Research and development of III-nitride semiconductor LED/Laser using quantum dots
Research and development of III-nitride semiconductor LED/Laser using quantum dots
批准号:
13555083
负责人:
TANAKA Satoru
金额:
$8.96万
依托单位:
依托单位国家:
日本
项目类别:
Grant-in-Aid for Scientific Research (B)
财政年份:
2001
资助国家:
日本
项目状态:
已结题
起止时间:
2001 至 2002
中文摘要
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英文摘要
The fabrication and evaluation of a UV light-emitting diode (LED) incorporating GaN quantum dots as the active layer is demonstrated. The GaN quantum dots were fabricated on an Al_xGa_<1-x>N (x〜0.1) surface using Si as an antisurfactant. Exposing the Al_xGa_<1-x>N surface to the Si antisurfactant prior to GaN growth enabled the formation of quantum dots on a surface where growth by the Stranski-Krastanov mode would not be possible. A fairly high density of dots (10^<10>-10^<11> cm^<-2> with controllable dot sizes was ichieved. Room temperature luminescence at 360 nm was clearly observed during current injection (cw) into an LED structure including the GaN quantum dots.
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青柳克信: "科学フロンティア-ナノマテリアル最前線"化学同人. 7 (2002)
Katsunobu Aoyagi:“科学前沿 - 纳米材料的前沿”化学同人 7 (2002)。
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通讯作者:
J.Brault: "Linear alignment of GaN quantum dots on AlN grown on vicinal SiC substrates"Journal of Applied Physics. 93・5. 3108-3110 (2003)
J.Brault:“在邻位 SiC 衬底上生长的 AlN 上的 GaN 量子点的线性排列”应用物理学杂志 93・5(2003 年)。
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J.S.Lee: "GaN quantum dot UV light emitting diode"Mater.Res.Soc.Proc.. 印刷中.
J.S.Lee:“GaN量子点紫外发光二极管”Mater.Res.Soc.Proc..正在出版。
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J.Brault: "Characteristics of AIN growth on vicinal SiC (0001) substrates by molecular beam epitaxy"Phys. Stat. Sol. (b). 240, No. 5. 314-317 (2003)
J.Brault:“通过分子束外延在邻位 SiC (0001) 衬底上生长 AIN 的特性”Phys。
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青柳克信, 田中悟: "科学フロンティアーナノマテリアル最前線"化学同人. 7 (2002)
Katsunobu Aoyagi、Satoru Tanaka:《科学前沿·纳米材料前沿》化学同人志 7 (2002)。
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