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PFI-TT: Developing an Efficient Computation Scheme for Modeling Low-Pressure Plasmas

PFI-TT: Developing an Efficient Computation Scheme for Modeling Low-Pressure Plasmas
PFI-TT:开发低压等离子体建模的高效计算方案
批准号:
1917577
负责人:
Qi Fan
金额:
$25.0万
依托单位:
依托单位国家:
美国
项目类别:
Standard Grant
财政年份:
2019
资助国家:
美国
项目状态:
已结题
起止时间:
2019-07-01 至 2022-12-31

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中文摘要
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英文摘要
The broader impact/commercial potential of this Partnerships for Innovation - Technology Translation (PFI-TT) project is the significant reduction of low-pressure-plasma modeling time using innovative computation schemes. Low-pressure plasmas are widely used for the manufacturing of semiconductor integrated circuits, displays, solar panels, thin film batteries, and coatings. The annual market of these industry segments exceeds $600 billion. Computer simulation is an essential approach to understanding the complex plasma characteristics and developing efficient plasma processing technologies. Unfortunately, current commercial plasma simulation software requires huge computational resources; it takes months to model the plasmas in practical scales. The lack of a practical tool for modeling low-pressure plasmas has resulted in improperly designed sources, leading to the inefficient processes used today. This PFI-TT project aims to develop new computation schemes for efficiently modeling certain plasmas at low pressures. These tools will allow the users to simulate plasmas of practical scales, using even desktop computers that generate feedback in 24 hours. This project will also train and broaden the participation of graduate and undergraduate students, and prepare them as future leaders in technology innovation and entrepreneurship. The proposed project combines an implicit algorithm of the motions of charged particles with an energy conservation scheme to eliminate the spatial and temporal constraints in the state-of-the-art explicit particle-in-cell/Monte Carlo collision algorithms. The key advantage of the implicit algorithm is that the high frequency oscillations of plasmas are damped in the time domain. The energy conservation scheme ensures that the total energy of the plasma is conserved and the self-heating due to a large grid spacing (i.e. significantly greater than the plasma Debye length) is eliminated. The new computation scheme is over 30 times faster than the state-of-the-art explicit particle-in-cell/Monte Carlo collision algorithms. The developed modeling tools also have the potential to address situations where a complete kinetic analysis is not yet available due to the high plasma density, such as high-power impulse magnetron sputtering and the plasma instabilities in magnetized discharges.This award reflects NSF's statutory mission and has been deemed worthy of support through evaluation using the Foundation's intellectual merit and broader impacts review criteria.
期刊论文(10)
专著(0)
科研奖励(0)
会议论文
Methylene Blue Adsorption by Plasma Re-Activated Carbon
等离子体再活性炭吸附亚甲蓝
DOI: 10.4236/jwarp.2021.1310041
发表时间: 2021
期刊: Journal of Water Resource and Protection
影响因子: --
作者: [Mackinder, Madeline A., Wang, Keliang, Fan, Qi Hua]
通讯作者: Fan, Qi Hua
Single-beam plasma source deposition of carbon thin films
碳薄膜的单束等离子体源沉积
DOI: 10.1063/5.0102605
发表时间: 2022
期刊: Review of Scientific Instruments
影响因子: 1.6
作者: [Kim, Young, Baule, Nina, Shrestha, Maheshwar, Zheng, Bocong, Schuelke, Thomas, Fan, Qi Hua]
通讯作者: Fan, Qi Hua
Single-beam ion source enhanced growth of transparent conductive thin films
单束离子源增强透明导电薄膜的生长
DOI: 10.1088/1361-6463/ac7f01
发表时间: 2022
期刊: Journal of Physics D: Applied Physics
影响因子: --
作者: [Tran, Thanh, Kim, Young, Baule, Nina, Shrestha, Maheshwar, Zheng, Bocong, Wang, Keliang, Schuelke, Thomas, Fan, Qi Hua]
通讯作者: Fan, Qi Hua
DOI: 10.3390/coatings12081159
发表时间: 2022-08
期刊: Coatings
影响因子: 3.4
作者: [Youngsu Kim;Nina Baule;M. Shrestha;Q. Fan]
通讯作者: Youngsu Kim;Nina Baule;M. Shrestha;Q. Fan
10
    Manufacturing of High-Efficiency Perovskite Solar Cells via Coupled Ion Source and Magnetron Discharges
    • 批准号:
      2243110
    • 项目类别:
      Standard Grant
    • 资助金额:
      $43.22万
    • 财政年份:
      2023
    • 负责人:
      Qi Fan
    • 依托单位:
    FMSG: Integrating Artificial Intelligence in Chemical Vapor Deposition for In-situ Predictive Crystal Growth Manufacturing.
    • 批准号:
      2036737
    • 项目类别:
      Standard Grant
    • 资助金额:
      $50.0万
    • 财政年份:
      2020
    • 负责人:
      Qi Fan
    • 依托单位:
    Resolving Abnormal Target Erosion in High Frequency Magnetron Discharge
    • 批准号:
      1724941
    • 项目类别:
      Standard Grant
    • 资助金额:
      $30.0万
    • 财政年份:
      2017
    • 负责人:
      Qi Fan
    • 依托单位:
    Using Plasma Electrolysis for Efficient Manufacturing of Nanoparticles
    • 批准号:
      1700787
    • 项目类别:
      Standard Grant
    • 资助金额:
      $31.56万
    • 财政年份:
      2016
    • 负责人:
      Qi Fan
    • 依托单位:
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    叶绿体蛋白 TT3.2 调控水稻耐热性的分子机制研究
    • 批准号:
      24ZR1431200
    • 项目类别:
      省市级项目
    • 资助金额:
      --
    • 批准年份:
      2024
    • 负责人:
      郭亮星
    • 依托单位:
    苯并呋喃-6-酮类化合物TT01f通过调控Jagged1/Notch信号通路改善特发性肺纤维化的药理学机制研究
    TT3.2通过自噬体-液泡途径调控水稻盐胁迫抗性的分子机制研究
    • 批准号:
      32301745
    • 项目类别:
      青年科学基金项目
    • 资助金额:
      30万元
    • 批准年份:
      2023
    • 负责人:
      张海
    • 依托单位:
    基于Glypian3-TT3oB新型聚集诱导发光复合体的NIR-IIb靶向成像及cGAS-STING通路激活在肝癌精准标记并增敏免疫治疗中的研究
    • 批准号:
      LQ23H160042
    • 项目类别:
      省市级项目
    • 资助金额:
      --
    • 批准年份:
      2023
    • 负责人:
      吴迪
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