Defects in pure-silica glass: study on non-radical defects and development of optical fibers for adverse environments.
Defects in pure-silica glass: study on non-radical defects and development of optical fibers for adverse environments.
批准号:
62460121
负责人:
OHKI Yoshimichi
金额:
$4.16万
依托单位:
依托单位国家:
日本
项目类别:
Grant-in-Aid for General Scientific Research (B)
财政年份:
1987
资助国家:
日本
项目状态:
已结题
起止时间:
1987 至 1988
中文摘要
Photoluminescence measurements of the 1.9-eV(Red)emission were carried out on high-purity silica glasses subjected to-ray irradiation。The time decay of the 4.8-eV-excited-luminescence indicates that the 4.8-eV absorption and the 1.9-eV luminescence arise at two different defect sites,and that an energy transfer occurs between the two defects.Comparison with electron spin resonance observations suggests that the defect responsible for the 1.9-eV luminescence is the non-bridging oxygen hole center(NBOHC:Si-O·)。The 4.8-eV absorption band increases when the sample is heated in an oxygen atmosphere prior to-irradiation,suggesting that the defect responsible is related to some form of excess oxygen.The defect is tentatively identified as a negatively charged non-bridging oxygen(Si-O^-)which is formed when a peroxy linkage traps a-induced electron,Si-O-O-Si e^-Si-O^-O-Si.Both the NBOHC and the defect responsible for the4.8-eV absorption must be present in the glass for the 4.8-eV band excited 1.8-eV luminescence to occr..
英文摘要
Photoluminescence measurements of the 1.9-eV (red) emission were carried out on high-purity silica glasses subjected to -ray irradiation. The time decay of the 4.8-eV-excited-luminescence indicates that the 4.8-eV absorption and the 1.9-eV luminescence arise at two different defect sites, and that an energy transfer occurs between the two defects. comparison with electron spin resonance observations suggests that the defect responsible for the 1.9-eV luminescence is the non-bridging oxygen hole center (NBOHC: Si-O・). The 4.8-eV absorption band increases when the sample is heated in an oxygen atmosphere prior to -irradiation, suggesting that the defect responsible is related to some form of excess oxygen. The defect is tentatively identified as a negatively charged non-bridging oxygen ( Si-O^-) which is formed when a peroxy linkage traps a -induced electron, Si-O-O-Si + e^- Si-O^- + ・O-Si .Both the NBOHC and the defect responsible for the 4.8-eV absorption must be present in the glass for the 4.8-eV band excited 1.8-eV luminescence to occur.
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R.Tohmon;Y.Shimogaichi;H.Mizuno;Y.Ohki;K.Nagasawa;Y.Hama: Physical Review Letters.
R.Tohmon;Y.Shimogaichi;H.Mizuno;Y.Ohki;K.Nagasawa;Y.Hama:物理评论快报。
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通讯作者:
K.Nagasawa.;H.Mizuno.;Y.Yamasuka.;R.Tohomon.;Y.Ohki.;Y.Hama: "The Physics and Technology of Amorphous" Plenum Press, 1988 (SiO 2)
K.Nagasawa.;H.Mizuno.;Y.Yamasuka.;R.Tohomon.;Y.Ohki.;Y.Hama:“非晶的物理和技术”Plenum Press,1988 (SiO 2)
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R.Tohmon;Y.Yamasaka;K.Nagasawa;Y.Ohki;Y.Hama: Journal of Non-Gystalline Solids. 95&96. 671-678 (1987)
R.Tohmon;Y.Yamasaka;K.Nagasawa;Y.Ohki;Y.Hama:非晶体固体杂志。
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通讯作者:
K.Nagasawa;H.Mizuno;Y.Yokomachi;R.Tohmon;Y.Ohki;Y.Hama: "The Physics and Technology of Amorphous SiO2(edited by R.A.B.Devine)" Plenum Press, 193-198 (1988)
K.Nagasawa;H.Mizuno;Y.Yokomachi;R.Tohmon;Y.Ohki;Y.Hama:“非晶 SiO2 的物理和技术(由 R.A.B.Devine 编辑)” Plenum Press,193-198 (1988)
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共 26 条
Dielectric Properties and Insulation Diagnosis of Polymers by Ultra-wideband Dielectric and Absorption Spectroscopy
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批准号:24656218
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项目类别:Grant-in-Aid for Challenging Exploratory Research
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资助金额:$2.58万
-
财政年份:2012
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负责人:OHKI Yoshimichi
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依托单位:
Development of High Performance Insulating Materials Using Polymer Nanocomposites with Inorganic Fillers
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批准号:23360142
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项目类别:Grant-in-Aid for Scientific Research (B)
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资助金额:$12.56万
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财政年份:2011
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负责人:OHKI Yoshimichi
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依托单位:
Mechanism of Refractive Index Increase Induced in Polymers by Ion Irradiation and Its Application to the Development of Optical Devices
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批准号:22656077
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项目类别:Grant-in-Aid for Challenging Exploratory Research
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资助金额:$2.14万
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财政年份:2010
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负责人:OHKI Yoshimichi
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依托单位:
Dominant factors influencing dielectric properties in several biodegradable polymers
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批准号:20360146
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项目类别:Grant-in-Aid for Scientific Research (B)
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资助金额:$11.73万
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财政年份:2008
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负责人:OHKI Yoshimichi
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依托单位:
Structures and Generation Mechanisms of Defects in High-k Dielectric Films for Silicon ULSIs
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批准号:16360160
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项目类别:Grant-in-Aid for Scientific Research (B)
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资助金额:$9.54万
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财政年份:2004
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负责人:OHKI Yoshimichi
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依托单位:
Mechanism of refractive index increase in silica glass for the development of fiber-optic photodevices
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批准号:12450132
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项目类别:Grant-in-Aid for Scientific Research (B)
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资助金额:$6.91万
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财政年份:2000
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负责人:OHKI Yoshimichi
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依托单位:
Point Defects in Ge-doped SiO_2 Glass-Their Structures and Roles in Nonlinear Optical Effects
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批准号:06452222
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项目类别:Grant-in-Aid for General Scientific Research (B)
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资助金额:$4.74万
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财政年份:1994
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负责人:OHKI Yoshimichi
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依托单位:
Excitation states and defect formation in high purity silica glass under gamma-ray or excimer-laser irradiation
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批准号:03452156
-
项目类别:Grant-in-Aid for General Scientific Research (B)
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资助金额:$4.22万
-
财政年份:1991
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负责人:OHKI Yoshimichi
-
依托单位:
Study on the Cause of Light Scattering, Especially Due to Refractive Index Fluctuation in High-purity Silica Glass.
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批准号:01460143
-
项目类别:Grant-in-Aid for General Scientific Research (B)
-
资助金额:$3.9万
-
财政年份:1989
-
负责人:OHKI Yoshimichi
-
依托单位:
Mechanism of Radiation Induced Loss in Optical Fibers and Development of Radiation-Resistant Fibers
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批准号:60460123
-
项目类别:Grant-in-Aid for General Scientific Research (B)
-
资助金额:$3.07万
-
财政年份:1985
-
负责人:OHKI Yoshimichi
-
依托单位:
海外基金