Development of hightly oriented and low noise barium ferrite thin film media for high density magnetic recording
Development of hightly oriented and low noise barium ferrite thin film media for high density magnetic recording
批准号:
06650374
负责人:
HOSHI Yoichi
金额:
$1.34万
依托单位国家:
日本
项目类别:
Grant-in-Aid for General Scientific Research (C)
财政年份:
1994
资助国家:
日本
项目状态:
已结题
起止时间:
1994 至 1995
中文摘要
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英文摘要
Hexagonal barium ferrite (BaM : BaFe_<12>O_<19>) thin films are promising high density magnetic recording media, because they have not only excellent magnetic properties (large magnetic anisotropy energy) but also good mechanical and chemical stability. And because BaM is an oxide, the exchange interaction between the crystallites is easily reduced, which is necessary for a low-noise recording media. In this research, we attempted to obtain the BaM thin film with excellent c-axis orientation at a low substrate temperature by alternate periodic deposition of an S layr (spinel Fe_3O_4) layr) and an R (BaO・3Fe_2O_3) layr. Control of crystallite size in the BaM film was also attempted.(1) Control of crystallite size in the filmThe crystallite size in the BaM film decreased monotonically with decreasing film thickness, reaching a value below 30 nm in films 30 nm thick. Further decreases in film thickness led to a degradation of the crystallinity of the film, causing the saturation magnetiza … More tion and coercive force of the film to decrease significantly. A ZnO underlayr promoted the growth of c-axis-oriented hexagonal BaM crystallites in the film, but was not effective in reducing the crystallite size of the film. Furthermore, diffusion of Zn atoms from the underlayr to BaM film caused a decrease in the coercive force and saturation magnetization of the film. Growth of BaM crystallites in films deposited on a SiO_2/Si substrate was significantly suppressed when the films were deposited on a thin initial layr deposited on a SiO_2/Si substrate was significantly suppressed when the films were deposited on a thin initial layr deposited beforehand under a substrate bias of-50V.(2) Deposition of BaM film by alternate layr deposition methodDeposition of c-axis perpendicularly oriented barium ferrite (BaM : BaFe_<12>O_<19> thin films was attempted by means of an alternate periodic deposition of S (spinel Fe_3O_4 and R (BaO・3Fe_2O_3) layrs. The period of the layrs was fixed at 1.15 nm, which corresponds to the period of hexagonal barium ferrite crystals in the c-axis direction. The films deposited at temperatures above 540゚C had a hexagonal crystal structure and showed excellent c-axis orientation, but this deposition method did not results in a marked reduction of substrate temperature needed for the deposition of a BaM film with hexagonal crystal structure. The films deposited at 630゚C had a clear terraced surface due to the growth of disk shaped hexagonal crystallites. The saturation magnetization of the film was about 220 emu/cc and the coercive force of the films was about 2.2kOe. Less
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星陽一 他: "スパッタ法による超高硬度ダイヤモンドライクカーボン保護膜の作製" 日本応用磁気学会誌. 19,S2. 104-107 (1995)
Yoichi Hoshi等:“溅射法制备超硬类金刚石碳保护膜”日本应用磁学学会杂志19,S2 104-107(1995)。
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星陽一 他: "スパッタ法による超高硬度ダイヤモンドライクカーボン保護膜の作製" 日本応用磁気学会誌. 19.S2. 104-107 (1995)
Yoichi Hoshi等人:“溅射法制备超硬类金刚石碳保护膜”日本应用磁学学会杂志19.S2 104-107(1995)。
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Y. Hoshi et al.: "Suppression of cone formation on carbon target during sputtering" Jpn. J. Appl. Phys.33. 4991-4996 (1994)
Y. Hoshi 等人:“溅射过程中碳靶上锥体形成的抑制”Jpn。
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Y. Hoshi et al.: "Uniaxial magnetetic anisotropy of iron thin films deposited by oblique incidence of deposition particles." J. Appl. Phys.(to be published). (1996)
Y. Hoshi 等人:“通过沉积颗粒倾斜入射沉积的铁薄膜的单轴磁各向异性。”
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Y.Hoshi et al.: "Preparation of c-axis oriented barium ferrite thin films with small crystallite size" J.Appl.Phys. 80(掲載予定). (1997)
Y.Hoshi 等人:“小晶粒尺寸的 c 轴取向钡铁氧体薄膜的制备”J.Appl.Phys 80(待出版)。
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共 23 条
Development of high rate glancing angle deposition techniques with oxygen radical source for the fabrication of titanium oxide films with excellent photo-catalytic properties
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批准号:15K04682
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财政年份:2015
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Development of high rate sputtering system for the deposition of transparent conductive thin films with low resistivity and high adhesion on plastic film substrate.
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财政年份:2004
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Development of soft magnetic thin films with large saturation magnetization for magnetic recording head by sputter-deposition at liquid nitrogen temperature
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财政年份:2001
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Development of sputter deposition method to control microstructure of thin film magnetic recording media with ultra high density.
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财政年份:1998
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依托单位:
Deposition of Iron Nitride Films with Large Saturation Magnetization by Using a Sputtering Type Plasma Source.
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批准号:04650272
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项目类别:Grant-in-Aid for General Scientific Research (C)
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资助金额:$1.34万
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财政年份:1992
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负责人:HOSHI Yoichi
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依托单位:
Deposition of Iron Nitride Soft Magnetic Thin Films with Giant Saturation Magnetization by Sputtering type Plasma Source
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依托单位:
Development of Sputtering Type Large Current Ion Source and its Application for the Synthesis of Superconducting Oxide thin Films.
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批准号:01850065
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项目类别:Grant-in-Aid for Developmental Scientific Research
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资助金额:$3.26万
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财政年份:1989
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负责人:HOSHI Yoichi
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依托单位: