Micro and nano-machining of polymer and glass materials using proton beamwriting

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Microelectronic and photonics industries need a manufacturing system with flexibility, high precision and a fast prototyping capability. In order to fulfill these requirements, proton beam writing (PBW) will be pursued in the research project. The purpose of this research is to explore the PBW-based flexible micromachining system to demonstrate a fast prototyping capability and its application to t he fabrication of optical, electronic and bio and chemical sensor devices, etc. The technological challenges in this research are three folds. The first challenge is the search for an optimal operation condition of ion source and a focusing system for PBW. Second is the study of materials and processing using PBW. The third challenge is to demonstrate device applications.We have established the PBW-based lithography techniques on organic and inorganic films for resists by demonstrating the high-as pect-ratio structures as high as 〜20. By the development of the hardware and software involved in the PBW system, 100-nm class be am focusing was achieved. Also, trials to achieve increased beam current, wide area beam scan as large as 10 mm squared area using stages were made. Device applications of high-aspect-ratio microstructures by the PBW to dielectrophoretic devices were demonstrat ed. We have confirmed the functionality of the high-aspect-ratio pillar arrays as electric-micro filters in capturing microbes with a size of several micrometers such as E call and yeast. For applications in the area of micro-photonics, organic and inorganic siloxane films were successfully micro-patterned by PBW.