Double Exposure Photoresists for the 32 and 22 nm Lithographic Nodes

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The semiconductor industry is one of the largest world-wide, with annual revenue of $220B and employing over 1.5M people around the world. This project provides a unique opportunity for development within Australia of significant expertise in the field of double exposure lithography. The novel photoactive polymeric films to be developed are expected to support the next generation of microchips. A major outcome of this project will be establishment of Australia as a world-leader in this rapidly expanding field. Furthermore the technology can be applied broadly to many printing technologies.