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Synthesis and Nanotribology of Superhard Carbon Nitride Films

超硬氮化碳薄膜的合成与纳米摩擦学

基本信息

批准号：
10355028
负责人：
TAKAI Osamu
金额：
$ 13.5万
依托单位：
Nagoya University
依托单位国家：
日本
项目类别：
Grant-in-Aid for Scientific Research (A).
财政年份：
1998
资助国家：
日本
起止时间：
1998 至 2000
项目状态：
已结题

来源：
https://kaken.nii.ac.jp/grant/KAKENHI-PROJECT-10355028/
关键词：
carbon nitride arc plasma amorphous superhard material shielded arc ion plating nanoindentation tribological properties chemical bonding states シールド型アークイオンプレーテイング

项目摘要

We have succeeded to synthesize amorphous carbon nitride (a-C : N) thin films by using the shielded arc ion plating process developed by ourselves. In this study, fundamental investigations were performed in order to apply the a-C : N thin films as novel super hard coatings. Chemical compositions and bonding states of the deposited films were characterized both by infrared spectroscopy and by X-ray photoelectron spectroscopy. The nanomechanical properties were made clear by using Triboscope.<Chemical Bonding States>We varied a nitrogen gas pressure and a substrate bias as deposition parameters. As increasing the nitrogen pressure, the nitrogen composition increased up to the N/C composition ratio of 0.45. However the C-C and C-N bonds became graphite-like and piligine-like states, respectively, which had 2D plane network structures. Applying negative substrate biases invoked ion bombardments on the growing film surfaces, which caused formation of the sp^3 bonding states in the films. A … More n excess of the negative bias, however, raised both a graphitation of the sp^3 bonding states and a decrease in the nitrogen composition at the same time. In the condition of the high nitrogen pressure, the effect of the negative bias was reduced due to the short mean free path of the ions in the arc plasma. Thus the sp hybridizing ratio and the N/C composition ratio was able to control by the nitrogen gas pressure and the negative substrate bias.<Nanomechanical Properties>By using Triboscope, we measured nanohardness of the a-C : N films prepared at various nitrogen gas pressures and negative substrate biases. The film thickness was unified at 150 nm for all samples. The nanohardness was degraded with increase both in the nitrogen pressure and in the negative substrate bias. This result was consistent with the fact that the high nitrogen pressure makes the C-N bonds in the films be the piligine-like states instead of the 3D C-N networks, and that the excess of the negative substrate bias makes the carbon networks in the films sp^2-like bonding states. The hardest a-C : N thin film showed a nanohardness greater than the TiN film which is widely used as hard coating materials. The nano-wear property was also investigated by Triboscope. After a region of 1μm x 1μm on the film surface was scanned by a Vercobich-type diamond tip in a low load, the wear depth of the region was observed by an atomic force microscope. The nano-wear property was much more excellent than that of the diamondlike carbon films which have been already applied as wear-resistant coatings. From these results, the a-C : N thin films synthesized in this study was proved to be useful in the fields related in tribology. Less

采用自行开发的电弧保护离子镀工艺，成功地合成了非晶态氮化碳薄膜。本研究为将a-C: N薄膜应用于新型超硬涂层进行了基础研究。利用红外光谱和x射线光电子能谱对沉积膜的化学成分和键合状态进行了表征。用摩擦显微镜测定了材料的纳米力学性能。我们改变了氮气压力和衬底偏压作为沉积参数。随着氮压力的增加，氮组成逐渐增加，氮碳组成比达到0.45。而C-C键和C-N键则分别变成了类石墨态和类铅态，具有二维平面网络结构。施加负衬底偏置会在生长中的薄膜表面引起离子轰击，从而导致薄膜中sp^3键态的形成。然而，更多的负偏压会增加sp^3键态的石墨化，同时氮的组成也会减少。在高氮压力条件下，电弧等离子体中离子的平均自由程较短，减小了负偏压的影响。因此，sp杂化比和N/C组成比可以由氮气压力和负衬底偏压控制。通过Triboscope，我们测量了在不同氮气压力和负衬底偏置下制备的a-C: N薄膜的纳米硬度。所有样品的膜厚统一在150nm。纳米硬度随氮压和负衬底偏压的增加而降低。这一结果与高氮压力使膜中的碳- n键变为类似于平线的状态而不是三维碳- n网络，以及过量的负基底偏压使膜中的碳网络变为类似于sp^2的键态的事实相一致。最硬的a- c: N薄膜的纳米硬度高于广泛用作硬涂层材料的TiN薄膜。并用摩擦显微镜对其纳米磨损性能进行了研究。在低载荷下，用vercobich型金刚石针尖扫描薄膜表面1μm × 1μm的区域，用原子力显微镜观察该区域的磨损深度。其纳米磨损性能远优于已应用于耐磨涂层的类金刚石碳膜。这些结果证明了本研究合成的a-C: N薄膜在摩擦学相关领域的应用价值。少