Study on the Cause of Light Scattering, Especially Due to Refractive Index Fluctuation in High-purity Silica Glass.

研究了不同方法制备的高纯石英玻璃中缺陷和杂质的分布。研究的缺陷包括在所制造的玻璃中发现的那些（氧空位和过氧键），以及由电离辐射或紫外光引起的那些（E'中心和氧空穴中心）。不同方法生产的硅砂在分布上存在显著差异。在制造过程中，测定了所制造的石英玻璃中缺陷（氧空位和过氧键）和杂质（羟基和氯）的分布。此外。由电离辐射或紫外光引起的缺陷具有一个分布，表明这些缺陷主要是由预先存在的前体的断裂引起的。

The distribution of defects and impurities in a variety of high-purity silica glass manufactured by different methods are studied. The defects investigated include those found in the as-manufactured glass (oxygen vacancy and peroxy linkage), as well as those induced by ionizing radiation or ultraviolet light (E' center and oxygen hole centers). A significant difference is observed in the distribution between sillca manufactured by different methods. The distribution of defects (oxygen vacancy and peroxy linkage) and impurities (hydroxyl groups and chlorines) in as-manufactured silica glass is determined during the manufacturing process. Furthermore. the defects induced by ionizing radiation or ultraviolet light have a distribution, suggesting that these defects arise primarily from the breaking of pre-existing precursors.