Basic study of coherent hot electron generation and its application for ultrafast devices
相干热电子产生基础研究及其在超快器件中的应用
基本信息
- 批准号:05402040
- 负责人:
- 金额:$ 8.83万
- 依托单位:
- 依托单位国家:日本
- 项目类别:Grant-in-Aid for General Scientific Research (A)
- 财政年份:1993
- 资助国家:日本
- 起止时间:1993 至 1994
- 项目状态:已结题
- 来源:
- 关键词:
项目摘要
In this research, the generation and the measurement of the coherent hot electron, the possibility of transport control of the hot electron based on the wave principle and the realization of the nanometer-pitch electron-wave grating were studied.The realization possibility of the electron wave device depend on the coherence of the electron. The coherent length of the quasi-equilibrium electron in the modulation doped structure has been estimated to be quite long at very low temperature and under very low applied voltage. On the other hand, the phase of the non-equilibrium electron or the hot electron is broken by the spontaneous emission of the L0-phonon and its phase braking time is supposed to be as short as 0.2ps. However, for operation at temperature higher than 4K and under appropriate voltage application, it is interesting to consider how to use the hot electron for the electron wave device.We are estimating the coherent properties of the hot electron using the double barrier res … More onant tunneling diode(RTD). When the phase of the electron is broken in the well of the RTD,the width of the resonant level increases. Then by measuring the width of the resonant level of the RTD,we can estimate the phase braking time or the coherent properties of the hot electron in the well. Therefore we have fabricated GaInAs/InP double barrier RTDs by OMVPE.From the second derivatives of the I-V curves, we have measured widths of resonant levels of RTDs. We compared the dependence of the level width on the barrier thickness with theory to estimate the coherent length. The apparent coherent length in GaInAs was 80-120nm at 4K when the energy of the electron was 100meV.Projecting to control the transport of the hot electron by electron wave diffraction in a quantum grating, we are developing nanofabrication technology of ultrafine pitch grating. We have achieved 40nm-pitch InP gratings embedded in GaInAs by combining electron-beam lithography, special wet chemical etching and organometallic vapor phase epitaxy overgrowth. Furthermore, to observe the ultrafine diffraction pattern of the electron wave, we have fabricated 40nm-pitch arrays of ultrafine electrodes by the lift-off technique. To align the embedded grating and the ultrafine electrode, we have developed the electron-beam alignment technique by using Platinum marks. Less
研究了相干超热电子的产生和测量、基于波原理的超热电子输运控制的可能性以及纳米间距电子波光栅的实现,电子波器件的实现可能性取决于电子的相干性。在很低的温度和很低的外加电压下,调制掺杂结构中准平衡电子的相干长度被估计为相当长。另一方面,非平衡电子或热电子的相位被L0声子的自发辐射破坏,其相位制动时间应短至0.2ps。然而,对于在高于4K的温度和适当的电压下工作,考虑如何将热电子用于电子波器件是很有趣的。我们正在使用双势垒RES…来估计热电子的相干性质更多的是光隧道二极管(RTD)。当电子在RTD势垒中被破坏时,共振能级的宽度增加。然后,通过测量RTD的共振能级宽度,我们可以估计相位制动时间或势垒中超热电子的相干性质。因此,我们用OMVPE制作了GaInAs/InP双势垒RTD。从I-V曲线的二阶导数出发,我们测量了RTD的共振能级宽度。我们将能级宽度对势垒厚度的依赖关系与理论进行了比较,从而估计了相干长度。在4K下,当电子能量为100 meV时,GaInAs中的表观相干长度为80-120 nm。为了通过量子光栅中的电子波衍射来控制热电子的传输,我们正在发展超细间距光栅的纳米加工技术。我们将电子束光刻、特殊的湿法化学刻蚀和金属有机气相外延外延技术相结合,在GaInAs中实现了40 nm间距的InP光栅。此外,为了观察电子波的超细衍射图,我们用剥离技术制备了间距为40 nm的超细电极阵列。为了使嵌入的光栅与超细电极对准,我们发展了利用铂标记的电子束对准技术。较少
项目成果
期刊论文数量(18)
专著数量(0)
科研奖励数量(0)
会议论文数量(0)
专利数量(0)
K.Furuya: "Posibility fo Electron Wave Interference and Its Device Application" IEE of Japan. 114. 376-379 (1994)
K.Furuya:“电子波干扰的可能性及其器件应用”日本 IEE。
- DOI:
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- 期刊:
- 影响因子:0
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- 通讯作者:
K.Furuya: ""Estimation of phase coherent length of hot electrons in GaInAs using resonant tunneling diodes"" Jpn.J.Appl.Phys.33. 6491-6495 (1994)
K.Furuya:“使用谐振隧道二极管估计 GaInAs 中热电子的相位相干长度”Jpn.J.Appl.Phys.33。
- DOI:
- 发表时间:
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- 影响因子:0
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T.Sekiguchi,Y.Miyamoto,and K.Furuya: "Influence of impurities on the performance of doped well GaInAs/InP resonant tunneling diode" Jpn.J.Appl.Phys.32. L243-L246 (1993)
T.Sekiguchi、Y.Miyamoto 和 K.Furuya:“杂质对掺杂阱 GaInAs/InP 谐振隧道二极管性能的影响”Jpn.J.Appl.Phys.32。
- DOI:
- 发表时间:
- 期刊:
- 影响因子:0
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K.Furuya: "Analysis of phase breaking effect in resonant tunneling diodes using correlation function" Jpn.J.Appl.Phys.33. 2511-2512 (1994)
K.Furuya:“使用相关函数分析谐振隧道二极管的断相效应”Jpn.J.Appl.Phys.33。
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- 发表时间:
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- 影响因子:0
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- 通讯作者:
H.Hongo,Y.Miyamoto,J.Suzuki,M.Funayama,and K.Furuya: "Ultrafine fabrication technique for hot electron interference/diffraction devices" Int.Conf.on Solid State Devices and Materials(SSDM). LC-15. 984-985 (1993)
H.Hongo、Y.Miyamoto、J.Suzuki、M.Funayama 和 K.Furuya:“热电子干涉/衍射器件的超精细制造技术”固态器件和材料国际会议 (SSDM)。
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FURUYA Kazuhito其他文献
FURUYA Kazuhito的其他文献
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{{ truncateString('FURUYA Kazuhito', 18)}}的其他基金
Observation of Electron-Wave Diffraction with Scanning Probe based on Reciprocity Principle
基于互易原理的扫描探针电子波衍射观测
- 批准号:
15360184 - 财政年份:2003
- 资助金额:
$ 8.83万 - 项目类别:
Grant-in-Aid for Scientific Research (B)
Quantum Interference Devices Controlled by Metals Buried in Semiconductors
由埋在半导体中的金属控制的量子干涉装置
- 批准号:
11694136 - 财政年份:1999
- 资助金额:
$ 8.83万 - 项目类别:
Grant-in-Aid for Scientific Research (B)
Study of Direct Observation of Electron Wave Phenomena in Solid State by Scanning Hot Electron Microscopy
扫描热电子显微镜直接观察固态电子波现象的研究
- 批准号:
11355013 - 财政年份:1999
- 资助金额:
$ 8.83万 - 项目类别:
Grant-in-Aid for Scientific Research (A).
Electron Wave Interference in Semiconductor Biprism of Tungsten Wire for Lateral Coherence Estimation
钨丝半导体双棱镜中的电子波干扰用于横向相干性估计
- 批准号:
10305024 - 财政年份:1998
- 资助金额:
$ 8.83万 - 项目类别:
Grant-in-Aid for Scientific Research (A).
New STM technique for observation of ballistic electrons in semiconductors
用于观察半导体中弹道电子的新型 STM 技术
- 批准号:
08405023 - 财政年份:1996
- 资助金额:
$ 8.83万 - 项目类别:
Grant-in-Aid for Scientific Research (A)
Basic research on semiconductor materials and devices
半导体材料与器件基础研究
- 批准号:
04045023 - 财政年份:1992
- 资助金额:
$ 8.83万 - 项目类别:
Grant-in-Aid for international Scientific Research
Basic Study of Ultra-High Speed Electron wave Device Using Hot-Electron Transport in Lateral Superlattice
利用横向超晶格热电子输运的超高速电子波器件的基础研究
- 批准号:
01420025 - 财政年份:1989
- 资助金额:
$ 8.83万 - 项目类别:
Grant-in-Aid for General Scientific Research (A)
Study on Fabrication Technology of GaInAs/InP Device with Ultrafine Structure
超精细结构GaInAs/InP器件制备技术研究
- 批准号:
63850077 - 财政年份:1988
- 资助金额:
$ 8.83万 - 项目类别:
Grant-in-Aid for Developmental Scientific Research
Basic Research of GaInAs Ultrafast Transistor Using Diffraction of Ballistic Electron
利用弹道电子衍射的GaInAs超快晶体管的基础研究
- 批准号:
62460133 - 财政年份:1987
- 资助金额:
$ 8.83万 - 项目类别:
Grant-in-Aid for General Scientific Research (B)
"Basic study on very-fast GaInAs transistor and integrated long-wavelength laser"
《极快GaInAs晶体管和集成长波长激光器的基础研究》
- 批准号:
60550274 - 财政年份:1985
- 资助金额:
$ 8.83万 - 项目类别:
Grant-in-Aid for General Scientific Research (C)
相似海外基金
Improvement of fast electron coherence by tuning polarization of ultra-intense laser
通过调谐超强激光偏振提高快速电子相干性
- 批准号:
26400537 - 财政年份:2014
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438244-2013 - 财政年份:2014
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Postdoctoral Fellowships
Understanding Electron Coherence through Attosecond Dynamics in Molecules
通过分子中的阿秒动力学了解电子相干性
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438244-2013 - 财政年份:2013
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15560291 - 财政年份:2003
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