Cathodoluminescence Study of the Locaal Fluctuation of Band Gaps in AlloySemiconductor Films
Cathodoluminescence Study of the Locaal Fluctuation of Band Gaps in AlloySemiconductor Films
批准号:
04650002
负责人:
SEKIGUCHI Takashi
金额:
$1.41万
依托单位:
依托单位国家:
日本
项目类别:
Grant-in-Aid for General Scientific Research (C)
财政年份:
1992
资助国家:
日本
项目状态:
已结题
起止时间:
1992 至 1993
中文摘要
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英文摘要
The local fluctuation of the magnitude of the band-gap energy in alloy semiconductor films was studied by cathodoluminescence. The magnitude of band-gap energy of alloy semiconductor film is mainly determined by alloy composition. However, it often fluctuates in a film due to two reasons.One is the fluctuation of alloy composition (DELTAchi) and the other is the local strain due to lattice mismatch(DELTAiota). In the first year of this research, each of these effect was studied independently. The effect of local strain was studied with GaAs/Si films. It was found that the shift of the peak energy of exitonic luminescence of GaAs is very sensitive to the local strain reserved in GaAs layr. The compositional fluctuation was studied with In GaAs/Inp film. The fluctuation of the composition also detected by the peak position of exitonic luminescence. It was concluded that the fluctuation of DELTAchi or DELTAiota was easily detected by the shift of peak positions of luminescence line.In the second year, it was tried to separate DELTAchi from DELTAiota in the films in which these parameters varies spatially. SiGe/Si and In GaAsP/InP films was prepared for this purpose. However, it was difficult to separate DELTAchi from DELTAiota in these specimens due to following reasons.(i)The specimens were not suitable for this purpose, namely DELTAchi >> DELTAiota in the former case, while DELTAchi << DELTAiota in the latter. (ii)The lack of the information of fine structure of the spectra make the separation difficult. Beside this purpose, we found the new luminescent center in GaAsP/InP films which shows metastable behavior against electron beam irradiation. The stability of this center was studied in detail.
期刊论文(6)
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科研奖励(0)
会议论文
T.Sekiguchi, S.Kusanagi, B.Shen and K.Sumino: "Cathodoluminescence and EBIC Study on the Dislocations in Si" J.of Electrochem. Soc. (in press). (1994)
T.Sekiguchi、S.Kusanagi、B.Shen 和 K.Sumino:“Si 中位错的阴极发光和 EBIC 研究”J.of Electrochem。
DOI:
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发表时间:
期刊:
影响因子:
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作者:
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通讯作者:
T.Sekiguchi: "Cathodoluminescence and EBIC Study on Dislocations in Si Crystals" Journal of the Electrochemical Society. (1994)
T.Sekiguchi:“硅晶体位错的阴极发光和 EBIC 研究”电化学学会杂志。
DOI:
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发表时间:
期刊:
影响因子:
--
作者:
[]
通讯作者:
Characterization of Nano-electric Structure of Materials by Weak Excitation Cathodoluminescence
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批准号:09555001
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项目类别:Grant-in-Aid for Scientific Research (B)
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资助金额:$8.45万
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财政年份:1997
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负责人:SEKIGUCHI Takashi
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依托单位:
海外基金