Excitation states and defect formation in high purity silica glass under gamma-ray or excimer-laser irradiation

伽马射线或准分子激光照射下高纯石英玻璃的激发态和缺陷形成

基本信息

  • 批准号:
    03452156
  • 负责人:
  • 金额:
    $ 4.22万
  • 依托单位:
  • 依托单位国家:
    日本
  • 项目类别:
    Grant-in-Aid for General Scientific Research (B)
  • 财政年份:
    1991
  • 资助国家:
    日本
  • 起止时间:
    1991 至 1992
  • 项目状态:
    已结题

项目摘要

The purpose of this study is to clarify the structural and optical properties of point defects in a-SiO_2, and their formation mechanisms under ionizing radiations or laser photons. The emphasis is placed on (i) the characterization of preexisting diamagnetic defects and radiation-induced paramagnetic defects, and (ii) the establishment of the link between the diamagnetic defects and radiation-induced paramagnetic defects. The outline of the present study is as follows.1.Defects and optical absorption bands associated with excess oxygen are identified. Two forms of excess oxygen are identified: peroxy linkage and interstitial oxygen. An optical absorption band at 3.8 eV is associated with peroxy linkages.2.Characterization of new paramagnetic defects induced by 7.9-eV photons is performed. With the help of computer simulation analyses of the ESR spectra, the paramagnetic defects are identified to be ClO_x radicals (x=2,3).3.Time-resolved photoluminescence (PL) measurements are carried out on a series of silicas under 7.9-eV pulsed laser excitation. Correlations of several PL bands with point defects are studied.4.Paramagnetic defects induced by 6.4-eV excimer laser are studied on a series of silicas. Effects of the oxygen stoichiometry and hydroxyl content on the defect species and their concentrations are observed. It is shown that precursor transformation dominates in laser-induced defect formation.5.Photon-energy dependence of the creation of paramagnetic defects is investigated by means of ESR and uv-vuv optical absorption measurements, using 6.4-eV and 7.9-eV photons, and gamma rays as irradiation sources. Correlations between the preexisting diamagnetic defects and laser-induced paramagnetic defects are investigated.6.The effect of hydrogen on the photogeneration of E' centers is studied by means of ESR and uv-vuv absorption measurements. It is found that the creation of E' centers from neutral oxygen vacancies is enhanced in the presence of hydrogen.
本研究的目的是阐明a-SiO_2中点缺陷的结构和光学性质,以及它们在电离辐射或激光光子作用下的形成机制。重点放在(I)先前存在的抗磁缺陷和辐射诱导的顺磁缺陷的表征,以及(Ii)在抗磁缺陷和辐射诱导的顺磁缺陷之间建立联系。本研究的概要如下:1.确定了与过量氧有关的缺陷和光学吸收带。确定了两种形式的过量氧:过氧键和间隙氧。在3.8 eV处有一个光学吸收带与过氧键有关。2.表征了7.9 eV光子引起的新的顺磁缺陷。通过对ESR谱的计算机模拟分析,确定了顺磁缺陷为ClO_x(x=2,3)。3.在7.9 eV脉冲激光激励下,对一系列二氧化硅样品进行了时间分辨光致发光(PL)测量。研究了几个发光带与点缺陷的关系。4.研究了6.4 eV准分子激光在一系列二氧化硅上诱导的顺磁缺陷。观察了氧化学计量比和羟基含量对缺陷种类及其浓度的影响。用6.4 eV和7.9 eV的光子和伽马射线作为辐照光源,通过ESR和UV-VUV光吸收测量,研究了顺磁缺陷形成的光能依赖性。研究了预先存在的抗磁缺陷和激光诱导顺磁缺陷之间的关系。6.通过ESR和UV-VUV吸收光谱研究了氢对E‘心光生的影响。结果表明,在氢的存在下,中性氧空位对E‘心的生成有促进作用。

项目成果

期刊论文数量(14)
专著数量(0)
科研奖励数量(0)
会议论文数量(0)
专利数量(0)
西川 宏之,横川 知行,大木 義路: "シンクロトロン放射光によるSiO_2のキャラクタリゼーション" 電気学会誘電・絶縁材料研究会DEI-92-117. 93-101 (1992)
Hiroyuki Nishikawa、Tomoyuki Yokokawa、Yoshiji Oki:“同步辐射对 SiO_2 的表征”IEEJ 介电和绝缘材料研究组 DEI-92-101 (1992)。
  • DOI:
  • 发表时间:
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  • 影响因子:
    0
  • 作者:
  • 通讯作者:
Y. Ohki et al.: "Correlation of Preexisting Diamagnetic Defect Centers with Induced Paramagnetic Defect Centers by Ultraviolet or Vacuum-ultraviolet photons in High-purity Silica" Phys. Rev. B1.
Y. Ohki 等人:“高纯二氧化硅中紫外线或真空紫外线光子对预先存在的抗磁缺陷中心与诱导顺磁缺陷中心的相关性”。
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    0
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R.Nakamura,Y.Ohki,K.Nagasawa Y.Hama: "Characterization of C10x radicals in vacuum-ultraviolet-irradiated high-purity silica glass" Physical Review B. 46. 8073-8079 (1992)
R.Nakamura,Y.Ohki,K.Nagasawa Y.Hama:“真空紫外线照射高纯石英玻璃中 C10x 自由基的表征”物理评论 B. 46. 8073-8079 (1992)
  • DOI:
  • 发表时间:
  • 期刊:
  • 影响因子:
    0
  • 作者:
  • 通讯作者:
R. Nakamura Y. Ohki K. Nagasawa Y. Hama: "Characterization of C10_x radicals in vacuum-ultraviolet-irradiated high-purity silica glass" Phys. Rev. B. Vol.46. 8073-8079
R. Nakamura Y. Ohki K. Nagasawa Y. Hama:“真空紫外线照射高纯石英玻璃中 C10_x 自由基的表征” Phys。
  • DOI:
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  • 影响因子:
    0
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  • 通讯作者:
Y.Ohki,K.Nagasawa,Y.Hama: "Effect of Nonstoichiometry on Defect Fornations in Silica Glasses" Transactions of The Materials Society of Japan. 8. 26-48 (1992)
Y.Ohki,K.Nagasawa,Y.Hama:“非化学计量对二氧化硅玻璃缺陷形成的影响”日本材料学会会刊。
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    0
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OHKI Yoshimichi其他文献

OHKI Yoshimichi的其他文献

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{{ truncateString('OHKI Yoshimichi', 18)}}的其他基金

Dielectric Properties and Insulation Diagnosis of Polymers by Ultra-wideband Dielectric and Absorption Spectroscopy
超宽带介电光谱和吸收光谱研究聚合物的介电性能和绝缘诊断
  • 批准号:
    24656218
  • 财政年份:
    2012
  • 资助金额:
    $ 4.22万
  • 项目类别:
    Grant-in-Aid for Challenging Exploratory Research
Development of High Performance Insulating Materials Using Polymer Nanocomposites with Inorganic Fillers
使用聚合物纳米复合材料与无机填料开发高性能绝缘材料
  • 批准号:
    23360142
  • 财政年份:
    2011
  • 资助金额:
    $ 4.22万
  • 项目类别:
    Grant-in-Aid for Scientific Research (B)
Mechanism of Refractive Index Increase Induced in Polymers by Ion Irradiation and Its Application to the Development of Optical Devices
离子辐照引起聚合物折射率增加的机理及其在光学器件开发中的应用
  • 批准号:
    22656077
  • 财政年份:
    2010
  • 资助金额:
    $ 4.22万
  • 项目类别:
    Grant-in-Aid for Challenging Exploratory Research
Dominant factors influencing dielectric properties in several biodegradable polymers
影响几种可生物降解聚合物介电性能的主要因素
  • 批准号:
    20360146
  • 财政年份:
    2008
  • 资助金额:
    $ 4.22万
  • 项目类别:
    Grant-in-Aid for Scientific Research (B)
Structures and Generation Mechanisms of Defects in High-k Dielectric Films for Silicon ULSIs
硅超大规模集成电路用高k介质薄膜的结构及缺陷产生机制
  • 批准号:
    16360160
  • 财政年份:
    2004
  • 资助金额:
    $ 4.22万
  • 项目类别:
    Grant-in-Aid for Scientific Research (B)
Mechanism of refractive index increase in silica glass for the development of fiber-optic photodevices
用于开发光纤光电器件的石英玻璃折射率增加机制
  • 批准号:
    12450132
  • 财政年份:
    2000
  • 资助金额:
    $ 4.22万
  • 项目类别:
    Grant-in-Aid for Scientific Research (B)
Point Defects in Ge-doped SiO_2 Glass-Their Structures and Roles in Nonlinear Optical Effects
掺Ge SiO_2 玻璃中的点缺陷——其结构及其在非线性光学效应中的作用
  • 批准号:
    06452222
  • 财政年份:
    1994
  • 资助金额:
    $ 4.22万
  • 项目类别:
    Grant-in-Aid for General Scientific Research (B)
Study on the Cause of Light Scattering, Especially Due to Refractive Index Fluctuation in High-purity Silica Glass.
高纯石英玻璃中光散射尤其是折射率波动的原因研究。
  • 批准号:
    01460143
  • 财政年份:
    1989
  • 资助金额:
    $ 4.22万
  • 项目类别:
    Grant-in-Aid for General Scientific Research (B)
Defects in pure-silica glass: study on non-radical defects and development of optical fibers for adverse environments.
纯石英玻璃的缺陷:非自由基缺陷的研究和恶劣环境下光纤的开发。
  • 批准号:
    62460121
  • 财政年份:
    1987
  • 资助金额:
    $ 4.22万
  • 项目类别:
    Grant-in-Aid for General Scientific Research (B)
Mechanism of Radiation Induced Loss in Optical Fibers and Development of Radiation-Resistant Fibers
光纤辐射损耗机理及抗辐射光纤的发展
  • 批准号:
    60460123
  • 财政年份:
    1985
  • 资助金额:
    $ 4.22万
  • 项目类别:
    Grant-in-Aid for General Scientific Research (B)

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阐明准分子激光导管消融、ELCA对急性冠心病患者脂质斑块成分的修饰作用的研究
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