Ion Beam Processing of Polymeric Biomaterials
Ion Beam Processing of Polymeric Biomaterials
批准号:
11694148
负责人:
ISHIKAWA Junzo
金额:
$3.01万
依托单位:
依托单位国家:
日本
项目类别:
Grant-in-Aid for Scientific Research (B).
财政年份:
1999
资助国家:
日本
项目状态:
已结题
起止时间:
1999 至 2000
中文摘要
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英文摘要
1. Physical Evaluation of Ion Beam Treated Polymer Surfaces and Hydrophilic SurfacePolymers such as polystyrene (PS), polydimethylsiloxane (PDMS) and poly-lactic-acid (PLA) were implanted with negative or positive ions at energy in 5-30 keV, and their surfaces are investigated about contact angle of pure water, and about amount of introduced oxygen atoms and atomic bonding states by XPS.In almost all case, ion beam treated surfaces showed lower contact angle than untreated surfaces. But low energy implanted PLA showed higher contact angle. The lowering contact angle by ion implantation was found to be resulted by forming functional groups with C-O and/or C=O bonds2. Biological Evaluation of Ion Beam Treated Polymer Surfaces and Selective Cell Attachment PropertiesNerve cells of PC-12h (rat adrenal phechromocytoma) with NGF active property were cultured on the ion beam treated polymer surfaces of PS, PDMS, and PLA.The cells showed selective attachment properties on only ion beam implant … More ed region in a high glucose medium with serum. Besides, the cells showed selective nerve protrusion extension over only ion implanted region in serum-free medium. Thus, we achieved control of nerve cell attachment properties on polymer surface. For PLA, cell attachment property was removed by low energy negative ion implantation about 5 keV, and cell attachment property was enhanced by negative ion beam implantation at a high energy of 30keV with a low dose.3. Patterningly Negative Ion Beam Processing of Polymer Surfaces and Artificial Formation of Neuron Network on Spin-coated Polystyrene FilmsPolymer surfaces were silver, copper, and carbon negative ion beam treated through a patterning mask with many slits of several μm in width. In such micro-pattern, selective cell attachment and selective protrusion extension properties were achieved not only on bulk materials of PS, PDMS and PLA but also on spin-coated polystyrene thin films Thus, we formed artificially designed nerve cell network on PS films.Thus, we developed ion beam processing technique for biomedical polymer surface modification and achieved control of biocompatibility such as nerve cell attachment and protrusion expansion properties. By this processing, we made an artificially designed neuron network. Less
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辻博司: "銀負イオン注入によるポリスチレンの神経細胞接着と突起伸展特性の改質"第10回粒子線の先端的応用技術に関するシンポジウム論文集. BEAMAS1999. 53-58 (1999)
Hiroshi Tsuji:“负银离子注入对聚苯乙烯的神经细胞粘附和投射延伸特性的修改”第 10 届粒子束先进应用技术研讨会论文集 53-58(1999)。
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Hiroshi Tsuji: "Neuron Cell Positioning on Polystyrene in Culture by Silver-Negative-Ion Implantation and Region Control of Neural Outgrowth"Nuclear Instruments and Methods in Physical Research B. Vol.B166-167. 815-819 (2000)
Hiroshi Tsuji:“通过银负离子植入在培养物中的聚苯乙烯上定位神经元以及神经生长的区域控制”物理研究中的核仪器和方法 B.卷B166-167。
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辻博司: "人為的神経回路網形成を目指した負イオン注入によるポリスチレン表面のパターン化処理"アイオニクス -イオンの科学と技術-. 26巻・7号. 11-16 (2000)
Hiroshi Tsuji:“通过负离子注入对聚苯乙烯表面进行图案化,旨在形成人工神经网络”Ionics - 离子科学与技术,第 26 卷,第 7. 11-16 期(2000 年)。
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辻博司: "負イオン注入によるポリスチレン表面の神経細胞接着特性の改質とパターン化処理"真空. 44巻・号(掲載予定). 6 (2001)
Hiroshi Tsuji:“通过负离子注入对聚苯乙烯表面的神经元粘附特性进行改性和图案化”,真空第 44 卷(待出版)。
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Hiroshi Tsuji: "A Negative Ion Beam Application for Improving Biocompatibility of Polystyrene Surface"Proceedings of the 13th International Conference on Ion Implantation Technology-IIT2000 (to be published from IEEE in 2001).. IIT2000. 4 (2001)
Hiroshi Tsuji:“用于改善聚苯乙烯表面生物相容性的负离子束应用”第13届国际离子注入技术会议论文集-IIT2000(将于2001年由IEEE出版).. IIT2000。
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共 23 条
Development of Nitride and Carbide Cathodes for Realization of Highly Stable Vacuum Micro Electron Sources
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批准号:12135204
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项目类别:Grant-in-Aid for Scientific Research on Priority Areas
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资助金额:$17.98万
-
财政年份:2000
-
负责人:ISHIKAWA Junzo
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依托单位:
Negative-Ion Beam Material Processing Techniques
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批准号:08044140
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项目类别:Grant-in-Aid for international Scientific Research
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资助金额:$3.84万
-
财政年份:1996
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负责人:ISHIKAWA Junzo
-
依托单位:
Establishment of Charging Free and Non-Scatter Implantation Technology for Micro Powders by Using Negative-Ion Beam
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批准号:08555172
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项目类别:Grant-in-Aid for Scientific Research (A)
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资助金额:$12.74万
-
财政年份:1996
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负责人:ISHIKAWA Junzo
-
依托单位:
Development of Charge-up Free lon lmplantation by Using Negative lon Beam
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批准号:05555008
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项目类别:Grant-in-Aid for Developmental Scientific Research (B)
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资助金额:$10.62万
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财政年份:1993
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负责人:ISHIKAWA Junzo
-
依托单位:
Establishment of the Negative-Ion Beam Technology for Material Modification
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批准号:05402027
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项目类别:Grant-in-Aid for General Scientific Research (A)
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资助金额:$19.2万
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财政年份:1993
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负责人:ISHIKAWA Junzo
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依托单位:
Development of Negative-Ion-Beam Techniques for Film Formation and Crystallinity Control
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批准号:61460065
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项目类别:Grant-in-Aid for General Scientific Research (B)
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资助金额:$4.22万
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财政年份:1986
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负责人:ISHIKAWA Junzo
-
依托单位:
海外基金