Study on the Cause of Light Scattering, Especially Due to Refractive Index Fluctuation in High-purity Silica Glass.

高纯石英玻璃中光散射尤其是折射率波动的原因研究。

• 批准号: 01460143
• 负责人: OHKI Yoshimichi
• 金额: $ 3.9万
• 依托单位: Waseda University
• 依托单位国家: 日本
• 项目类别: Grant-in-Aid for General Scientific Research (B)
• 财政年份: 1989
• 资助国家: 日本
• 起止时间: 1989 至 1990
• 项目状态: 已结题
• 来源: https://kaken.nii.ac.jp/en/grant/KAKENHI-PROJECT-01460143/
• 关键词: Distribution; Defects; Impurities; Ionizing radiation; Ultraviolet light; Manufacturing process; 石英ガラス; 光ファイバ-; レ-リ-散乱; 構造欠陥

The distribution of defects and impurities in a variety of high-purity silica glass manufactured by different methods are studied. The defects investigated include those found in the as-manufactured glass (oxygen vacancy and peroxy linkage), as well as those induced by ionizing radiation or ultraviolet light (E' center and oxygen hole centers). A significant difference is observed in the distribution between sillca manufactured by different methods. The distribution of defects (oxygen vacancy and peroxy linkage) and impurities (hydroxyl groups and chlorines) in as-manufactured silica glass is determined during the manufacturing process. Furthermore. the defects induced by ionizing radiation or ultraviolet light have a distribution, suggesting that these defects arise primarily from the breaking of pre-existing precursors.

研究了通过不同方法制造的多种高纯度二氧化硅玻璃中缺陷和杂质的分布。研究的缺陷包括在玻璃玻璃（氧空位和过氧连接）中发现的缺陷，以及由电离辐射或紫外线（E'Center和氧孔中心）引起的玻璃中的缺陷。通过不同方法制造的圆锥体之间的分布观察到了显着差异。在制造过程中确定了缺陷（氧空位和过氧连接）和杂质（羟基和氯）的分布。此外。电离辐射或紫外线引起的缺陷具有分布，这表明这些缺陷主要源于预先存在的前体的破裂。

项目成果

Hiroyuki Nishikawa: "Generation mechanism of photoinduced paramagnetic centers from preーexisting precursors in highーpurity silicas" Physical Review B. (1990)

Hiroyuki Nishikawa：“高纯度二氧化硅中预先存在的前体产生光诱导顺磁中心的生成机制”Physical Review B. (1990)

R. Thomon, Y. Shimogaichi, Y. Tsuta, S. Munekuni, Y. Ohki, Y. Hama, and K. Nagasawa: "Triplet-state defect in high-purity silica glass" Physical Review B. 41(10). 7258-7260 (1990)

R. Thomon、Y. Shimogaichi、Y. Tsuta、S. Munekuni、Y. Ohki、Y. Hama 和 K. Nagasawa：“高纯石英玻璃中的三重态缺陷”物理评论 B. 41(10)。

R. Tohmon, A. Ikeda, Y. Shimogaichi, S. Munekuni, K. Nagasawa, and Y. Hama: "Spatial distribution of defects in high-purity sillca glasses" Journal of Applied Physics,. 67(3). 1302-1306 (1990)

R. Tohmon、A. Ikeda、Y. Shimogaichi、S. Munekuni、K. Nagasawa 和 Y. Hama：“高纯硅玻璃中缺陷的空间分布”应用物理杂志，。

Shuji Munekuni: "Various typs of nonーbridging oxygen hole center in highーpurity silica glass" Journal of Applied Physics.

Shuji Munekuni：“高纯石英玻璃中非桥接氧空穴中心的各种类型”应用物理学杂志。

H. Nishikawa, R. Nakamura, R. Tohmon, Y. Ohki, Y. Sakurai, K. Nagasawa, and Y. Hama: "Generation mechanism of photo-induced paramagnetic centers from pre-existing precursors in high-purity silicas" Physical Review B. 41(11). 7828-7834 (1990)

H. Nishikawa、R. Nakamura、R. Tohmon、Y. Ohki、Y. Sakurai、K. Nagasawa 和 Y. Hama：“从高纯二氧化硅中预先存在的前体中产生光诱导顺磁中心的机制”