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Micro and nano-machining of polymer and glass materials using proton beamwriting

使用质子束写入对聚合物和玻璃材料进行微米和纳米加工

基本信息

批准号：
17310085
负责人：
NISHIKAWA Hiroyuki
金额：
$ 10.03万
依托单位：
Shibaura Institute of Technology
依托单位国家：
日本
项目类别：
Grant-in-Aid for Scientific Research (B)
财政年份：
2005
资助国家：
日本
起止时间：
2005 至 2007
项目状态：
已结题

项目摘要

Microelectronic and photonics industries need a manufacturing system with flexibility, high precision and a fast prototyping capability. In order to fulfill these requirements, proton beam writing (PBW) will be pursued in the research project. The purpose of this research is to explore the PBW-based flexible micromachining system to demonstrate a fast prototyping capability and its application to t he fabrication of optical, electronic and bio and chemical sensor devices, etc. The technological challenges in this research are three folds. The first challenge is the search for an optimal operation condition of ion source and a focusing system for PBW. Second is the study of materials and processing using PBW. The third challenge is to demonstrate device applications.We have established the PBW-based lithography techniques on organic and inorganic films for resists by demonstrating the high-as pect-ratio structures as high as 〜20. By the development of the hardware and software involved in the PBW system, 100-nm class be am focusing was achieved. Also, trials to achieve increased beam current, wide area beam scan as large as 10 mm squared area using stages were made. Device applications of high-aspect-ratio microstructures by the PBW to dielectrophoretic devices were demonstrat ed. We have confirmed the functionality of the high-aspect-ratio pillar arrays as electric-micro filters in capturing microbes with a size of several micrometers such as E call and yeast. For applications in the area of micro-photonics, organic and inorganic siloxane films were successfully micro-patterned by PBW.

微电子和光子行业需要一个具有灵活性、高精度和快速原型设计能力的制造系统。为了满足这些要求，该研究项目将采用质子束写入（PBW）。本研究的目的是探索基于PBW的柔性微加工系统，以展示快速原型制作能力及其在光学、电子、生物和化学传感器设备等制造中的应用。这项研究的技术挑战有三个方面。第一个挑战是寻找 PBW 离子源和聚焦系统的最佳运行条件。其次是使用PBW进行材料和加工的研究。第三个挑战是演示器件应用。通过演示高达〜20的高纵横比结构，我们已经在有机和无机薄膜上建立了基于PBW的光刻技术，用于抗蚀剂。通过PBW系统所涉及的硬件和软件的开发，实现了100纳米级的束调幅聚焦。此外，还进行了使用平台实现增加束流、大至 10mm 见方区域的广域束扫描的尝试。演示了 PBW 的高纵横比微结构在介电泳器件中的应用。我们已经证实了高纵横比柱阵列作为电微过滤器的功能，可以捕获埃氏杆菌和酵母菌等几微米大小的微生物。对于微光子学领域的应用，有机和无机硅氧烷薄膜已成功通过 PBW 进行微图案化。

项目成果

期刊论文数量（0）

专著数量（0）

科研奖励数量（0）

会议论文数量（0）

专利数量（0）

Irradiation Effects on Silica Glass by Ion Microbeam for Fabrication of Optical Elements

光学元件制造中离子微束对石英玻璃的辐照效应

DOI：
发表时间：
2005
期刊：
Proceedings of 2005 International Symposium on Electrical Insulating Materials, Paper No.B3-7
影响因子：
0
作者：
Masato Murai;Kazunari Fukagawa;Hiroyuki Nishikawa;Tomoharu Nakamura;Yoshimichi Ohki;Masakazu Oikawa;Takahiro Sato;Kazuo Arakawa
通讯作者：
Kazuo Arakawa

Fabrication of High-Aspect-Ratio Pillars by Proton Beam Writing and Application to DEP-Devices

通过质子束写入制造高纵横比支柱及其在 DEP 器件中的应用