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Tomographic detection of micro-defects in semi-conductions due to light scattering and photoluminescence imaging

Tomographic detection of micro-defects in semi-conductions due to light scattering and photoluminescence imaging
由于光散射和光致发光成像而导致的半导体微缺陷的断层扫描检测
批准号:
10450011
负责人:
OGAWA Tomoya
金额:
$9.73万
依托单位:
依托单位国家:
日本
项目类别:
Grant-in-Aid for Scientific Research (B)
财政年份:
1998
资助国家:
日本
项目状态:
已结题
起止时间:
1998 至 1999

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中文摘要
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英文摘要
Since the defect density in ordinary semiconductor crystals is fairly low, determination of the surveillance volume is very important to get correct information about defects in the crystals. Here the volume is defined as that to be searched by a single surveillance trial and should be equal to or a little larger than the reciprocal density of the defects.The following two-step investigation resulted in successful and novel use of an ordinary IR light scattering tomography (LST) instrument for this purpose. (1) The surveillance thickness of photoluminescence (PL) due to carriers optically injected by a laser beam for LST is usually much larger than that of the laser beam diameter for LST, because the carriers diffuse out emitting PL from the position illuminated by the beam. Thus PL mapping is very effective to search for low density defects in the crystals since the defects act as usually PL killer centers and, sometimes, recombination centers. (2) The intensity modulated positions in the PL mapping were carefully surveyed by layer-by-layer tomography using a finely focused laser beam.By complimentary combination of the above two methods the defects will be clearly observed.
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M. Ma, N. Nango, T. Ogawa, M. Watanabe and M. Eguchi: "Study on defects in EMCZ-Si crystal by infrared scattering tomography"J. Cryst. Growth. 208. 282-288 (2000)
M. Ma、N. Nango、T. Okawa、M. Watanabe 和 M. Eguchi:“通过红外散射断层扫描研究 EMC​​Z-Si 晶体中的缺陷”J。
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小川智哉: "結晶工学の基礎"裳華房. 326 (1998)
小川智也:“晶体工程基础”Shokabo 326 (1998)。
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16
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    • 批准号:
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    • 项目类别:
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    • 资助金额:
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    • 财政年份:
      1999
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    • 财政年份:
      1994
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    • 批准号:
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    • 项目类别:
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    • 资助金额:
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