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Current control of graphene channel transistors using semiconductor contacts

Current control of graphene channel transistors using semiconductor contacts
使用半导体接触的石墨烯沟道晶体管的电流控制
批准号:
24656204
负责人:
TOKUMITSU Eisuke
金额:
$2.58万
依托单位国家:
日本
项目类别:
Grant-in-Aid for Challenging Exploratory Research
财政年份:
2012
资助国家:
日本
项目状态:
已结题
起止时间:
2012-04-01 至 2014-03-31

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中文摘要
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英文摘要
Graphene has attracted much interest for next-generation electronics applications due to its extremely high mobility. However, conventional graphene channel transistors with metal source/drain contacts show ambipolar behavior in their transfer characteristics and on/off drain current ratio is usually low because bandgap of graphene is zero. In this research project, it has been demonstrated that unipolar behavior with high on/off ratio of more than 10^3 can be obtained by using SiC semiconductor source/drain contacts. In particular, improvement of interface properties between graphene and SiC is important to obtain high on/off ratio.
期刊论文(12)
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会议论文
DOI: --
发表时间: 2012
期刊:
影响因子: --
作者: [Yuichi Nagahisa, Yuichi Harada, and Eisuke Tokumitsu]
通讯作者: and Eisuke Tokumitsu
Suppression of Hole Current in Graphene Transistors with N-Type Doped SiC Source/Drain Regions
N型掺杂SiC源/漏区石墨烯晶体管中空穴电流的抑制
DOI: --
发表时间: 2012
期刊: Materials Science Forum
影响因子: --
作者: [Yuichi Nagahisa, Eisuke Tokumitsu]
通讯作者: Eisuke Tokumitsu
Fabrication of 4H-SiC MOSFETs Using Stacked Al_2O_3 Gate Insulator with Pre-Annealed Al_2O_3 Buffer Layer
使用带有预退火 Al_2O_3 缓冲层的堆叠 Al_2O_3 栅极绝缘体制造 4H-SiC MOSFET
DOI: --
发表时间: 2013
期刊:
影响因子: --
作者: [H.Yamada, S.Hino, N.Miura, M.Imaizumi, S.Yamakawa, and E.Tokumitsu]
通讯作者: and E.Tokumitsu
Observation of High on/off Drain Current Ratio in Graphene Transistors with n-type doped SiC Source/Drain Regions
具有 n 型掺杂 SiC 源极/漏极区域的石墨烯晶体管中高开/关漏极电流比的观察
DOI: --
发表时间: 2013
期刊:
影响因子: --
作者: [Y.Nagahisa, Y.Harada, E.Tokumitsu]
通讯作者: E.Tokumitsu
10
    Proposal of varialbe-area electrode structure by field effect and its application to variable capacitors
    Study on lithography-less solution process for nano-devices and its application to nonvolatile memories
    Proposal of huge-charge-controlled field-effect transistor using ferroelectric gate insulator and its application to next-generation integrated circuits
    Systematic survey and property control of high-dielectric-constant thin films for gate insulators of next generation MOSFETs
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