Characterisation, development and application of novel Ion Beam technology (IBT) to enhance the optical thin film manufacturing process

光学薄膜涂层的制造是在真空室内进行的困难且通常效率低的过程。 在这些复杂的热力学环境中，有许多变量不容易控制或理解。 该项目旨在推进三个关键领域的核心知识，即提高对离子束物理学的理解，薄膜物理气相沉积中使用的热力学环境的新知识以及离子束技术应用于光学薄膜生长和特性的新知识。 该项目意义重大，开发了核心知识和理解，有可能导致工艺效率的提高，改善光学薄膜特性，并进入新的研究领域（射频/光电器件）。 该项目将推进离子束技术和离子束辅助物理气相沉积领域的当前技术水平。

Manufacture of optical thin film coatings is a difficult and generally inefficient process undertaken within a vacuum chamber. There are many variables which are not easily controlled nor understood in these complex thermodynamic environments. This project aims to advance core knowledge in three critical areas namely an improved understanding of ion beam physics, new knowledge of the thermodynamic environment used in physical vapour deposition of thin films and new knowedge in the application of Ion beam Technology to optical thin film growth and characteristics. This project is significant, developing core knowledge and understanding with potential to lead to process efficiency gains, improved optical film characteristics and accessing new areas of research (rf/photoic devices). This project will advance the current state of art in the field of Ion Beam Technology and Ion Beam assisted physical vapour deposition.