Study on Giant Magnetoresistance of Magnetic-particle-dispersed Metal Films

磁性颗粒分散金属薄膜的巨磁阻研究

• 批准号: 06650353
• 负责人: ISHII Kiyoshi
• 金额: $ 1.28万
• 依托单位: Utsunomiya University
• 依托单位国家: 日本
• 项目类别: Grant-in-Aid for General Scientific Research (C)
• 财政年份: 1994
• 资助国家: 日本
• 起止时间: 1994 至 1995
• 项目状态: 已结题
• 来源: https://kaken.nii.ac.jp/en/grant/KAKENHI-PROJECT-06650353/
• 关键词: giant magnetoresistance; magnetoresistance; granular magnetic material; fine particle; magnetic thin film; gas-flow-sputtering; 巨大磁気抵抗効果; GMR; グラニュラ磁性体; 磁性体超微粒子

Giant magnetoresistance (GMR) effects are observed for granular magnetic materials as well as for mutilayred films. Such granular materials are generally produced through thermal perticipation. So, granule size and concentration are hardly controlled independently. In this study, a new process was developed for producing granular materials with more controlled structures, and the magnetoresistance of specimens obtained by the process was examined. The results are summarized as follows.1. A new process developed in this work allows in-situ growth of metal films with embedded Co or Ni-Fe fine particles.2. Particle radius can be changed from about 4 nm to 10 nm.3. Particle concentration in the matrix can be controlled.4. Cu films with embedded 4-nm Co particles produced by the new process shows GMR effects.These results suggest that the developed method has strong potentiality for producing magnetic granular films with controlled nano-structures which are very useful for the studies on GMR effects.

巨磁电阻（GMR）效应被观察到的颗粒磁性材料以及多层膜。这种粒状材料通常是通过热沉淀法生产的。因此，颗粒尺寸和浓度很难独立控制。在这项研究中，开发了一种新的工艺来生产具有更可控结构的颗粒材料，并检查了由该工艺获得的样品的磁阻。研究结果如下：1.本工作开发的一种新工艺可以原位生长出嵌有Co或Ni-Fe微粒的金属薄膜.颗粒半径可以从约4 nm到10 nm变化。3.基体中颗粒浓度可控.用该方法制备的Cu薄膜中嵌入了4 nm Co颗粒，显示出巨磁电阻效应，表明该方法具有制备纳米结构可控的磁性颗粒薄膜的潜力，对研究巨磁电阻效应具有重要意义。

项目成果

Kiyoshi Ishii: "Formation of magnetic-particle-dispersed metal films by gas-flow-sputtering" Proceedings of the first Magneto-Electronics International Symposiusn. 109-112 (1994)

Kiyoshi Ishii：“通过气流溅射形成磁性颗粒分散金属薄膜”第一届磁电子国际研讨会论文集。

K.Ishii: "Formation of Magnetic-particle Dispersed Metal Films by Gas-flow-spattering" Proceedings of the First Magneto-Electronics International Symposium. 109-112 (1994)

K.Ishii：“通过气流溅射形成磁性粒子分散金属薄膜”第一届磁电子国际研讨会论文集。

K.Ishii: "A New Method for Producing Granular Materials" Material Science & Engineering A. 217/218. 232-234 (1996)

K.Ishii：“一种生产粒状材料的新方法”材料科学

石井清: "ガスフロースパッタ法によるCo微粒子を含むCu膜の作製" 日本応用磁気学会誌. 20. 401-404 (1996)

Kiyoshi Ishii：“通过气流溅射制备含有Co细颗粒的Cu膜”日本应用磁学学会杂志20. 401-404（1996）。

石井清: "Ni-Fe超微粒子とAg蒸気の交互堆積" 日本応用磁気学会誌. (投稿中).

Kiyoshi Ishii：“Ni-Fe超细颗粒和Ag蒸气的交替沉积”日本应用磁学学会杂志（目前正在提交）。