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Ion Beam Processing of Polymeric Biomaterials

Ion Beam Processing of Polymeric Biomaterials
聚合生物材料的离子束加工
批准号:
11694148
负责人:
ISHIKAWA Junzo
金额:
$3.01万
依托单位:
依托单位国家:
日本
项目类别:
Grant-in-Aid for Scientific Research (B).
财政年份:
1999
资助国家:
日本
项目状态:
已结题
起止时间:
1999 至 2000

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中文摘要
翻译
1.离子束处理的聚合物表面和亲水表面的物理评价用5-30 keV的负离子或正离子注入聚苯乙烯(PS)、聚二甲基硅氧烷(PDMS)和聚乳酸(PLA)等聚合物表面,用XPS研究它们与纯水的接触角、引入的氧原子量和原子键合状态。离子束处理的表面显示出比未处理的表面更低的接触角。低能量注入的PLA具有较高的接触角。发现通过离子注入降低接触角是由于形成具有C-O和/或C=O键的官能团2。离子束处理聚合物表面及选择性细胞粘附特性的生物学评价将具有神经生长因子活性的PC-12 h(大鼠肾上腺嗜铬细胞瘤)神经细胞培养在离子束处理的聚苯乙烯、聚二甲基硅氧烷和聚乳酸聚合物表面上,细胞仅在离子束植入时表现出选择性粘附特性 ...更多信息 艾德区在高葡萄糖培养基中的血清。此外,在无血清培养基中,细胞在仅离子注入区域上表现出选择性神经突起延伸。因此,我们实现了对神经细胞在聚合物表面的附着特性的控制。对于聚乳酸,低能负离子注入(5 keV左右)使细胞贴壁性丧失,高能负离子束注入(30 keV,低剂量)使细胞贴壁性增强.聚合物表面的图形化负离子束处理及在旋涂聚苯乙烯薄膜上人工形成神经元网络聚合物表面通过具有许多宽度为几μm的狭缝的图形化掩模进行银、铜和碳负离子束处理。在这种微图案中,不仅在PS、PDMS和PLA的本体材料上,而且在旋涂的聚苯乙烯薄膜上实现了选择性细胞附着和选择性突起延伸性质。因此,我们在PS膜上形成了人工设计的神经细胞网络。发展了生物医用高分子表面改性的离子束处理技术,实现了生物相容性的控制,如神经细胞附着和突起扩张特性.通过这种处理,我们制作了一个人工设计的神经元网络。少
英文摘要
1. Physical Evaluation of Ion Beam Treated Polymer Surfaces and Hydrophilic SurfacePolymers such as polystyrene (PS), polydimethylsiloxane (PDMS) and poly-lactic-acid (PLA) were implanted with negative or positive ions at energy in 5-30 keV, and their surfaces are investigated about contact angle of pure water, and about amount of introduced oxygen atoms and atomic bonding states by XPS.In almost all case, ion beam treated surfaces showed lower contact angle than untreated surfaces. But low energy implanted PLA showed higher contact angle. The lowering contact angle by ion implantation was found to be resulted by forming functional groups with C-O and/or C=O bonds2. Biological Evaluation of Ion Beam Treated Polymer Surfaces and Selective Cell Attachment PropertiesNerve cells of PC-12h (rat adrenal phechromocytoma) with NGF active property were cultured on the ion beam treated polymer surfaces of PS, PDMS, and PLA.The cells showed selective attachment properties on only ion beam implant … More ed region in a high glucose medium with serum. Besides, the cells showed selective nerve protrusion extension over only ion implanted region in serum-free medium. Thus, we achieved control of nerve cell attachment properties on polymer surface. For PLA, cell attachment property was removed by low energy negative ion implantation about 5 keV, and cell attachment property was enhanced by negative ion beam implantation at a high energy of 30keV with a low dose.3. Patterningly Negative Ion Beam Processing of Polymer Surfaces and Artificial Formation of Neuron Network on Spin-coated Polystyrene FilmsPolymer surfaces were silver, copper, and carbon negative ion beam treated through a patterning mask with many slits of several μm in width. In such micro-pattern, selective cell attachment and selective protrusion extension properties were achieved not only on bulk materials of PS, PDMS and PLA but also on spin-coated polystyrene thin films Thus, we formed artificially designed nerve cell network on PS films.Thus, we developed ion beam processing technique for biomedical polymer surface modification and achieved control of biocompatibility such as nerve cell attachment and protrusion expansion properties. By this processing, we made an artificially designed neuron network. Less
期刊论文(50)
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会议论文
辻博司: "銀負イオン注入によるポリスチレンの神経細胞接着と突起伸展特性の改質"第10回粒子線の先端的応用技術に関するシンポジウム論文集. BEAMAS1999. 53-58 (1999)
Hiroshi Tsuji:“负银离子注入对聚苯乙烯的神经细胞粘附和投射延伸特性的修改”第 10 届粒子束先进应用技术研讨会论文集 53-58(1999)。
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Hiroshi Tsuji: "Neuron Cell Positioning on Polystyrene in Culture by Silver-Negative-Ion Implantation and Region Control of Neural Outgrowth"Nuclear Instruments and Methods in Physical Research B. Vol.B166-167. 815-819 (2000)
Hiroshi Tsuji:“通过银负离子植入在培养物中的聚苯乙烯上定位神经元以及神经生长的区域控制”物理研究中的核仪器和方法 B.卷B166-167。
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辻博司: "人為的神経回路網形成を目指した負イオン注入によるポリスチレン表面のパターン化処理"アイオニクス -イオンの科学と技術-. 26巻・7号. 11-16 (2000)
Hiroshi Tsuji:“通过负离子注入对聚苯乙烯表面进行图案化,旨在形成人工神经网络”Ionics - 离子科学与技术,第 26 卷,第 7. 11-16 期(2000 年)。
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辻博司: "負イオン注入によるポリスチレン表面の神経細胞接着特性の改質とパターン化処理"真空. 44巻・号(掲載予定). 6 (2001)
Hiroshi Tsuji:“通过负离子注入对聚苯乙烯表面的神经元粘附特性进行改性和图案化”,真空第 44 卷(待出版)。
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共 23 条
    Development of Nitride and Carbide Cathodes for Realization of Highly Stable Vacuum Micro Electron Sources
    • 批准号:
      12135204
    • 项目类别:
      Grant-in-Aid for Scientific Research on Priority Areas
    • 资助金额:
      $17.98万
    • 财政年份:
      2000
    • 负责人:
      ISHIKAWA Junzo
    • 依托单位:
    Negative-Ion Beam Material Processing Techniques
    • 批准号:
      08044140
    • 项目类别:
      Grant-in-Aid for international Scientific Research
    • 资助金额:
      $3.84万
    • 财政年份:
      1996
    • 负责人:
      ISHIKAWA Junzo
    • 依托单位:
    Establishment of Charging Free and Non-Scatter Implantation Technology for Micro Powders by Using Negative-Ion Beam
    • 批准号:
      08555172
    • 项目类别:
      Grant-in-Aid for Scientific Research (A)
    • 资助金额:
      $12.74万
    • 财政年份:
      1996
    • 负责人:
      ISHIKAWA Junzo
    • 依托单位:
    Development of Charge-up Free lon lmplantation by Using Negative lon Beam
    • 批准号:
      05555008
    • 项目类别:
      Grant-in-Aid for Developmental Scientific Research (B)
    • 资助金额:
      $10.62万
    • 财政年份:
      1993
    • 负责人:
      ISHIKAWA Junzo
    • 依托单位:
    海外基金