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Fabrication of high performance nano-crystalline germanium films using ultra-clean ECR plasma CVD

Fabrication of high performance nano-crystalline germanium films using ultra-clean ECR plasma CVD
使用超净 ECR 等离子体 CVD 制备高性能纳米晶锗薄膜
批准号:
12650325
负责人:
AOKI Takeshi
金额:
$1.98万
依托单位国家:
日本
项目类别:
Grant-in-Aid for Scientific Research (C)
财政年份:
2000
资助国家:
日本
项目状态:
已结题
起止时间:
2000 至 2002

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中文摘要
翻译
采用电子回旋共振等离子体化学气相沉积技术在(c-)Si、c-Ge和玻璃衬底上制备了氢化微晶Ge(μc-Ge:H)薄膜。随着衬底温度(Ts)的升高,在ts[约等于]50℃处开始了非晶态到微晶态的相变。在200℃以上,c-Si和Ge衬底上的晶化体积分数(_<xc>)超过80%,观察到μc-Ge:H沿衬底晶轴择优生长。对于玻璃衬底,_<xc>在[约等于]155℃处有一个极大值,在此之后随着T_S的增加而减小。氢从生长表面上的脱附可能是抑制微晶形核的原因。随着T_S的增加,a-Ge:H薄膜的发光峰能量和发光幅值降低,但即使在T_S=313℃时,发光谱线也比c-Ge的发光峰宽,表明发光来自晶界的非晶态部分。在a-Ge:H中观察到了双峰寿命分布。用新设计的半解析反褶积测量ns寿命的双相双锁相正交频率分辨光谱表明,硫属化合物以及a-Si:H和a-Ge:H等四面体半导体中的光致发光寿命分布基本上是双峰分布,短寿命组分(ns-μS)和长寿命组分(Ms)分别属于单态和三态激子。我们提出,控制电子-空穴对的自旋态是延长复合寿命和提高器件质量的关键,例如太阳能电池的效率。
英文摘要
Hydrogenated microcrystalline germanium (μc-Ge : H) films were deposited on crystalline (c-) Si, c-Ge and glass substrates by electron-cyclotron-resonance plasma chemical vapor deposition (ECRPCVD). With increasing substrate temperature (Ts), an amorphous to microcrystalline phase transition started at Ts 【approximately equal】 50 ℃. Above 200 ℃, the crystalline volume fraction (_<Xc>) on the c-Si and Ge substrates exceeded 【approximately equal】 80% and preferential growth of μc-Ge : H along crystallographic axes of the substrates was observed. For the glass substrates, _<Xc> was a maximum at 【approximately equal】 155 ℃, above which it decreased with increasing T_s. Hydrogen desorption from the growth surface is probably responsible for suppressing microciystalline nucleation. The PL peak energy and magnitude decreased with increasing T_s, but PL spectrum even at T_s = 313 ℃ being broad compared with that of c-Ge suggest the PL arises from the amorphous part of the grain boundary.High-quality hydrogenated amorphous germanium (a-Ge : H) films were deposited under the critical condition of the film growth of amorphous-crystalline phase transition. Double-peak lifetime distribution were observed in a-Ge : H. A dual-phase double lock-in (DPDL) quadrature frequency resolved spectroscopy (QFRS) developed to measure ns lifetime with a newly devised semi-analytical deconvolution revealed that the PL lifetime distribution is basically double-peaked in chalcogenide as well as tetrahedral semiconductors such as a-Si : H and a-Ge : H. The short lived (ns-μs) and the long lived (ms) components are attributed singlet and triplet excitons, respectively. We proposed that controlling spin states of electron-hole pairs is a key to prolong the recombination lifetime and improve the device-quality e.g. efficiency of solar cells.
期刊论文(25)
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会议论文
Takeshi Aoki: "Photoluminescence in Amorphous Semiconductors(Excitonic Effects)"ISCMP 2000 Proceedings (World Scientific). (in press). 58-65 (2001)
Takeshi Aoki:“非晶半导体中的光致发光(激子效应)”ISCMP 2000 论文集(世界科学)。
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T.Aoki: "Photoluminescence in Amorphous Semiconductors (Excitonic Effects)"Proceedings of 11th International School on Condensed Matter Physics (Bookcraft, Bath). 58-65 (2001)
T.Aoki:“非晶半导体中的光致发光(激子效应)”第 11 届凝聚态物理国际学院论文集(Bookcraft,巴斯)。
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T. Aoki: "Photoluminescence in Amorphous Semiconductors (Excitonic Effects)"Proceedings of 11th International School on Condensed Matter Physics(Bookcraft, Bath, 2001). 58-65
T. Aoki:“非晶半导体中的光致发光(激子效应)”第 11 届国际凝聚态物理学院论文集(Bookcraft,巴斯,2001 年)。
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J. Singh, T. Aoki and K. Shimakawa: "Excitonic Contribution to Photoluminescence of Amorphous Semiconductors"Philosophical Magazine B. Vol. 82. 855-871 (2001)
J. Singh、T. Aoki 和 K. Shimakawa:“激子对非晶半导体光致发光的贡献”哲学杂志 B. Vol。
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