Current control of graphene channel transistors using semiconductor contacts
Current control of graphene channel transistors using semiconductor contacts
批准号:
24656204
负责人:
TOKUMITSU Eisuke
金额:
$2.58万
依托单位国家:
日本
项目类别:
Grant-in-Aid for Challenging Exploratory Research
财政年份:
2012
资助国家:
日本
项目状态:
已结题
起止时间:
2012-04-01 至 2014-03-31
中文摘要
点击翻译按钮获取中文摘要
英文摘要
Graphene has attracted much interest for next-generation electronics applications due to its extremely high mobility. However, conventional graphene channel transistors with metal source/drain contacts show ambipolar behavior in their transfer characteristics and on/off drain current ratio is usually low because bandgap of graphene is zero. In this research project, it has been demonstrated that unipolar behavior with high on/off ratio of more than 10^3 can be obtained by using SiC semiconductor source/drain contacts. In particular, improvement of interface properties between graphene and SiC is important to obtain high on/off ratio.
期刊论文(12)
专著(0)
科研奖励(0)
会议论文
登录
查看更多内容
Characterization of Electrical Properties of Graphene/n-SiC Contacts
石墨烯/n-SiC 触点电性能表征
DOI:
--
发表时间:
2012
期刊:
影响因子:
--
作者:
[Yuichi Nagahisa, Yuichi Harada, and Eisuke Tokumitsu]
通讯作者:
and Eisuke Tokumitsu
Suppression of Hole Current in Graphene Transistors with N-Type Doped SiC Source/Drain Regions
N型掺杂SiC源/漏区石墨烯晶体管中空穴电流的抑制
DOI:
--
发表时间:
2012
期刊:
Materials Science Forum
影响因子:
--
作者:
[Yuichi Nagahisa, Eisuke Tokumitsu]
通讯作者:
Eisuke Tokumitsu
Fabrication of 4H-SiC MOSFETs Using Stacked Al_2O_3 Gate Insulator with Pre-Annealed Al_2O_3 Buffer Layer
使用带有预退火 Al_2O_3 缓冲层的堆叠 Al_2O_3 栅极绝缘体制造 4H-SiC MOSFET
DOI:
--
发表时间:
2013
期刊:
影响因子:
--
作者:
[H.Yamada, S.Hino, N.Miura, M.Imaizumi, S.Yamakawa, and E.Tokumitsu]
通讯作者:
and E.Tokumitsu
Observation of High on/off Drain Current Ratio in Graphene Transistors with n-type doped SiC Source/Drain Regions
具有 n 型掺杂 SiC 源极/漏极区域的石墨烯晶体管中高开/关漏极电流比的观察
DOI:
--
发表时间:
2013
期刊:
影响因子:
--
作者:
[Y.Nagahisa, Y.Harada, E.Tokumitsu]
通讯作者:
E.Tokumitsu
Comparative Study of Metalorganic Chemical Vapour Deposition of HfO_2 and Al_2O_3 Gate Insulators on SiC for Power MOSFET Applications
用于功率MOSFET应用的SiC上金属有机化学气相沉积HfO_2和Al_2O_3栅极绝缘体的比较研究
DOI:
--
发表时间:
2012
期刊:
影响因子:
--
作者:
[Eisuke Tokumitsu, Isahaya Yamamura, Shiro Hino, Naruhisa Miura, Masayuki Imaizumi, Hiroaki Sumitani and Tatsuo Oomori]
通讯作者:
Hiroaki Sumitani and Tatsuo Oomori
共 10 条
Proposal of varialbe-area electrode structure by field effect and its application to variable capacitors
-
批准号:24360119
-
项目类别:Grant-in-Aid for Scientific Research (B)
-
资助金额:$11.65万
-
财政年份:2012
-
负责人:TOKUMITSU Eisuke
-
依托单位:
Study on lithography-less solution process for nano-devices and its application to nonvolatile memories
-
批准号:21360144
-
项目类别:Grant-in-Aid for Scientific Research (B)
-
资助金额:$11.32万
-
财政年份:2009
-
负责人:TOKUMITSU Eisuke
-
依托单位:
Proposal of huge-charge-controlled field-effect transistor using ferroelectric gate insulator and its application to next-generation integrated circuits
-
批准号:15360157
-
项目类别:Grant-in-Aid for Scientific Research (B)
-
资助金额:$9.6万
-
财政年份:2003
-
负责人:TOKUMITSU Eisuke
-
依托单位:
Systematic survey and property control of high-dielectric-constant thin films for gate insulators of next generation MOSFETs
-
批准号:12450121
-
项目类别:Grant-in-Aid for Scientific Research (B)
-
资助金额:$10.18万
-
财政年份:2000
-
负责人:TOKUMITSU Eisuke
-
依托单位:
Development of Low-Temperature MOCVD Technology for Ferroelectric Thin Films
-
批准号:11555085
-
项目类别:Grant-in-Aid for Scientific Research (B).
-
资助金额:$7.55万
-
财政年份:1999
-
负责人:TOKUMITSU Eisuke
-
依托单位:
Study on memory characteristics of non-volatile ferroelectric-gate transistors for neural network applications
-
批准号:09450123
-
项目类别:Grant-in-Aid for Scientific Research (B)
-
资助金额:$5.7万
-
财政年份:1997
-
负责人:TOKUMITSU Eisuke
-
依托单位:
Preparation of ferroelectric BaMgF_4films on GaAs for the control of two-dimensional electron gas
-
批准号:07455134
-
项目类别:Grant-in-Aid for Scientific Research (B)
-
资助金额:$3.46万
-
财政年份:1995
-
负责人:TOKUMITSU Eisuke
-
依托单位:
海外基金