Preparation of Ultra Water-repellent Films with Transparency and Hardness by Plasma-enhanced CVD

采用微波等离子体增强化学气相沉积（MWPECVD）技术，以不同种类的有机硅化合物为原料，在低温条件下制备疏水薄膜。沉积膜的拒水性取决于全氟烷基链的长度。最大水接触角约为107 °，与聚四氟乙烯（PTFE）的水接触角相近。其次，我们开发了多步MWPECVD工艺。我们控制了沉积过程中提供的气体成分和反应物的量。第一步，用四甲基硅烷（TMS）和氧气的混合气体制备SiO_2薄膜。在沉积SiO_2层后，我们逐渐减少氧气供应，然后开始引入FAS和Ar，以形成疏水层。薄膜的硬度随沉积时间的缩短而增加， 关于我们 防白蚁层该工艺可在低温下沉积出具有类似硼硅玻璃的高硬度和高拒水性的SiO_2薄膜。薄膜在可见光范围内也有很高的透过率。第三，通过控制表面形貌，制备了水接触角大于150 °的超疏水薄膜。我们使用TMS或六甲基二硅烷（HMDS）、FAS和Ar的三重气体混合物作为源气体。表面粗糙度是可控的，通过改变气体成分和总压力。水接触角随表面粗糙度的增大而增大。通过优化制备条件，成功制备了水接触角为160 °的超疏水薄膜。第四，研究了MWPECVD系统中的沉积参数，制备了具有超疏水性和高透过率的薄膜。作为这项研究的结果，我们成功地在薄膜的制备中使用的三重气体混合物的TMS或三甲基甲氧基硅烷（TMMOS），FAS和Ar。优化了沉积工艺参数，如总压、气体成分、反应气体出口位置与衬底位置的距离、衬底温度等。因此，我们制备的薄膜与水的接触角超过140 °，在可见光范围内的透射率超过80%。少

Low temperature deposition of water-repellent thin films was carried out using various kinds of organosilicon compound by microwave plasma-enhanced chemical vapor deposition (MWPECVD) .First, we used perfluoro-alkyl silanes (FASs) as raw materials and investigated the deposition of water-repellent films. The water repellency of the deposited films depended on the perfluoro-alkyl chain length. The maximum water-contact angle was about 107ﾟ which was similar to the angle for polytetrafluoro-ethylene(PTFE).Second, we developed a multiple-step MWPECVD process. We controlled the gas composition and the amount of reactant supplied during deposition. In the first step of this process, a SiO_2 film was prepared using the mixture of tetramethylsilane (TMS) and oxygen. After deposition of the SiO_2 layr, we decreased the oxygen supply gradually and then started to introduce FAS with Ar to from a water-repellent layr. The hardness of the film increased with a decrease in deposition time of the wa … More ter-repellent layr. This process enabled the low-temperature deposition of SiO_2 films having both high hardness similar to boro-silicate glass and high water repellency. The films had also high transmittance in the visible range.Third, ultra water-repellent thin films with a water-contact angle of over 150ﾟ were prepared by controlling the surface morphology. We used triple gas mixtures of TMS or hexamethyldisilane (HMDS), FAS and Ar as source gases. Surface roughness was controllable by changing the gas composition and the total pressure. The water-contact angle increased with surface roughness. We succeeded in the preparation of ultra-water repellent films with a water-contact angle of 160ﾟ by optimizing the preparation conditions.Fourth, we studied the deposition parameters in the MWPECVD system to prepare a thin film with ultra water repellency and high transmittance. As a result of this study, we succeeded in the preparation of the film by using a triple gas mixture of TMS or trimethylmethoxysilane (TMMOS), FAS and Ar. We optimized deposition parameters such as the total pressure, the gas composition, the distance between the position of outlets of reactant gases and the substrate position, and the substrate temperature. Consequently, we prepared the films with a water-contact angle of over 140ﾟ and transmittance of over 80% in the visible range. Less