Synthesis and Performance of Novel Polymer Resists for 193 nm Immersion Lithography

用于 193 nm 浸没式光刻的新型聚合物光刻胶的合成和性能

• 批准号: LP0667941
• 负责人: Prof Andrew Whittaker
• 金额: $ 35万
• 依托单位: The University of Queensland
• 依托单位国家: 澳大利亚
• 项目类别: Linkage Projects
• 财政年份: 2006
• 资助国家: 澳大利亚
• 起止时间: 2006-08-30 至 2008-08-29
• 项目状态: 已结题
• 来源: https://dataportal.arc.gov.au/RGS/Web/Grants/LP0667941
• 关键词: Synthesis; Performance; Novel; Polymer; Resists

The semiconductor industry is one of the largest world-wide, with annual revenue of $217B and employing over 1.5M people around the world. This project provides a unique opportunity for development within Australia of significant expertise in the field of polymers for short-wavelength lithography. The materials to be developed are expected to provide the basis of future genertions of microchips. In addition the materials have applications in other technologies which are manufactured in Australia, for example in spectactle lenses and optical fibres. A major outcome of this project will be establishment of Australia as a world-leader in this rapidly expanding field.

半导体行业是世界上最大的行业之一，年收入为2170亿美元，在全球雇用超过150万人。该项目为澳大利亚在短波长光刻聚合物领域的重要专业知识的发展提供了一个独特的机会。待开发的材料有望为未来一代微芯片提供基础。此外，这些材料还可应用于澳大利亚制造的其他技术，例如透镜和光纤。该项目的一个主要成果将是将澳大利亚确立为这一迅速扩大的领域的世界领导者。