Silicon LPCVD Facility for Nanoelectronics, Quantum Computing & Solar Cells

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Silicon low-pressure chemical vapor deposition facility: This project aims to complete Australia’s first manufacturing line for nanoscale devices. It aims to establish a low-pressure chemical vapour deposition system to complete the existing silicon complementary metal-oxide semiconductor process line. It is currently impossible to fabricate many devices compatible with industrial manufacture, limiting device reliability and path to commercialisation. The tool is designed to incorporate four furnace tubes for growing thin layers of electronic materials, including polycrystalline-silicon, epitaxial silicon, and silicon-nitride. One unique aspect will be growth of isotopically-enriched silicon-28 that is essential for spin-based quantum computing. The tool would support a wide range of projects nationally in silicon micro/nano-systems, advanced photovoltaics, and quantum technologies.