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Elemental Analysis for Scanning Tunneling Microscope by using X-ray Induced Tunneling Current (Development of Elemental Analysis STM)

Elemental Analysis for Scanning Tunneling Microscope by using X-ray Induced Tunneling Current (Development of Elemental Analysis STM)
利用X射线诱导隧道电流进行扫描隧道显微镜的元素分析(元素分析STM的开发)
批准号:
12305008
负责人:
SAKURAI Toshio
金额:
$27.59万
依托单位:
依托单位国家:
日本
项目类别:
Grant-in-Aid for Scientific Research (A)
财政年份:
2000
资助国家:
日本
项目状态:
已结题
起止时间:
2000 至 2001

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英文摘要
We developed ultra-high vacuum STM equipment, and installed to Synchrotron radiation facility in Tsukuba. Sample chamber was placed on X-Y-Z stage. X-Ray beam (1 x 0.04 mm) irradiated the surface at small incident angles. First, adjustment of sample position was performed. When the x-rays irradiated the sample in the correct way, the STM tip current increases. Therefore, we adjusted the sample position by monitoring this STM tip current. Then, sample cumber was evacuated by rotary pump and turbo-molecular pump. Finally, these pumps were stopped and ion pump was used.Layered samples such as Au (or Ni)- Pt-Si wafer were measured. When the vacuum evaporation of Au, small particles were used as mask, as a result, Au layer with small holes was obtained. This sample is useful to evaluate lateral resolution.When X-rays irradiate the sample, the STM tip current is observed. This current was too small even if synchrotron radiation was applied, several pA. The STM images with and without x-ray irradiation were compared each other. However, clear difference was not observed. The tunneling current was about 0.5 nA, which was considerably larger than x-ray induced STM tip current. We recognized several points that should be improved for the experiments at the Synchrotron radiation facility. We intend to continue this experiment.
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Z. Gai et al.: "Atomic Structure of Si(112)7 x 1 In Surface"Phys. Rev. B. 61. 9928-9931 (2000)
Z. Gai 等人:“表面 Si(112)7 x 1 的原子结构”Phys。
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14
    Research on the Development from the Castle Lordship to the Local Administrative Organisation of Territory in the German Middle Ages
    • 批准号:
      23530007
    • 项目类别:
      Grant-in-Aid for Scientific Research (C)
    • 资助金额:
      $2.0万
    • 财政年份:
      2011
    • 负责人:
      SAKURAI Toshio
    • 依托单位:
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    • 批准号:
      19530003
    • 项目类别:
      Grant-in-Aid for Scientific Research (C)
    • 资助金额:
      $2.08万
    • 财政年份:
      2007
    • 负责人:
      SAKURAI Toshio
    • 依托单位:
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    Property control of semiconductor nanostructure using surface strain as a new parameter
    • 批准号:
      18201015
    • 项目类别:
      Grant-in-Aid for Scientific Research (A)
    • 资助金额:
      $34.28万
    • 财政年份:
      2006
    • 负责人:
      SAKURAI Toshio
    • 依托单位:
    海外基金