Fabrication of high performance nano-crystalline germanium films using ultra-clean ECR plasma CVD
使用超净 ECR 等离子体 CVD 制备高性能纳米晶锗薄膜
基本信息
- 批准号:12650325
- 负责人:
- 金额:$ 1.98万
- 依托单位:
- 依托单位国家:日本
- 项目类别:Grant-in-Aid for Scientific Research (C)
- 财政年份:2000
- 资助国家:日本
- 起止时间:2000 至 2002
- 项目状态:已结题
- 来源:
- 关键词:
项目摘要
Hydrogenated microcrystalline germanium (μc-Ge : H) films were deposited on crystalline (c-) Si, c-Ge and glass substrates by electron-cyclotron-resonance plasma chemical vapor deposition (ECRPCVD). With increasing substrate temperature (Ts), an amorphous to microcrystalline phase transition started at Ts 【approximately equal】 50 ℃. Above 200 ℃, the crystalline volume fraction (_<Xc>) on the c-Si and Ge substrates exceeded 【approximately equal】 80% and preferential growth of μc-Ge : H along crystallographic axes of the substrates was observed. For the glass substrates, _<Xc> was a maximum at 【approximately equal】 155 ℃, above which it decreased with increasing T_s. Hydrogen desorption from the growth surface is probably responsible for suppressing microciystalline nucleation. The PL peak energy and magnitude decreased with increasing T_s, but PL spectrum even at T_s = 313 ℃ being broad compared with that of c-Ge suggest the PL arises from the amorphous part of the grain boundary.High-quality hydrogenated amorphous germanium (a-Ge : H) films were deposited under the critical condition of the film growth of amorphous-crystalline phase transition. Double-peak lifetime distribution were observed in a-Ge : H. A dual-phase double lock-in (DPDL) quadrature frequency resolved spectroscopy (QFRS) developed to measure ns lifetime with a newly devised semi-analytical deconvolution revealed that the PL lifetime distribution is basically double-peaked in chalcogenide as well as tetrahedral semiconductors such as a-Si : H and a-Ge : H. The short lived (ns-μs) and the long lived (ms) components are attributed singlet and triplet excitons, respectively. We proposed that controlling spin states of electron-hole pairs is a key to prolong the recombination lifetime and improve the device-quality e.g. efficiency of solar cells.
通过电子循环蛋白晶体晶体胶片(c-)Si,C-GE和玻璃底物,通过电子环体 - 循环量子体等离子体化学蒸气沉积(ECRPCVD),将氢化的微晶(μCGE:H)膜沉积在晶体(C-)Si,C-GE和玻璃底物上。随着底物温度(TS)的升高,在TS [大约等于] 50°的无定形至微晶相变。观察到了C-SI和GE底物上的结晶体积分数(_ <xc>)超过[大约等于] 80%,并且沿底物的晶体学轴的首选生长:H沿底物的晶体学轴。对于玻璃基板,_ <xc>在[大约等于] 155°的最大值中是最大值,而在t_s上增加了它的降低。从生长表面解吸的氢可能是导致抑制微囊稳定核化的原因。与C-GE相比,PL峰值能量和大小随T_S的增加而降低,但即使在T_S = 313℃时,PL频谱也很广泛,这表明PL源于晶界的无定形部分。在膜的关键条件下,高质量的氢化无形晶属(A-GE:H)膜沉积在膜成长的关键状态下,是在反斑层中的膜成长的膜生长。 Double-peak lifetime distribution were observed in a-Ge : H. A dual-phase double lock-in (DPDL) quadrature frequency resolved spectroscopy (QFRS) developed to measure ns lifetime with a newly devised semi-analytical deconvolution revealed that the PL lifetime distribution is basically double-peaked in chalcogenide as well as tetrahedral semiconductors such as a-Si : H and a-Ge : H.短期寿命(NS-μs)和长期寿命(MS)组件分别归因于Singlet和Triplet激子。我们提出,控制电子孔对的自旋状态是延长重组寿命并改善设备质量的关键。太阳能电池的效率。
项目成果
期刊论文数量(25)
专著数量(0)
科研奖励数量(0)
会议论文数量(0)
专利数量(0)
Takeshi Aoki: "Photoluminescence in Amorphous Semiconductors(Excitonic Effects)"ISCMP 2000 Proceedings (World Scientific). (in press). 58-65 (2001)
Takeshi Aoki:“非晶半导体中的光致发光(激子效应)”ISCMP 2000 论文集(世界科学)。
- DOI:
- 发表时间:
- 期刊:
- 影响因子:0
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- 通讯作者:
T.Aoki: "Photoluminescence in Amorphous Semiconductors (Excitonic Effects)"Proceedings of 11th International School on Condensed Matter Physics (Bookcraft, Bath). 58-65 (2001)
T.Aoki:“非晶半导体中的光致发光(激子效应)”第 11 届凝聚态物理国际学院论文集(Bookcraft,巴斯)。
- DOI:
- 发表时间:
- 期刊:
- 影响因子:0
- 作者:
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J. Singh, T. Aoki and K. Shimakawa: "Excitonic Contribution to Photoluminescence of Amorphous Semiconductors"Philosophical Magazine B. Vol. 82. 855-871 (2001)
J. Singh、T. Aoki 和 K. Shimakawa:“激子对非晶半导体光致发光的贡献”哲学杂志 B. Vol。
- DOI:
- 发表时间:
- 期刊:
- 影响因子:0
- 作者:
- 通讯作者:
T. Aoki: "Photoluminescence in Amorphous Semiconductors (Excitonic Effects)"Proceedings of 11th International School on Condensed Matter Physics(Bookcraft, Bath, 2001). 58-65
T. Aoki:“非晶半导体中的光致发光(激子效应)”第 11 届国际凝聚态物理学院论文集(Bookcraft,巴斯,2001 年)。
- DOI:
- 发表时间:
- 期刊:
- 影响因子:0
- 作者:
- 通讯作者:
T. Aoki, S. Komedoori, S. Kobayashi, C. Fujihashi, A, Ganjoo and K. Shimakawa: "Photoluminescence lifetime distribution of a-Si : H and a-Ge : H expanded to nanosecond region using wide-band frequency resolved spectroscopy"J. Non-Crystalline Solids. Vol.
T. Aoki、S. Komedoori、S. Kobayashi、C. Fujihashi、A、Ganjoo 和 K. Shimakawa:“使用宽带频率解析将 a-Si : H 和 a-Ge : H 的光致发光寿命分布扩展到纳秒区域
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- 影响因子:0
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AOKI Takeshi其他文献
AOKI Takeshi的其他文献
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{{ truncateString('AOKI Takeshi', 18)}}的其他基金
Manuscript Study of Ancient Iranian Documents Written in the 16th and 17th Centuries
16 世纪和 17 世纪伊朗古代文献手稿研究
- 批准号:
15K02054 - 财政年份:2015
- 资助金额:
$ 1.98万 - 项目类别:
Grant-in-Aid for Scientific Research (C)
Study on walking robot with spherical outer shell for spherical sensor to search on disaster site
球形外壳行走机器人用于球形传感器灾区搜索的研究
- 批准号:
26420206 - 财政年份:2014
- 资助金额:
$ 1.98万 - 项目类别:
Grant-in-Aid for Scientific Research (C)
Study of the high strength retractable skin and the closed type crawler vehicle
高强度伸缩蒙皮及封闭式履带车的研究
- 批准号:
24760211 - 财政年份:2012
- 资助金额:
$ 1.98万 - 项目类别:
Grant-in-Aid for Young Scientists (B)
Clinical application for hepatocyte transplantation from non-heart beating donor
无心跳供体肝细胞移植的临床应用
- 批准号:
21500454 - 财政年份:2009
- 资助金额:
$ 1.98万 - 项目类别:
Grant-in-Aid for Scientific Research (C)
Development of the soft transformation robot with multi degree of freedom.
多自由度软体变形机器人的研制
- 批准号:
20760161 - 财政年份:2008
- 资助金额:
$ 1.98万 - 项目类别:
Grant-in-Aid for Young Scientists (B)
Proliferation and differentiation of hepatic stem cell from bone marrow cells and possibility of bone marrow transplantation in genetic hepatic disease
骨髓细胞肝干细胞的增殖分化及遗传性肝病骨髓移植的可能性
- 批准号:
15591362 - 财政年份:2003
- 资助金额:
$ 1.98万 - 项目类别:
Grant-in-Aid for Scientific Research (C)
Film growth of high quality microcrystalline germanium by ECR plasma CVD
ECR等离子体CVD法生长高质量微晶锗薄膜
- 批准号:
05650314 - 财政年份:1993
- 资助金额:
$ 1.98万 - 项目类别:
Grant-in-Aid for General Scientific Research (C)
Deposition of Narrow Bandgap Amorphous Semiconductor for High Efficiendy Solar Cells
用于高效太阳能电池的窄带隙非晶半导体的沉积
- 批准号:
03650263 - 财政年份:1991
- 资助金额:
$ 1.98万 - 项目类别:
Grant-in-Aid for General Scientific Research (C)
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