CONTROL OF CARBON NANOTUBE GROWTH USING SELF-ORGANIZED CATALYST NANOCLUSTERS AND ITS APPLICATION TO NANODEVICES
CONTROL OF CARBON NANOTUBE GROWTH USING SELF-ORGANIZED CATALYST NANOCLUSTERS AND ITS APPLICATION TO NANODEVICES
批准号:
14205010
负责人:
OURA Kenjiro
金额:
$35.19万
依托单位:
依托单位国家:
日本
项目类别:
Grant-in-Aid for Scientific Research (A)
财政年份:
2002
资助国家:
日本
项目状态:
已结题
起止时间:
2002 至 2003
中文摘要
用一种新研制的探针系统测量了碳纳米管的电导。通过使用带有自组织催化剂纳米簇的热化学气相沉积或将商业碳纳米管分散在图案化电极上,将碳纳米管桥接在电极之间。此外,在碳纳米管桥的两端沉积了钛电极,以降低碳纳米管与电极之间的接触电阻。制作了一种以碳纳米管为沟道的场效应管(FET)测试装置,将碳纳米管桥接在电极之间,在真空中对其进行了热处理,降低了接触电阻,表明碳化钛可以在电极的界面形成。此外,利用光刻和剥离技术在碳纳米管的两端沉积了钛电极,从而降低了接触电阻。电导与A/L和B/L成正比,其中A、B和L分别是碳纳米管的横截面、周长和长度。这意味着我们的碳纳米管中发生了扩散输运。我们已经用碳纳米管制作了FET测试器件。通过改变栅极电压来测量漏电流。漏极电流由栅极电压调制。FET测试器件的每单位沟道宽度的跨导值与传统的p型MOSFET相当。通过改变沟道长度或电极结构可以提高FET测试器件的性能。
英文摘要
Electrical conductance of carbon nanotubes (CNTs) was measured by a newly developed probe system. The CNTs were bridged between the electrodes by using thermal CVD with self-organized catalyst nanoclusters or dispersing commercial CNTs on the patterned electrodes. Furthermore, Ti electrodes were deposited over both ends of the CNT bridges in order to reduce the contact resistance between CNTs and electrodes. A test device of field effect transistor (FET) with a channel of CNTs was fabricated.After annealing the CNTs bridging between the electrodes in a vacuum, the contact resistance was reduced, indicating the Ti carbide could form at the interface of the electrodes. Furthermore, Ti electrodes were deposited over both ends of the CNTs using photolithography and lift-off technique, resulting in reduction of the contact resistance. The conductance was found to be proportional to A/L as well as B/L, where A, B, and L is the cross section, circumference, and length of CNTs. This means that diffusive transport occurs in our CNTs.We have fabricated an FET test device using CNTs. The drain current was measured with changing gate voltages. The drain current was modulated by the gate voltages. The value of transconductance per unit channel width of the FET test devices was found to be comparable to that of conventional p-type MOSFET. The performance of the FET test devices could be improved by changing the channel length or the structure of the electrodes.
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Kenjiro Oura 他10名: "Doping of Magic Nanoclusters in the Submonolayer In/Si(100) System"Phys.Rev.Lett.. 91. 026104-1-026104-4 (2003)
Kenjiro Oura 等 10 人:“亚单层 In/Si(100) 系统中神奇纳米团簇的掺杂”Phys.Rev.Lett.. 91. 026104-1-026104-4 (2003)
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K.Oura 他5名: "Ni-based Catalytic Growth of Vertically Aligned Multi-Walled Carbon Nanotubes by Dual-RF Plasma CVD Method and their Field Emission Properties"Physica B. 323. 299-302 (2002)
K. Oura 等 5 人:“通过双 RF 等离子体 CVD 方法垂直排列多壁碳纳米管的 Ni 基催化生长及其场发射性能”Physica B. 323. 299-302 (2002)
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尾浦憲治郎 他7名: "プラズマ化学気相成長法による電界電子エミッター用ナノ構造薄膜の作製と評価"真空. 46. 302-305 (2003)
Kenjiro Onura 等 7 人:“通过等离子体化学气相沉积制备和评估场电子发射器的纳米结构薄膜”真空。 46. 302-305 (2003)
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S.Honda, M.Katayama, K.-Y.Lee, T.Ikuno, S.Ohkura, K.Oura, H.Furuta, T.Hirao: "Low Temperature Synthesis of Aligned Carbon Nanotubes by Inductively Coupled Plasma Chemical Vapor Deposition Using Pure Methane"Jpn. J. Appl. Phys.. 42. L441-L443 (2003)
S.Honda、M.Katayama、K.-Y.Lee、T.Ikuno、S.Ohkura、K.Oura、H.Furuta、T.Hirao:“通过感应耦合等离子体化学气相沉积法低温合成定向碳纳米管
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片山光浩 他8名: "触媒金属微粒子制御による垂直配向カーボンナノチューブ薄膜の作製"真空. Vol.46, No.7. 4-7 (2003)
Mitsuhiro Katayama 等 8:“通过控制催化金属细颗粒制备垂直排列碳纳米管薄膜”,真空,第 46 卷,第 7 期。
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共 25 条
Synthesis of Carbon Nanotubes with Long Length and High Density and its Application to Nanodevices
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批准号:16206004
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项目类别:Grant-in-Aid for Scientific Research (A)
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资助金额:$32.2万
-
财政年份:2004
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负责人:OURA Kenjiro
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依托单位:
Study on Growth Mechanism of Carbon Nanotubes Grown Using Self-Organized Catalyst Nanoclusters
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批准号:13355003
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项目类别:Grant-in-Aid for Scientific Research (A)
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资助金额:$33.95万
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财政年份:2001
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负责人:OURA Kenjiro
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依托单位:
Development of Ion Scattering and Recoiling Spectroscopy for In Situ Monitoring of Semiconductor Surface Processes in Gas Phase Atmosphere
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批准号:11305006
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项目类别:Grant-in-Aid for Scientific Research (A)
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资助金额:$23.64万
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财政年份:1999
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负责人:OURA Kenjiro
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依托单位:
Microscopic Analysis of Surface Hydrogen and its Application to Nano-Fabrication Techniques
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批准号:10355002
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项目类别:Grant-in-Aid for Scientific Research (A).
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资助金额:$22.72万
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财政年份:1998
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负责人:OURA Kenjiro
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依托单位:
Surface Modification of Hydrogen-Terminated Silicon Substrate using Extra-Low Energy Electron Beam
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批准号:09450017
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项目类别:Grant-in-Aid for Scientific Research (B)
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资助金额:$10.05万
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财政年份:1997
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负责人:OURA Kenjiro
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依托单位:
Joint Study on Hydrogen-Mediated Epitaxy
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批准号:08044146
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项目类别:Grant-in-Aid for international Scientific Research
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资助金额:$8.51万
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财政年份:1996
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负责人:OURA Kenjiro
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依托单位:
Developement of new hydrogen analysis method by combining classical methods and its application to the H/Si systems
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批准号:08555009
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项目类别:Grant-in-Aid for Scientific Research (A)
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资助金额:$13.06万
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财政年份:1996
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负责人:OURA Kenjiro
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依托单位:
Ecology and Dynamics of Hydrogen at Semiconductor Surface
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批准号:07305049
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项目类别:Grant-in-Aid for Scientific Research (A)
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资助金额:$3.07万
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财政年份:1995
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负责人:OURA Kenjiro
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依托单位:
Physics of Hetero-Epitaxial Growth onto the hydrogen terminated Si surface under the low temperature condition
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批准号:06402025
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项目类别:Grant-in-Aid for Scientific Research (A)
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资助金额:$22.91万
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财政年份:1994
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负责人:OURA Kenjiro
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依托单位: