商业潜力是使用创新计算方案显着减少低压血压建模时间。 低压等离子体广泛用于制造半导体集成电路，显示器，太阳能电池板，薄膜电池和涂料。这些行业的年度市场超过6000亿美元。计算机仿真是理解复杂的等离子体特性和开发有效的等离子体处理技术的重要方法。不幸的是，当前的商业等离子体仿真软件需要大量的计算资源。在实用尺度上对等离子体进行建模需要几个月的时间。缺乏对低压等离子体进行建模的实用工具导致设计不当，从而导致当今使用的过程效率低下。该PFI-TT项目旨在开发新的计算方案，以在低压下有效地对某些等离子体进行建模。这些工具将允许用户使用在24小时内产生反馈的台式计算机模拟实际量表的等离子体。该项目还将培训和扩大研究生和本科生的参与，并为他们作为技术创新和企业家精神的未来领导者做好准备。 提出的项目结合了带电颗粒运动的动作的隐式算法与能量保护方案，以消除最先进的明确粒子/蒙特卡洛碰撞算法中的空间和时间约束。隐式算法的关键优势在于，等离子体的高频振荡在时域受阻。节能方案确保了血浆的总能量是保守的，并且由于较大的网格间距（即明显大于等离子体Debye长度）而引起的自加热。新的计算方案的速度比最先进的显式粒子/蒙特卡洛碰撞算法快30倍。开发的建模工具还具有解决情况的潜力，即由于高血浆密度较高，尚未进行完整的动力学分析，例如高功率冲动磁铁溅射和磁化放电中的等离子体不稳定性。该奖项反映了NSF的法定任务，并通过使用基金会的范围和广阔的范围进行评估，并通过评估了值得评估。

项目成果

Methylene Blue Adsorption by Plasma Re-Activated Carbon

等离子体再活性炭吸附亚甲蓝

• DOI: 10.4236/jwarp.2021.1310041
• 发表时间: 2021
• 期刊: Journal of Water Resource and Protection
• 作者: Mackinder, Madeline A.;Wang, Keliang;Fan, Qi Hua
• 通讯作者: Fan, Qi Hua

Single-beam ion source enhanced growth of transparent conductive thin films

单束离子源增强透明导电薄膜的生长

• DOI: 10.1088/1361-6463/ac7f01
• 发表时间: 2022
• 期刊: Journal of Physics D: Applied Physics
• 作者: Tran, Thanh;Kim, Young;Baule, Nina;Shrestha, Maheshwar;Zheng, Bocong;Wang, Keliang;Schuelke, Thomas;Fan, Qi Hua
• 通讯作者: Fan, Qi Hua

Single-beam plasma source deposition of carbon thin films

碳薄膜的单束等离子体源沉积

• DOI: 10.1063/5.0102605
• 发表时间: 2022
• 期刊: Review of Scientific Instruments
• 影响因子: 1.6
• 作者: Kim, Young;Baule, Nina;Shrestha, Maheshwar;Zheng, Bocong;Schuelke, Thomas;Fan, Qi Hua
• 通讯作者: Fan, Qi Hua

Comparison of 1D and 2D particle-in-cell simulations for DC magnetron sputtering discharges

• DOI: 10.1063/5.0029353
• 发表时间: 2021-01-01
• 期刊: PHYSICS OF PLASMAS
• 影响因子: 2.2
• 作者: Zheng, Bocong;Fu, Yangyang;Fan, Qi Hua
• 通讯作者: Fan, Qi Hua

Growth of Highly Transparent Amorphous Carbon Films Using Beam Plasma Source

• DOI: 10.3390/coatings12081159
• 发表时间: 2022-08
• 期刊: Coatings
• 影响因子: 3.4
• 作者: Youngsu Kim;Nina Baule;M. Shrestha;Q. Fan