Development fo a New Formation Method of Functional Thin Films

功能性薄膜新形成方法的开发

• 批准号: 07555504
• 负责人: HAYASHI Yasunori
• 金额: $ 4.42万
• 依托单位: KYUSHU UNIVERSITY
• 依托单位国家: 日本
• 项目类别: Grant-in-Aid for Scientific Research (A)
• 财政年份: 1995
• 资助国家: 日本
• 起止时间: 1995 至 1997
• 项目状态: 已结题
• 来源: https://kaken.nii.ac.jp/grant/KAKENHI-PROJECT-07555504/
• 关键词: Induction Coupling Sputter; Artificial Lattice; Fe-Si-H; Magnetic Thin Film Head; Fe; Cr; 巨大磁気抵抗効果

The induction coupling sputtering machine was investigated at 1994 and was expected to give very fast formation in high vacuum. This means it can form very clean films cause of it mechanism. Although, there are some problems in this machine like mutual-and self-contamination. This phenomenon is explained that target particle comes on substrate and another target with a detour through a shutter plate. It is a fatal defect for the machine to form a atomic size order controlled film. We investigated new shield material and mechanism to reduce the mutul-and selfcontamination. We made improvement of a reduction coil to reduce contamination by using 1.0 turn coil. This coil is confirmed to generate stabilized reduction plasma. The rare earth magnet gives high and uniform magnetic field on target surface and increases plasma density and sputtering efficiency. This magnet makes possible to form films under higher vacuum and then get more clean films. To improve convenience of maintenance, we reformed the shape of cathode. We applied this machine on Fe-Si-H system. We investigated the effects of crystal structure on magnetic properties of soft magnetic materials. The hydrogen induction on films makes coarse crystal grain and gives refinement on magnetic properties.

1994年研究了感应偶联溅射机，预计将在高真空中产生非常快的形成。这意味着它可以形成非常干净的IT机制原因。虽然，这台机器中存在一些问题，例如相互和自我污染。这种现象解释说，靶粒子在基板上和另一个目标绕过快门板的目标。对于机器形成原子尺寸订单受控膜是致命的缺陷。我们研究了新的盾构材料和机制，以减少突变和自我污染。我们通过使用1.0转线线圈来改善还原线圈以减少污染。该线圈被证实会产生稳定的还原等离子体。稀土磁铁在目标表面上具有高和均匀的磁场，并提高了血浆密度和溅射效率。这把磁铁使得在更高的真空下形成胶片，然后获得更多干净的胶片。为了提高维护的便利性，我们改革了阴极的形状。我们将此机器应用于Fe-Si-H系统。我们研究了晶体结构对软磁性材料磁性特性的影响。薄膜上的氢诱导产生粗晶粒，并对磁性特性进行改进。