Plasma-based synthesis and etching of innovative materials at the nanoscale

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In the coming years, innovation in materials science and engineering will reside in our ability to control at the nanoscale the structure of materials in order to design new materials with tailored properties (electrical, optical, magnetic, etc.). One of the most powerful means to uniquely arrange matter at the nanocale is to use plasmas due to their unique ability to provide simultaneously a variety of particles such as electrons, ions, neutral atoms and radicals, and photons. As stated in the 2008 report of the US Department of Energy, Low Temperature Plasma Science : Not Only the Fourth State of Matter but All of Them, “The unique nonequilibrium environment and the combination of reactive and charged species created by the plasma provide the means to synthesize and modify nanometer-sized materials in ways that may not be achieved by any other means. However, a fundamental understanding of how reactive radicals, ions, electrons, and photons interact with nano-materials is necessary for extending the current state of the art to produce scientifically exciting and technologically important discoveries.” From the very beginning, my vision was to engage myself in this fertile field at the cutting edge of various disciplines and that generates large amounts of exciting new knowledge in materials science and technology. According to this vision, my first research priority is to perform leading edge fundamental studies of advanced plasma sources in order to understand the relationship between plasma characteristics and materials structure from micro- to nanoscale. These sources include laser-produced plasmas, inductively-coupled plasmas and dielectric barrier discharges. My second priority is to capitalize on this plasma expertise in order to achieve many challenging objectives that encompass (i) synthesis of innovative materials in the form of thin films or nanoparticles, the emphasis being on materials with electrical and/or optical properties that can be tuned by applying external stimuli (electrical field, optical signal, temperature), and (ii) plasma etching to fabricate objects of truly nanoscale dimensions in various materials. My third priority is to exploit in collaboration with academic and/or industrial researchers these advanced micro- and nanofabrication processes (plasma synthesis and etching) in order to test new concepts in RF and photonic devices and sensors. In addition to its scientific and technological impact, a major benefit of this interdisciplinary research program is that it provides high level of scientific/technical training to motivated Highly Qualified Personnel (HQP) through a broad set of skills and expertise, ranging from plasma science, materials synthesis, etching and characterization to device fabrication and testing. This HQP will constitute a future pool of expertise for academia and for high-technology Canadian industries.