Excitation states and defect formation in high purity silica glass under gamma-ray or excimer-laser irradiation
Excitation states and defect formation in high purity silica glass under gamma-ray or excimer-laser irradiation
批准号:
03452156
负责人:
OHKI Yoshimichi
金额:
$4.22万
依托单位:
依托单位国家:
日本
项目类别:
Grant-in-Aid for General Scientific Research (B)
财政年份:
1991
资助国家:
日本
项目状态:
已结题
起止时间:
1991 至 1992
中文摘要
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英文摘要
The purpose of this study is to clarify the structural and optical properties of point defects in a-SiO_2, and their formation mechanisms under ionizing radiations or laser photons. The emphasis is placed on (i) the characterization of preexisting diamagnetic defects and radiation-induced paramagnetic defects, and (ii) the establishment of the link between the diamagnetic defects and radiation-induced paramagnetic defects. The outline of the present study is as follows.1.Defects and optical absorption bands associated with excess oxygen are identified. Two forms of excess oxygen are identified: peroxy linkage and interstitial oxygen. An optical absorption band at 3.8 eV is associated with peroxy linkages.2.Characterization of new paramagnetic defects induced by 7.9-eV photons is performed. With the help of computer simulation analyses of the ESR spectra, the paramagnetic defects are identified to be ClO_x radicals (x=2,3).3.Time-resolved photoluminescence (PL) measurements are carried out on a series of silicas under 7.9-eV pulsed laser excitation. Correlations of several PL bands with point defects are studied.4.Paramagnetic defects induced by 6.4-eV excimer laser are studied on a series of silicas. Effects of the oxygen stoichiometry and hydroxyl content on the defect species and their concentrations are observed. It is shown that precursor transformation dominates in laser-induced defect formation.5.Photon-energy dependence of the creation of paramagnetic defects is investigated by means of ESR and uv-vuv optical absorption measurements, using 6.4-eV and 7.9-eV photons, and gamma rays as irradiation sources. Correlations between the preexisting diamagnetic defects and laser-induced paramagnetic defects are investigated.6.The effect of hydrogen on the photogeneration of E' centers is studied by means of ESR and uv-vuv absorption measurements. It is found that the creation of E' centers from neutral oxygen vacancies is enhanced in the presence of hydrogen.
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西川 宏之,横川 知行,大木 義路: "シンクロトロン放射光によるSiO_2のキャラクタリゼーション" 電気学会誘電・絶縁材料研究会DEI-92-117. 93-101 (1992)
Hiroyuki Nishikawa、Tomoyuki Yokokawa、Yoshiji Oki:“同步辐射对 SiO_2 的表征”IEEJ 介电和绝缘材料研究组 DEI-92-101 (1992)。
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作者:
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通讯作者:
Y. Ohki et al.: "Correlation of Preexisting Diamagnetic Defect Centers with Induced Paramagnetic Defect Centers by Ultraviolet or Vacuum-ultraviolet photons in High-purity Silica" Phys. Rev. B1.
Y. Ohki 等人:“高纯二氧化硅中紫外线或真空紫外线光子对预先存在的抗磁缺陷中心与诱导顺磁缺陷中心的相关性”。
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R.Nakamura,Y.Ohki,K.Nagasawa Y.Hama: "Characterization of C10x radicals in vacuum-ultraviolet-irradiated high-purity silica glass" Physical Review B. 46. 8073-8079 (1992)
R.Nakamura,Y.Ohki,K.Nagasawa Y.Hama:“真空紫外线照射高纯石英玻璃中 C10x 自由基的表征”物理评论 B. 46. 8073-8079 (1992)
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通讯作者:
R. Nakamura Y. Ohki K. Nagasawa Y. Hama: "Characterization of C10_x radicals in vacuum-ultraviolet-irradiated high-purity silica glass" Phys. Rev. B. Vol.46. 8073-8079
R. Nakamura Y. Ohki K. Nagasawa Y. Hama:“真空紫外线照射高纯石英玻璃中 C10_x 自由基的表征” Phys。
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Y.Ohki,K.Nagasawa,Y.Hama: "Effect of Nonstoichiometry on Defect Fornations in Silica Glasses" Transactions of The Materials Society of Japan. 8. 26-48 (1992)
Y.Ohki,K.Nagasawa,Y.Hama:“非化学计量对二氧化硅玻璃缺陷形成的影响”日本材料学会会刊。
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共 10 条
Dielectric Properties and Insulation Diagnosis of Polymers by Ultra-wideband Dielectric and Absorption Spectroscopy
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项目类别:Grant-in-Aid for Challenging Exploratory Research
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财政年份:2012
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Development of High Performance Insulating Materials Using Polymer Nanocomposites with Inorganic Fillers
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Mechanism of Refractive Index Increase Induced in Polymers by Ion Irradiation and Its Application to the Development of Optical Devices
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财政年份:2010
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Dominant factors influencing dielectric properties in several biodegradable polymers
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财政年份:2008
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Structures and Generation Mechanisms of Defects in High-k Dielectric Films for Silicon ULSIs
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批准号:16360160
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资助金额:$9.54万
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财政年份:2004
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Mechanism of refractive index increase in silica glass for the development of fiber-optic photodevices
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批准号:12450132
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项目类别:Grant-in-Aid for Scientific Research (B)
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财政年份:2000
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负责人:OHKI Yoshimichi
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依托单位:
Point Defects in Ge-doped SiO_2 Glass-Their Structures and Roles in Nonlinear Optical Effects
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批准号:06452222
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项目类别:Grant-in-Aid for General Scientific Research (B)
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资助金额:$4.74万
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财政年份:1994
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负责人:OHKI Yoshimichi
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依托单位:
Study on the Cause of Light Scattering, Especially Due to Refractive Index Fluctuation in High-purity Silica Glass.
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批准号:01460143
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项目类别:Grant-in-Aid for General Scientific Research (B)
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资助金额:$3.9万
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财政年份:1989
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负责人:OHKI Yoshimichi
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依托单位:
Defects in pure-silica glass: study on non-radical defects and development of optical fibers for adverse environments.
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批准号:62460121
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项目类别:Grant-in-Aid for General Scientific Research (B)
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资助金额:$4.16万
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财政年份:1987
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负责人:OHKI Yoshimichi
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依托单位:
Mechanism of Radiation Induced Loss in Optical Fibers and Development of Radiation-Resistant Fibers
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批准号:60460123
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项目类别:Grant-in-Aid for General Scientific Research (B)
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资助金额:$3.07万
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财政年份:1985
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负责人:OHKI Yoshimichi
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依托单位:
海外基金