Study on the expanse of thermalized electrons in condensed matters
Study on the expanse of thermalized electrons in condensed matters
批准号:
21656238
负责人:
KOZAWA Takahiro
金额:
$2.03万
依托单位:
依托单位国家:
日本
项目类别:
Grant-in-Aid for Challenging Exploratory Research
财政年份:
2009
资助国家:
日本
项目状态:
已结题
起止时间:
2009 至 2011
中文摘要
估算了PHS薄膜中准自由态热化电子波函数的展开式。在实验结果的基础上,对电离后立即发生的热化电子与电子清除剂的反应进行了描述。我们开发了一个计算从电离到电子局域化的电子动力学的代码。
英文摘要
The expansion of the wave function of thermalized electrons in the quasi-free state in PHS films has been estimated. On the basis of experiment results, the reaction of thermalized electrons with electron scavengers immediately after ionization was formulated. We developed a code which calculates electron dynamics from ionization to electron localization.
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Evaluation of Chemical Gradient Enhancement Methods for Chemically Amplified Extreme Ultraviolet Resists
化学放大极紫外光刻胶化学梯度增强方法的评价
DOI:
10.1143/jjap.48.126004
发表时间:
2009
期刊:
Jpn. J. Appl. Phys
影响因子:
--
作者:
[T. Kozawa, H. Oizumi, T. Itani, and S. Tagawa]
通讯作者:
and S. Tagawa
Latent Image Created Using Small-Field Exposure Tool for Extreme Ultraviolet Lithography
使用用于极紫外光刻的小视场曝光工具创建潜像
DOI:
10.1143/jjap.48.106506
发表时间:
2009
期刊:
Jpn. J. Appl. Phys
影响因子:
--
作者:
[T. Kozawa, H. Oizumi, T. Itani, and S. Tagawa]
通讯作者:
and S. Tagawa
Dynamics of Radical Cation of Poly(4-hydroxystyrene) Generated in Thin Film upon Exposure to Electron Beam
电子束照射下薄膜中聚(4-羟基苯乙烯)自由基阳离子的动力学
DOI:
--
发表时间:
2010
期刊:
影响因子:
--
作者:
[K. Natsuda, T. Kozawa, K. Okamoto, A. Saeki, and S. Tagawa]
通讯作者:
and S. Tagawa
Determination of Optimum Thermalization Distance Based on Trade-off Relationship between Resolution, Line Edge Roughness and Sensitivity of Chemically Amplified Extreme Ultraviolet Resists
基于化学放大型极紫外光刻胶分辨率、线边缘粗糙度和灵敏度权衡关系确定最佳热化距离
DOI:
10.2494/photopolymer.24.137
发表时间:
2011
期刊:
Journal of Photopolymer Science and Technology
影响因子:
0.8
作者:
[T. Kozawa, S. Tagawa]
通讯作者:
S. Tagawa
Correlation between C37 Parameters and Acid Yields in Chemically Amplified Resists upon Exposure to 75 keV Electron Beam
化学放大抗蚀剂暴露于 75 keV 电子束后 C37 参数与酸产率之间的相关性
DOI:
10.1143/jjap.48.06fc05
发表时间:
2009
期刊:
Jpn. J. Appl. Phys
影响因子:
--
作者:
[K. Natsuda, T. Kozawa, K. Okamoto, A. Saeki, and S. Tagawa]
通讯作者:
and S. Tagawa
共 13 条
Study on nanoscale chemical reactions and reaction sites using quantum beams
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批准号:22246128
-
项目类别:Grant-in-Aid for Scientific Research (A)
-
资助金额:$21.96万
-
财政年份:2010
-
负责人:KOZAWA Takahiro
-
依托单位:
Study on nanoscale chemical reaction for the establishment of scientific foundation of ultrafine patterning using extreme ultraviolet radiation
-
批准号:19360428
-
项目类别:Grant-in-Aid for Scientific Research (B)
-
资助金额:$12.23万
-
财政年份:2007
-
负责人:KOZAWA Takahiro
-
依托单位:
海外基金