The investigation of heat and mass transfer phenomenon for the GaAs single crystal growth solid-fluid interface control.
The investigation of heat and mass transfer phenomenon for the GaAs single crystal growth solid-fluid interface control.
批准号:
21560198
负责人:
KIKUTA Kazushige
金额:
$3.08万
依托单位国家:
日本
项目类别:
Grant-in-Aid for Scientific Research (C)
财政年份:
2009
资助国家:
日本
项目状态:
已结题
起止时间:
2009 至 2011
中文摘要
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英文摘要
The objective of this study is to clarify heat and mass transfer phenomenon in the GaAs single crystal growth. In order to clarify complicated flow phenomenon of the melt, flow observation of the melt in the crucible which was simulated the growth device was carried out using the visualization experiment equipment. And, thermal hydraulics numerical calculation in the growth device at various crystal diameters and crystal length was conducted and the elucidation of the actual phenomenon was tried by verifying in comparison with single crystal growth experimental result. Flow characteristic of the melt was able to be clarified to some extent by this study. It was also able to be clarified a heat and flow characteristic in the equipment at the different crystal diameters and crystal length.
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会议论文
GaAs単結晶成長に及ぼす融液流動および温度分布の影響
熔体流动和温度分布对砷化镓单晶生长的影响
DOI:
--
发表时间:
2010
期刊:
影响因子:
--
作者:
[タンチアヨアン, 小杉直央, 鳥居大地, 菊川豪太, 小原拓, 堂賢人,菊田和重, 門脇主将,田部豊,近久武美, 堂賢人,菊田和重, 木村恵敬,田部豊,近久武美]
通讯作者:
木村恵敬,田部豊,近久武美
GaAs単結晶製造装置内の熱流動可視化実験と解析
GaAs单晶制造设备中的热流可视化实验与分析
DOI:
--
发表时间:
2010
期刊:
日本機械学会北海道学生会,第39回学生員卒業研究発表講演会
影响因子:
--
作者:
[タンチアヨアン, 小杉直央, 鳥居大地, 菊川豪太, 小原拓, 堂賢人,菊田和重, 門脇主将,田部豊,近久武美]
通讯作者:
門脇主将,田部豊,近久武美
化合物半導体GaAs単結晶製造装置における熱・物質移動シミュレーション
化合物半导体砷化镓单晶制造设备中的传热传质模拟
DOI:
--
发表时间:
2011
期刊:
日本機械学会北海道学生会,第40回学生員卒業研究発表講演会
影响因子:
--
作者:
[タンチアヨアン, 小杉直央, 鳥居大地, 菊川豪太, 小原拓, 堂賢人,菊田和重]
通讯作者:
堂賢人,菊田和重
A study on the dynamics for compound semiconductor crystal growth stabilization
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批准号:24560244
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项目类别:Grant-in-Aid for Scientific Research (C)
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资助金额:$3.49万
-
财政年份:2012
-
负责人:KIKUTA Kazushige
-
依托单位:
The Investigation of the Gas Flow Analysis and the Measurement of the Thermal Radiative Properties for Thin Film Deposition in the Stacked Large Silicon Wafers
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批准号:15560164
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项目类别:Grant-in-Aid for Scientific Research (C)
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资助金额:$2.24万
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财政年份:2003
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负责人:KIKUTA Kazushige
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依托单位:
海外基金