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Gallium Nitride Single Crystal Growth by Flux Method

Gallium Nitride Single Crystal Growth by Flux Method
助熔剂法生长氮化镓单晶
批准号:
12555175
负责人:
SHIMADA Masahiko
金额:
$8.45万
依托单位:
依托单位国家:
日本
项目类别:
Grant-in-Aid for Scientific Research (B)
财政年份:
2000
资助国家:
日本
项目状态:
已结题
起止时间:
2000 至 2002

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中文摘要
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英文摘要
Colorless transparent platelet single crystals with a maximum area of 10.0 X 5.0mm^2 by 0.03-0.1 mm thick was obtained at 750℃, 5Mpa of N2 for 360h and 0.60 of Na/(Ga+Ns)mole ratio (γ_<Na>). At 800℃, 3MPa of N_2 for 250h and γ_<Na>=0.60, colorless transparent prismatic crystals having a size of 1.0x0.5x0.5 mm^3 were obtained. Prismatic single crystals with 1.0xO.5x0.5 mm3 size were also obtained at 750℃, 5MPa of N_2 for 450h and γ_<Na>=0.54. The morphology of GaN single crystals tended to change from platelet to prismatic with increasing growth temperature, decreasing N_2 pressure and decreasing γ_<Na>.The fill width at half-maximum (FWHM) of the rocking curve measured for O004 X-ray diffraction peak was 25 arcsec, for 1 mm size platelet crystals and 32 arcsec, for 3 mm size platelet crystals. Hall measurements were carried out by the van der Pauw technique for the platelet crystals having a size of 1x1x0.2 mm^3. The concentration of free electrons in the crystal was 1-2x10^<18>cm-^3 and the mobility was 100 cm^2V-^1S-^1 at room temperature. The electrical conductivity was about 25 Ω-1cm-1 and almost independent of temperature between 120 and 350 K. The near band-edge emission of GaN was observed at 365 nm (3.4eV) by CL spectroscopy. No bands or peaks except the peak from the near band emission were observed. These results indicate the high quality of the GaN single crystals synthesized in this study.
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M. Aoki, H. Yamane, M. Shimada, S. Sarayama and F.J. Salvo: "Conditions for seeded growth of GaN crystals by the Na flux method"Materials Letters. 56. 660-664 (2002)
M. Aoki、H. Yamane、M. Shimada、S. Sarayama 和 F.J. Salvo:“通过 Na 助熔剂方法进行 GaN 晶体晶种生长的条件”材料快报。
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通讯作者:
Takashi Sekiguchi: "Gathodluminescence study of h-and c-GaN single crystals grown by Na or K flux"Science and Technology of Advanced Materials. 3. 91-94 (2002)
Takashi Sekiguchi:“Na或K助熔剂生长的h-和c-GaN单晶的阴极发光研究”先进材料科学与技术。
DOI: --
发表时间:
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作者: []
通讯作者:
Masato Aoki: "Conditions for seeded growth of GaN crystals by the Na flux method"Materials Letters. 56. 660-664 (2002)
Masato Aoki:“通过 Na 熔剂法进行 GaN 晶体晶种生长的条件”材料快报。
DOI: --
发表时间:
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通讯作者:
M. Aoki, H. Yamane, M. Shimada, S. Sarayama and F.J. DiSalvo: "Growth Conditions and Morphology of GaN Single Crystals Fabricated by the Na Flux Method"Journal of Ceramic Society of Japan. 109. 858-862 (2000)
M. Aoki、H. Yamane、M. Shimada、S. Sarayama 和 F.J. DiSalvo:“Na 助熔剂法制造的 GaN 单晶的生长条件和形态”日本陶瓷学会杂志。
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作者: []
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