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Study on Giant Magnetoresistance of Magnetic-particle-dispersed Metal Films

Study on Giant Magnetoresistance of Magnetic-particle-dispersed Metal Films
磁性颗粒分散金属薄膜的巨磁阻研究
批准号:
06650353
负责人:
ISHII Kiyoshi
金额:
$1.28万
依托单位:
依托单位国家:
日本
项目类别:
Grant-in-Aid for General Scientific Research (C)
财政年份:
1994
资助国家:
日本
项目状态:
已结题
起止时间:
1994 至 1995

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中文摘要
翻译
研究了颗粒状磁性材料和多层磁性材料的巨磁阻效应。这种颗粒状材料一般是通过热沉淀产生的。因此,颗粒大小和浓度很难独立控制。本文提出了一种制备结构可控颗粒材料的新工艺,并对该工艺制备的样品进行了磁阻测试。结果总结如下:1。在这项工作中开发的一种新工艺允许原位生长含有嵌入Co或Ni-Fe细颗粒的金属薄膜。粒子半径可以从大约4纳米改变到10纳米。基质中颗粒浓度可控制。新工艺制备的4纳米Co包埋Cu膜具有GMR效应。这些结果表明,该方法在制备可控纳米结构的磁性颗粒膜方面具有很强的潜力,对GMR效应的研究具有重要意义。
英文摘要
Giant magnetoresistance (GMR) effects are observed for granular magnetic materials as well as for mutilayred films. Such granular materials are generally produced through thermal perticipation. So, granule size and concentration are hardly controlled independently. In this study, a new process was developed for producing granular materials with more controlled structures, and the magnetoresistance of specimens obtained by the process was examined. The results are summarized as follows.1. A new process developed in this work allows in-situ growth of metal films with embedded Co or Ni-Fe fine particles.2. Particle radius can be changed from about 4 nm to 10 nm.3. Particle concentration in the matrix can be controlled.4. Cu films with embedded 4-nm Co particles produced by the new process shows GMR effects.These results suggest that the developed method has strong potentiality for producing magnetic granular films with controlled nano-structures which are very useful for the studies on GMR effects.
期刊论文(32)
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会议论文
Kiyoshi Ishii: "Formation of magnetic-particle-dispersed metal films by gas-flow-sputtering" Proceedings of the first Magneto-Electronics International Symposiusn. 109-112 (1994)
Kiyoshi Ishii:“通过气流溅射形成磁性颗粒分散金属薄膜”第一届磁电子国际研讨会论文集。
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通讯作者:
K.Ishii: "Formation of Magnetic-particle Dispersed Metal Films by Gas-flow-spattering" Proceedings of the First Magneto-Electronics International Symposium. 109-112 (1994)
K.Ishii:“通过气流溅射形成磁性粒子分散金属薄膜”第一届磁电子国际研讨会论文集。
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石井清: "ガスフロースパッタ法によるCo微粒子を含むCu膜の作製" 日本応用磁気学会誌. 20. 401-404 (1996)
Kiyoshi Ishii:“通过气流溅射制备含有Co细颗粒的Cu膜”日本应用磁学学会杂志20. 401-404(1996)。
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