Mechanism of Refractive Index Increase Induced in Polymers by Ion Irradiation and Its Application to the Development of Optical Devices

离子辐照引起聚合物折射率增加的机理及其在光学器件开发中的应用

• 批准号: 22656077
• 负责人: OHKI Yoshimichi
• 金额: $ 2.14万
• 依托单位: Waseda University
• 依托单位国家: 日本
• 项目类别: Grant-in-Aid for Challenging Exploratory Research
• 财政年份: 2010
• 资助国家: 日本
• 起止时间: 2010 至 2011
• 项目状态: 已结题
• 来源: https://kaken.nii.ac.jp/grant/KAKENHI-PROJECT-22656077/
• 关键词: イオン照射; 屈折率上昇; 高分子導波路; 光制御材料; 高密度化; 絶縁材料; 非晶質

Irradiation of swift ions can be a good tool to give a new function to dielectrics. We carried out this research to clarify the applicability of these ion irradiation effects to polymer materials. We irradiated 1.0-MeV H^<+> ions to a fluorinated polyimide film and the refractive index was measured by spectroscopic ellipsometry. The increment in refractive index reaches as high as 3.3%, much higher than the value observed in SiO_2 glass. Therefore, it is natural to assume that the ion irradiation to the polymer can be a good tool to fabricate a high-performance polymer-based optical waveguide.

Swift离子的辐照可能是为电介质提供新功能的好工具。我们进行了这项研究，以阐明这些离子辐照效应对聚合物材料的适用性。我们将1.0-MEV H^<+>离子辐射为氟化二酰亚胺膜，并通过光谱椭圆法测量折射率。折射率的增量达到高达3.3％，比SIO_2玻璃中观察到的值高得多。因此，自然而然地假设对聚合物的离子辐射可以成为制造高性能聚合物光学波导的好工具。

项目成果

Various Ion-induced Phenomena Appearing in Dielectric Materials and Their Applications to Optical Devices and Biosensors

介电材料中出现的各种离子诱导现象及其在光学器件和生物传感器中的应用

• 发表时间: 2011
• 作者: Y. Ohki;Y. Arai;S. J. Yu;K. Nomura;and M. Fujimaki
• 通讯作者: and M. Fujimaki

A Study of the Critical Factor Determining the Size of Etched Latent Tracks Formed on SiO2 Glass by Swift-Cl-ion Irradiation

影响SiO2玻璃上Swift-Cl离子辐照刻蚀潜迹尺寸关键因素的研究

• 发表时间: 2012
• 期刊: Nuclear Instruments & Methods in Physics Research, Section B-Beam Interactions with Materials and Atoms
• 作者: Ken-ichi Nomura;Yoshimichi Ohki;Makoto Fujimaki;Xiaomin Wang;Koichi Awazu;and Tetsuro Komatsubara
• 通讯作者: and Tetsuro Komatsubara

A Critical Factor Determining the Sizes of Etched Latent Tracks in Silica Glass Formed by Swift Cl Ions

决定快速 Cl 离子形成的石英玻璃中蚀刻潜迹尺寸的关键因素

• 发表时间: 2010
• 作者: Ken-ichi Nomura;Yoshimichi Ohki;Makoto Fujimaki;Xiaomin Wang;Koichi Awazu;and Tetsuro Komatsubara
• 通讯作者: and Tetsuro Komatsubara

高速重イオン照射により絶縁体中に生じる構造変化の機構と微細加工への応用

高速重离子辐照导致绝缘体结构变化的机理及其在微细加工中的应用

• 发表时间: 2010
• 作者: 野村健一;大木義路;藤巻真;王暁民;粟津浩一;小松原哲郎
• 通讯作者: 小松原哲郎

導波路型光制御デバイスへのイオン注入効果

离子注入对波导型光控器件的影响

• 发表时间: 2010
• 作者: 劉昇峻;上田雄二;大木義路;藤巻真;劉昇峻
• 通讯作者: 劉昇峻