Development of high rate and low temperature sputter-deposition method for the fabrication of oxide films on organic substrate
Development of high rate and low temperature sputter-deposition method for the fabrication of oxide films on organic substrate
批准号:
20560309
负责人:
HOSHI Yoichi
金额:
$3.16万
依托单位国家:
日本
项目类别:
Grant-in-Aid for Scientific Research (C)
财政年份:
2008
资助国家:
日本
项目状态:
已结题
起止时间:
2008 至 2010
中文摘要
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英文摘要
In this study, we tried to clarify the mechanisms of the damages induced in the organic films(BAlq film) by the sputter-deposition of electrode TCO films, and developed a new damage-less sputter-deposition method for the formation of the electrode films in OLED. Results are summarized as follows;1) Irradiation of high energy electrons and ions to the BAlq film above energy of 50 eV induced significant reduction of PL intensity of the films. This indicates that suppression of such high energy particle bombardment to the organic film surface during sputter-deposition is necessary to reduce the degradation of light emitting properties of the organic film.2) It was confirmed that deposition of the electrode films by using a facing target sputtering(FTS) method instead of conventional magnetron sputtering was effective to reduce the damages in the organic films. But, it was found that small amount of high energy secondary electrons emitted from the end of the cathode target can arrive at the substrate surface in the FTS, and leads to a significant reduction of PL intensity of the organic film. Therefore, we achieved complete suppression of such high energy electron bombardment by the insertion of Al plate near the target electrode. In addition, reduction of the kinetic energy of the sputtered particles arrived at the substrate surface by increase in sputtering gas pressure above 8 mTorr, and/or use of Kr gas instead of Ar gas was effective to reduce the damages in the organic film.Finally, we succeeded to develop a sputtering system in which incidence of secondary electrons and high energy sputtered particles to the substrate surface are completely suppressed during film deposition. As a result, sputter-deposition of the electrode films without reduction of PL intensity was successfully realized. Currently, we have been trying to make organic EL devices by using this new sputter-deposition process to confirm its usefulness in the EL device.
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Aluminum-Doped Zinc Oxide Films Prepared by Spray Deposition in Inert Gas Atmosphere
惰性气体气氛喷雾沉积法制备掺铝氧化锌薄膜
DOI:
--
发表时间:
2011
期刊:
影响因子:
--
作者:
[K.Sano, Y.Seki, Y.Sawada, S.Seki, H.Ohkubo, T.Suzuki, K.Lin, T.Uchida, Y.Hoshi]
通讯作者:
Y.Hoshi
TiO_2膜作製用スパッタ型酸素ラジカル源
用于TiO_2薄膜制备的溅射型氧自由基源
DOI:
--
发表时间:
2010
期刊:
影响因子:
--
作者:
[石原太樹, 佐藤紀幸, 望月翔平, 飛坂真幸、橋本一, Hao Lei, 星陽一]
通讯作者:
星陽一
Changes in Microstructure of Reactive Sputtered TiO_2 Films with Deposition Temperature.
反应溅射TiO_2薄膜微观结构随沉积温度的变化。
DOI:
--
发表时间:
2009
期刊:
影响因子:
--
作者:
[D.Ishihara, H.Lei, Y.Hoshi]
通讯作者:
Y.Hoshi
Optical Emission Spectroscopy of Sputtering Type Oxygen Radical Source for the Deposition of TiO2 Films by Reactive Sputtering
反应溅射沉积 TiO2 薄膜的溅射型氧自由基源的发射光谱
DOI:
--
发表时间:
2009
期刊:
影响因子:
--
作者:
[Hao Lei, Yoichi Hoshi, Daiki Ishihara, Meihan Wang, Yutaka Sawada]
通讯作者:
Yutaka Sawada
スパッタビーム堆積法により作製したAZO薄膜の特性の検討
溅射束沉积法制备的 AZO 薄膜的特性研究
DOI:
--
发表时间:
2008
期刊:
影响因子:
--
作者:
[下村健晴^1, 本間拓也^1, 佐藤 薫^1, 清水英彦^1, 岩野春男^1, 星 陽一]
通讯作者:
星 陽一
共 64 条
Development of high rate glancing angle deposition techniques with oxygen radical source for the fabrication of titanium oxide films with excellent photo-catalytic properties
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批准号:15K04682
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项目类别:Grant-in-Aid for Scientific Research (C)
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资助金额:$3.16万
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财政年份:2015
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负责人:HOSHI Yoichi
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依托单位:
Development of high rate sputtering system for the deposition of transparent conductive thin films with low resistivity and high adhesion on plastic film substrate.
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批准号:16560281
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项目类别:Grant-in-Aid for Scientific Research (C)
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资助金额:$2.37万
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财政年份:2004
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负责人:HOSHI Yoichi
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依托单位:
Development of soft magnetic thin films with large saturation magnetization for magnetic recording head by sputter-deposition at liquid nitrogen temperature
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批准号:13650357
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项目类别:Grant-in-Aid for Scientific Research (C)
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资助金额:$0.64万
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财政年份:2001
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负责人:HOSHI Yoichi
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依托单位:
Development of sputter deposition method to control microstructure of thin film magnetic recording media with ultra high density.
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批准号:10650320
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项目类别:Grant-in-Aid for Scientific Research (C)
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资助金额:$2.24万
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财政年份:1998
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负责人:HOSHI Yoichi
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依托单位:
Development of hightly oriented and low noise barium ferrite thin film media for high density magnetic recording
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批准号:06650374
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项目类别:Grant-in-Aid for General Scientific Research (C)
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资助金额:$1.34万
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财政年份:1994
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负责人:HOSHI Yoichi
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依托单位:
Deposition of Iron Nitride Films with Large Saturation Magnetization by Using a Sputtering Type Plasma Source.
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批准号:04650272
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项目类别:Grant-in-Aid for General Scientific Research (C)
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资助金额:$1.34万
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财政年份:1992
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负责人:HOSHI Yoichi
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依托单位:
Deposition of Iron Nitride Soft Magnetic Thin Films with Giant Saturation Magnetization by Sputtering type Plasma Source
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批准号:02650229
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项目类别:Grant-in-Aid for General Scientific Research (C)
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资助金额:$1.41万
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财政年份:1990
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负责人:HOSHI Yoichi
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依托单位:
Development of Sputtering Type Large Current Ion Source and its Application for the Synthesis of Superconducting Oxide thin Films.
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批准号:01850065
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项目类别:Grant-in-Aid for Developmental Scientific Research
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资助金额:$3.26万
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财政年份:1989
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负责人:HOSHI Yoichi
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依托单位:
海外基金