Characterization of and detection of defects in semiconductor crystals by infrared light scattering tomography

通过红外光散射断层扫描表征和检测半导体晶体中的缺陷

基本信息

  • 批准号:
    04402018
  • 负责人:
  • 金额:
    $ 11.14万
  • 依托单位:
  • 依托单位国家:
    日本
  • 项目类别:
    Grant-in-Aid for General Scientific Research (A)
  • 财政年份:
    1992
  • 资助国家:
    日本
  • 起止时间:
    1992 至 1994
  • 项目状态:
    已结题

项目摘要

Defects in crystals, such as dislocations, stacking faults, segregated impurities and interstitial atoms, will induce scattered light with disordered phases according to their disordered positions, because all atoms radiate from their dipoles generated by illumination of a laser beam.Since electrical characteristics of GaAs crystals is strongly dependent upon EL2 centers, their density and distribution must be controlled and adjusted for opto-electric and high electron mobility devices, where infrared light scattering tomography (IR-LST) is very useful for these processing because the centers are clearly observed by IR-LST.Dispersions of the absorption and scattering due to EL2 centers are caused by resonance of electrons trapped in the EL2 centers.Since ZnSe crystal is one of the most promising candidates for blue lasers, detection of defects in and characterization of the crystals are successfully done by LST and Raman scattering tomography (RST). Here, a new habit of dislocations wa … More s observed by LST : many dislocations were piled up within thin layrs on (111) planes of the crystals, which are called "DISLOCATION WALLS".Density and distribution of intrinsic gettering (IG) centers and quality of denuded zones in Cz-Si wafers are very important for planar devices on wafer surfaces because a sigle crystalline layr is epitaaxially grown on the denuded zone, which is, therefore, the most important key factors.The defects located just under a mirror polished surface are very harmful for the epitaxial growth, even if they were very tiny and few. Here we have developed an inside total reflection (ITR) method to clearly and accurately detect the defects and interstitial oxygen atoms there, because only the light scattered by the defects and interstitial atoms can pass through the mirror surface since this light impinges ontothe surface with angles smaller than the total reflection angle while the total reflection prevents the main part of the laser beam from passing through. Less
晶体中的缺陷,如位错、层错、偏析杂质和间隙原子等,由于所有的原子都是从激光照射产生的偶极子上辐射出来的,所以在光电和高电子迁移率器件中,必须控制和调节它们的密度和分布,这些缺陷会根据它们的无序位置诱导出具有无序相的散射光。其中红外光散射层析(IR-LST)是非常有用的,因为红外光散射层析(IR-LST)可以清楚地观察到中心。由于EL2中心的吸收和散射的色散是由捕获在EL2中心的电子的共振引起的。由于ZnSe晶体是最有希望的蓝光激光器候选晶体之一,LST和拉曼散射层析成像(RST)成功地完成了对晶体中缺陷的检测和表征。在这里,位错的一个新习惯是Wa…用LST观察到更多的S:许多位错堆积在晶体的(111)面上的薄层内,被称为“位错壁”。硅片中本征吸杂(IG)中心的密度和分布以及剥离区的质量对硅片表面的平面器件非常重要,因为在剥离区外延生长的是单晶层,因此这是最重要的关键因素。位于镜面抛光表面下的缺陷对外延生长非常有害,即使它们非常微小和很少。在这里,我们发展了一种内部全反射(ITR)方法来清楚和准确地检测那里的缺陷和间隙氧原子,因为只有缺陷和间隙原子散射的光才能穿过镜面,因为这种光以小于全反射角的角度入射到镜面上,而全反射阻止了激光的主要部分通过。较少

项目成果

期刊论文数量(36)
专著数量(0)
科研奖励数量(0)
会议论文数量(0)
专利数量(0)
Ogawa: "Characterization of dielectric crystals by light scattering tomography" Ferroelectronics. 142. 19-29 (1993)
小川:“通过光散射断层扫描表征介电晶体”铁电子学。
  • DOI:
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    0
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  • 通讯作者:
小川智哉: "Characterization of dielectric crystals by light scattering tomography" Ferroelectronics. 142. 19-29 (1993)
Tomoya Okawa:“通过光散射断层扫描表征介电晶体”铁电子学 142. 19-29 (1993)
  • DOI:
  • 发表时间:
  • 期刊:
  • 影响因子:
    0
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  • 通讯作者:
小川智哉: "Piled up dislocations in vapour phase grown ZnSe crystals" Philosophical Magazine. (in press). (1995)
Tomoya Okawa:“气相生长的 ZnSe 晶体中的堆积位错”哲学杂志(1995 年出版)。
  • DOI:
  • 发表时间:
  • 期刊:
  • 影响因子:
    0
  • 作者:
  • 通讯作者:
小川智哉: "Effect of human blood addition on dendritic growth of cupric chloride crystals in aqueous solutions" J.Crystal Growth. 142. 147-155 (1994)
Tomoya Okawa:“添加人体血液对水溶液中氯化铜晶体的枝晶生长的影响”J.Crystal Growth。142. 147-155 (1994)。
  • DOI:
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  • 影响因子:
    0
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OGAWA Tomoya其他文献

The Influential Factors to Lower Attitude Pupil's Learning Behavior toward Physical Education Class
低态度小学生体育课学习行为的影响因素

OGAWA Tomoya的其他文献

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{{ truncateString('OGAWA Tomoya', 18)}}的其他基金

Effects of Alkalizing Agents (THAM) on Ischemic Brain Injuries
碱化剂 (THAM) 对缺血性脑损伤的影响
  • 批准号:
    11671369
  • 财政年份:
    1999
  • 资助金额:
    $ 11.14万
  • 项目类别:
    Grant-in-Aid for Scientific Research (C)
Tomographic detection of micro-defects in semi-conductions due to light scattering and photoluminescence imaging
由于光散射和光致发光成像而导致的半导体微缺陷的断层扫描检测
  • 批准号:
    10450011
  • 财政年份:
    1998
  • 资助金额:
    $ 11.14万
  • 项目类别:
    Grant-in-Aid for Scientific Research (B)
Structure and function of oligosaccharide of glycoprotein : Approach by recombinant technology and organic synthesis.
糖蛋白寡糖的结构和功能:重组技术和有机合成方法。
  • 批准号:
    07406016
  • 财政年份:
    1995
  • 资助金额:
    $ 11.14万
  • 项目类别:
    Grant-in-Aid for Scientific Research (A)
Study on generation of glycoprotein by recombinant technology.
重组技术产生糖蛋白的研究。
  • 批准号:
    06556058
  • 财政年份:
    1994
  • 资助金额:
    $ 11.14万
  • 项目类别:
    Grant-in-Aid for Scientific Research (A)
A new fringe method for characterization of ROUGHNESS of inner layrs in semiconductor crystals and dielectric thin layrs
表征半导体晶体和电介质薄层内层粗糙度的新条纹方法
  • 批准号:
    04555006
  • 财政年份:
    1992
  • 资助金额:
    $ 11.14万
  • 项目类别:
    Grant-in-Aid for Developmental Scientific Research (B)
Placental function and development of fetal nervous system.
胎盘功能和胎儿神经系统的发育。
  • 批准号:
    04304024
  • 财政年份:
    1992
  • 资助金额:
    $ 11.14万
  • 项目类别:
    Grant-in-Aid for Co-operative Research (A)
Study on the biological roles of oligosaccharides : approach by analysis and organic synthesis of oligosaccharides.
低聚糖的生物学作用研究:低聚糖的分析和有机合成方法。
  • 批准号:
    03404012
  • 财政年份:
    1991
  • 资助金额:
    $ 11.14万
  • 项目类别:
    Grant-in-Aid for General Scientific Research (A)
Characterization of Epitaxial Layers and Ion-Implanted Surfaces on Semiconductor Wafers by Scattering of Light and Optical Surface Waves
通过光和光学表面波散射表征半导体晶圆上的外延层和离子注入表面
  • 批准号:
    63460059
  • 财政年份:
    1988
  • 资助金额:
    $ 11.14万
  • 项目类别:
    Grant-in-Aid for General Scientific Research (B)
Design and Prototype Construction of Infrared Resonance Scattering Tomography
红外共振散射断层扫描的设计与样机构建
  • 批准号:
    61850006
  • 财政年份:
    1986
  • 资助金额:
    $ 11.14万
  • 项目类别:
    Grant-in-Aid for Developmental Scientific Research
Growth History of III-V Compound Crystals by IR Light Scattering Tomograpyhy
红外光散射断层扫描 III-V 族化合物晶体的生长历史
  • 批准号:
    61460238
  • 财政年份:
    1986
  • 资助金额:
    $ 11.14万
  • 项目类别:
    Grant-in-Aid for General Scientific Research (B)

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