Formation of jointed silicon wires/nanowires using dissolution and re-crystalization of silicon in molten zinc droplets.
Formation of jointed silicon wires/nanowires using dissolution and re-crystalization of silicon in molten zinc droplets.
批准号:
20H02500
负责人:
Inasawa Susumu
金额:
$6.82万
依托单位国家:
日本
项目类别:
Grant-in-Aid for Scientific Research (B)
财政年份:
2020
资助国家:
日本
项目状态:
已结题
起止时间:
2020-04-01 至 2023-03-31
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期刊论文(5)
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気相反応を用いたシリコンナノ・マイクロ材料の自発生成と形状制御
利用气相反应自发生成硅纳米/微米材料并控制形状
DOI:
--
发表时间:
2021
期刊:
影响因子:
--
作者:
[Y. Mitsuhashi, A. Ito, 稲澤晋]
通讯作者:
稲澤晋
Flow effects on the morphology of silicon materials produced in a gas phase reaction of SiCl4
流动对 SiCl4 气相反应生成硅材料形貌的影响
DOI:
--
发表时间:
2022
期刊:
影响因子:
--
作者:
[Taiga Saito, Akira Hoshino, Eita Shoji, Tetsushi Biwa, Masaki Kubo, Takao Tsukada, Takaaki Tomai, Tadafumi Adschiri, Susumu Inasawa]
通讯作者:
Susumu Inasawa
Formation of boron-doped silicon wires and control of dopant concentration using zinc, SiCl4 and BCl3
使用锌、SiCl4 和 BCl3 形成硼掺杂硅线并控制掺杂剂浓度
DOI:
10.1016/j.jcrysgro.2020.125796
发表时间:
2020
期刊:
Journal of Crystal Growth
影响因子:
1.8
作者:
[Taniguchi Ryunosuke, Inasawa Susumu]
通讯作者:
Inasawa Susumu
Flow Effects on the Morphology of Silicon Materials Produced in a Gas Phase Reaction of SiCl<sub>4</sub>
流动对 SiCl<sub>4</sub> 气相反应硅材料形貌的影响
DOI:
10.1252/iches.2022.006
发表时间:
2022
期刊:
International Chemical Engineering Symposia Proceedings
影响因子:
--
作者:
[谷河怜, 佐伯大輔, 奥村幸久, INASAWA Susumu]
通讯作者:
INASAWA Susumu
Reactions and flows affected by liquid-gas or liquid-liquid interfaces
受液-气或液-液界面影响的反应和流动
DOI:
--
发表时间:
2022
期刊:
影响因子:
--
作者:
[Akira Hoshino, Taiga Saito, Eita Shoji, Tetsushi Biwa, Masaki Kubo, Takao Tsukada, Takaaki Tomai, Tadafumi Adschiri, Susumu Inasawa]
通讯作者:
Susumu Inasawa
Mat of silicon nanowires as a highly efficient thermoelectric material
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批准号:17K18976
-
项目类别:Grant-in-Aid for Challenging Research (Exploratory)
-
资助金额:$3.99万
-
财政年份:2017
-
负责人:Inasawa Susumu
-
依托单位:
Development of oxidation-free light-emitting material of silicon microparticles that have many fine trenches
-
批准号:17H04962
-
项目类别:Grant-in-Aid for Young Scientists (A)
-
资助金额:$15.39万
-
财政年份:2017
-
负责人:Inasawa Susumu
-
依托单位:
Retardation in oxidation and quenching of photoluminescence from trenched silicon micropartices
-
批准号:15K14158
-
项目类别:Grant-in-Aid for Challenging Exploratory Research
-
资助金额:$2.33万
-
财政年份:2015
-
负责人:Inasawa Susumu
-
依托单位: