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Synthesis and Performance of Novel Polymer Resists for 193 nm Immersion Lithography

Synthesis and Performance of Novel Polymer Resists for 193 nm Immersion Lithography
用于 193 nm 浸没式光刻的新型聚合物光刻胶的合成和性能
批准号:
LP0667941
负责人:
Prof Andrew Whittaker
金额:
$35.0万
依托单位国家:
澳大利亚
项目类别:
Linkage Projects
财政年份:
2006
资助国家:
澳大利亚
项目状态:
已结题
起止时间:
2006-08-30 至 2008-08-29

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中文摘要
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英文摘要
The semiconductor industry is one of the largest world-wide, with annual revenue of $217B and employing over 1.5M people around the world. This project provides a unique opportunity for development within Australia of significant expertise in the field of polymers for short-wavelength lithography. The materials to be developed are expected to provide the basis of future genertions of microchips. In addition the materials have applications in other technologies which are manufactured in Australia, for example in spectactle lenses and optical fibres. A major outcome of this project will be establishment of Australia as a world-leader in this rapidly expanding field.
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海外基金