Double Exposure Photoresists for the 32 and 22 nm Lithographic Nodes

用于 32 和 22 nm 光刻节点的双重曝光光刻胶

• 批准号: LP0882551
• 负责人: Prof Andrew Whittaker
• 金额: $ 51.96万
• 依托单位: The University of Queensland
• 依托单位国家: 澳大利亚
• 项目类别: Linkage Projects
• 财政年份: 2008
• 资助国家: 澳大利亚
• 起止时间: 2008-01-01 至 2011-10-08
• 项目状态: 已结题
• 来源: https://dataportal.arc.gov.au/RGS/Web/Grants/LP0882551
• 关键词: Double; Exposure; Photoresists; 32; 22

The semiconductor industry is one of the largest world-wide, with annual revenue of $220B and employing over 1.5M people around the world. This project provides a unique opportunity for development within Australia of significant expertise in the field of double exposure lithography. The novel photoactive polymeric films to be developed are expected to support the next generation of microchips. A major outcome of this project will be establishment of Australia as a world-leader in this rapidly expanding field. Furthermore the technology can be applied broadly to many printing technologies.

半导体行业是全球最大的行业之一，年收入为 $220B，在全球拥有超过 150 万员工。该项目为澳大利亚境内双重曝光光刻领域的重要专业知识的发展提供了独特的机会。待开发的新型光活性聚合物薄膜预计将支持下一代微芯片。该项目的一个主要成果将是使澳大利亚成为这一快速扩张领域的世界领导者。此外，该技术可以广泛应用于许多印刷技术。