ICP Plasma Etching System

ICP等离子蚀刻系统

• 批准号: 428016069
• 金额: --
• 依托单位: Universität des Saarlandes
• 依托单位国家: 德国
• 项目类别: Major Research Instrumentation
• 财政年份: 2019
• 资助国家: 德国
• 起止时间: 2018-12-31 至 无数据
• 项目状态: 未结题
• 来源: https://gepris.dfg.de/gepris/projekt/428016069?language=en
• 关键词: ICP; Plasma; Etching; System

The ICP plasma etching system proposed here complements the infrastructure of the Quantum Optics group at Saarland University with a strongly required device for processing of micro- and nanostructures in diamond. Fabrication of such structures enables experiments on coupling of color centers in diamond to optical cavities in photonic crystal structures, on realization of spin-photon interfaces for color centers in diamond, and is required for fabrication of optical nano-antennas for color centers and for fabrication of scanning probe structures in diamond for magnetometry with high spatial resolution. These experiments can only be conducted given the fabrication platform provided by an ICP plasma etching system. Long term goals of the research topics mentioned here are both the exploration of fundamental effects of light-matter interaction at the level of single quantum systems and the supply of solid-state systems (such as color centers in diamond) and single photons for applications in quantum technologies. We strive for further development of new application potential, e.g. in fields of secure communication (quantum communication) or highly sensitive measurement technologies (quantum sensing). The latter fields are central columns of the new EU quantum technologies flagship and thus contribute to highly recent research topics.

这里提出的 ICP 等离子蚀刻系统补充了萨尔大学量子光学小组的基础设施，为处理金刚石中的微米和纳米结构提供了迫切需要的设备。这种结构的制造使得能够进行金刚石色心与光子晶体结构中光学腔耦合的实验，实现金刚石色心的自旋光子界面，并且是制造色心光学纳米天线和制造用于高空间分辨率磁力测量的金刚石扫描探针结构所必需的。这些实验只能在 ICP 等离子体蚀刻系统提供的制造平台下进行。这里提到的研究主题的长期目标是探索单量子系统水平上光与物质相互作用的基本效应，以及为量子技术应用提供固态系统（例如钻石的色心）和单光子。我们努力进一步开发新的应用潜力，例如在安全通信（量子通信）或高灵敏度测量技术（量子传感）领域。后一个领域是新的欧盟量子技术旗舰的中心支柱，因此对最新的研究课题做出了贡献。