Development fo a New Formation Method of Functional Thin Films

功能性薄膜新形成方法的开发

• 批准号: 07555504
• 负责人: HAYASHI Yasunori
• 金额: $ 4.42万
• 依托单位: KYUSHU UNIVERSITY
• 依托单位国家: 日本
• 项目类别: Grant-in-Aid for Scientific Research (A)
• 财政年份: 1995
• 资助国家: 日本
• 起止时间: 1995 至 1997
• 项目状态: 已结题
• 来源: https://kaken.nii.ac.jp/grant/KAKENHI-PROJECT-07555504/
• 关键词: Induction Coupling Sputter; Artificial Lattice; Fe-Si-H; Magnetic Thin Film Head; Fe; Cr; 巨大磁気抵抗効果

The induction coupling sputtering machine was investigated at 1994 and was expected to give very fast formation in high vacuum. This means it can form very clean films cause of it mechanism. Although, there are some problems in this machine like mutual-and self-contamination. This phenomenon is explained that target particle comes on substrate and another target with a detour through a shutter plate. It is a fatal defect for the machine to form a atomic size order controlled film. We investigated new shield material and mechanism to reduce the mutul-and selfcontamination. We made improvement of a reduction coil to reduce contamination by using 1.0 turn coil. This coil is confirmed to generate stabilized reduction plasma. The rare earth magnet gives high and uniform magnetic field on target surface and increases plasma density and sputtering efficiency. This magnet makes possible to form films under higher vacuum and then get more clean films. To improve convenience of maintenance, we reformed the shape of cathode. We applied this machine on Fe-Si-H system. We investigated the effects of crystal structure on magnetic properties of soft magnetic materials. The hydrogen induction on films makes coarse crystal grain and gives refinement on magnetic properties.

1994年研究了感应耦合溅射机，期望能在高真空条件下快速成形。这意味着由于它的机理，它可以形成非常干净的薄膜。尽管这台机器存在一些问题，比如相互污染和自污染。这一现象的解释是，目标粒子来到基片上，而另一个目标粒子绕道通过百叶窗板。形成原子尺寸顺序控制的薄膜是机器的致命缺陷。研究了一种新型的屏蔽材料和屏蔽机理，以减少相互污染和自污染。我们对还原线圈进行改进，采用1.0匝线圈减少污染。经证实，该线圈能产生稳定的还原等离子体。稀土磁体在靶表面产生高而均匀的磁场，提高了等离子体密度和溅射效率。这种磁体可以在更高的真空条件下形成膜，从而得到更干净的膜。为了提高维修的便利性，我们对阴极的形状进行了改造。我们将该机应用于Fe-Si-H体系。研究了晶体结构对软磁材料磁性能的影响。氢在薄膜上的感应使薄膜的晶粒变粗，使薄膜的磁性能得到细化。