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Ecology and Dynamics of Hydrogen at Semiconductor Surface

Ecology and Dynamics of Hydrogen at Semiconductor Surface
半导体表面氢的生态学和动力学
批准号:
07305049
负责人:
OURA Kenjiro
金额:
$3.07万
依托单位:
依托单位国家:
日本
项目类别:
Grant-in-Aid for Scientific Research (A)
财政年份:
1995
资助国家:
日本
项目状态:
已结题
起止时间:
1995 至 1996

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中文摘要
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英文摘要
Since hydrogen is the most simple element, it is difficult to detect hydrogen atoms especially when they reside on solid surfaces. Under the present condition, using several limited methods, several properties of surface hydrogen such as absolute amounts, electronic states, atomic arrangements are independently investigated in a fragmentary manner, and the behavior of surface hydrogen is being discussed under inference. The purpose of this research project is to elucidate the ecology and dynamics at semiconductor surfaces by means of intensive studies on surface hydrogen conducted by researchers who have achievements on specialized experimental methods and theorists.In this research project, with getting in close touch between researchers, we have studied the influence of surface hydrogen on the behaviors of metal atoms and substrate silicon atoms at atomic hydrogen adsorption on the metal-silicon shallow interface structures by means of structure analysis, evaluation of chemical state, and theoretical calculation. The result worthy of special mention was that we have investigated the structural changes of the In/Si (111) surface induced by atomic hydrogen exposure and found that the substrate Si atoms ware self-organized to peculiar structures induced by adsorption of hydrogen with being strongly dependent on the substrate reconstruction.
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K.Oura 他3名: "Observation of the diffusion of Ag atoms throgh an a-Si layer on Si(111) by low energy ion scattering" Surf.Sci.363. 156-160 (1996)
K.Oura 和其他 3 人:“通过低能离子散射观察 Ag 原子通过 Si(111) 上的 a-Si 层的扩散”Surf.Sci.363 (1996)。
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K. Oura 他4名: "Thin-film growth-mode anaoysis by low energy ion scattering" Surf. Sci.363. 161-165 (1996)
K. Oura 和其他 4 人:“低能离子散射的薄膜生长模式分析”Surf. 161-165 (1996)。
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T. Takahagi 他4名: "Aluminum-selective chemical vapor deposition induced by hydrogen desorption on silicon" Jpn. J. Appl. Phys.35-2B. 1010-1013 (1996)
T. Takahagi 等 4 人:“硅上氢解吸引起的铝选择性化学气相沉积”J. Appl. 1010-1013 (1996)。
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通讯作者:
K. Oura 他3名: "Observation of the diffusion Ag atoms through an a-Si layer on Si (111) by low energy ion scattering" Surf. Sci.363. 156-160 (1996)
K. Oura 和其他 3 人:“通过低能离子散射观察 Ag 原子穿过 Si (111) 上的非晶硅层的扩散”Sci.363 (1996)。
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14
    Synthesis of Carbon Nanotubes with Long Length and High Density and its Application to Nanodevices
    • 批准号:
      16206004
    • 项目类别:
      Grant-in-Aid for Scientific Research (A)
    • 资助金额:
      $32.2万
    • 财政年份:
      2004
    • 负责人:
      OURA Kenjiro
    • 依托单位:
    CONTROL OF CARBON NANOTUBE GROWTH USING SELF-ORGANIZED CATALYST NANOCLUSTERS AND ITS APPLICATION TO NANODEVICES
    • 批准号:
      14205010
    • 项目类别:
      Grant-in-Aid for Scientific Research (A)
    • 资助金额:
      $35.19万
    • 财政年份:
      2002
    • 负责人:
      OURA Kenjiro
    • 依托单位:
    Study on Growth Mechanism of Carbon Nanotubes Grown Using Self-Organized Catalyst Nanoclusters
    • 批准号:
      13355003
    • 项目类别:
      Grant-in-Aid for Scientific Research (A)
    • 资助金额:
      $33.95万
    • 财政年份:
      2001
    • 负责人:
      OURA Kenjiro
    • 依托单位:
    Development of Ion Scattering and Recoiling Spectroscopy for In Situ Monitoring of Semiconductor Surface Processes in Gas Phase Atmosphere
    • 批准号:
      11305006
    • 项目类别:
      Grant-in-Aid for Scientific Research (A)
    • 资助金额:
      $23.64万
    • 财政年份:
      1999
    • 负责人:
      OURA Kenjiro
    • 依托单位:
    海外基金